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US4385976A Expired / Lapsed US ⏱️ 0.0 years remaining

Solderable layer system, its use and method for manufacturing same

Assignee: Siemens AG
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Filing: 1982-08-23
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Granted: 1983-05-31
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Expires: 2002-08-23
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Abstract

Abstract In order to bring about durable solder joints on transparent thin film electrodes which themselves are not solderable, the conductive layer is treated as follows. First, the conductive layer is applied in a vacuum and, more specifically, in the fully oxidized state, and then a solderable layer is generated on the conductive layer in the same vacuum. The electrode consists preferably of an indiumtin oxide and the solder layer consists of copper. The proposed coating technique is particularly simple since the solder layer requires neither an adhesion aid nor a corrosion protection layer. If it consists of copper, it can withstand without difficulty, if it is thick enough, even small thermal stresses such as occur for instance in the fabrication of liquid crystal displays with cementing frame. The layer system is particularly well suited for the electrode leads of electro-optical displays such as liquid crystal displays.

Inventors

  • 👤 Hans Schuster-Wolden
  • 👤 Helmut Freller
  • 👤 Hans Kruger
  • 👤 Wolfgang Welsch
  • 👤 Andre Peetermans
  • 👤 Hans J. Rolke
  • 👤 Peter Schack

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 10:09
CPC Classifications
B; B23; B23K; B23K35/00; B23K35/001; G; G02; G02F; G02F1/00; G02F1/01; G02F1/13; G02F1/133; G02F1/1333; G02F1/1345; H; H05; H05K; H05K3/00; H05K3/22; H05K3/24; H05K2201/00; H05K2201/03; H05K2201/032; H05K2201/0326

Claims Analysis

Total Claims: 22
Claim 1
Independent Claim 93 words
Method for the preparation of a solderable layer system with an electrically conductive layer which comprises first applying in a vacuum an electrically conductive layer of a completely oxidized metal selected from the group consisting of In 2 O 3 and SnO 2 , to a support, then applying, likewise in a vacuum, a solderable layer to the electrically conductive layer, and maintaining a vacuum on the support and applied electrically conductive layer during the entire period between the first application of the conductive layer and the second application of the solderable layer.
Claim 2
Dependent Claim 93 words
Method for the preparation of a solderable layer system with an electrically conductive layer which comprises first applying in a vacuum an electrically conductive layer of a completely oxidized metal selected from the group consisting of In 2 O 3 and SnO 2 , to a support, then applying, likewise in a vacuum, a solderable layer to the electrically conductive layer, and maintaining a vacuum on the support and applied electrically conductive layer during the entire period between the first application of the conductive layer and the second application of the solderable layer.
Claim 3
Dependent Claim 21 words
Method according to claim 1, wherein the conductive layer is In 2 O 3 -SnO 3 and is applied by sputtering.
Claim 4
Dependent Claim 16 words
Method according to claim 1, wherein the solderable layer is copper and is applied by sputtering.
Claim 5
Dependent Claim 21 words
Method according to claim 1, wherein the solderable layer is reinforced by addition to the solderable layer by electroplating or chemically.
Claim 6
Dependent Claim 21 words
Method according to claim 3, wherein the solderable layer is reinforced by addition to the solderable layer by electroplating or chemically.
Claim 7
Dependent Claim 16 words
Method according to claim 1, wherein the solderable layer has a minimum thickness of 1 μm.
Claim 8
Dependent Claim 14 words
Method according to claim 6, wherein the thickness is 2 μm to 3 μm.
Claim 9
Dependent Claim 22 words
Method according to claim 1, wherein the solderable layer is coated with a persistent protective layer protecting the solderable layer against corrosion.
Claim 10
Dependent Claim 30 words
Method in accordance with claim 8, wherein the persistent protective layer is a nickel layer 10 nm to 100 nm thick and in particular 25 nm to 35 nm thick.
Claim 11
Dependent Claim 21 words
Method in accordance with claim 8, wherein the persistent protective layer is a nickel layer 25 nm to 35 nm thick.
Claim 12
Dependent Claim 29 words
Method in accordance with claim 8, wherein the persistent protective layer is a tin layer 6 nm to 100 nm thick with an addition of 4% by weight silver.
Claim 13
Dependent Claim 29 words
Method in accordance with claim 8, wherein the persistent protective layer is a tin layer 8 nm to 20 nm thick with an addition of 4% by weight silver.
Claim 14
Dependent Claim 21 words
Method in accordance with claim 8, wherein the persistent protective layer is an indium/tin layer 10 nm to 100 nm thick.
Claim 15
Dependent Claim 21 words
Method in accordance with claim 8, wherein the persistent protective layer is a tin/antimony layer 10 nm to 100 nm thick.
Claim 16
Dependent Claim 28 words
Method in accordance with claim 8, wherein the persistent protective layer consists of a metal selected from the group consisting of palladium, platinum, indium, osmium, ruthenium and rhodium.
Claim 17
Dependent Claim 10 words
Metal according to claim 15 wherein said metal is palladium.
Claim 18
Dependent Claim 14 words
Method in accordance with claim 8, wherein the persistent protective layer consists of gold.
Claim 19
Dependent Claim 33 words
Method according to claim 1, wherein the solderable layer is coated with a temporary protective layer protecting the solderable layer against corrosion, and wherein the temporary protective layer is removed prior to soldering.
Claim 20
Dependent Claim 34 words
Method according to claim 1, wherein the solderable layer is coated with a WO 3 protective layer 50 nm to 300 nm thick and wherein this layer is removed by an alkaline etching medium.
Claim 21
Dependent Claim 33 words
Method according to claim 1, wherein the solderable layer is coated with a B 2 O 3 protective layer 50 nm to 250 nm thick, and wherein this layer is removed with water.
Claim 22
Dependent Claim 32 words
Method according to claim 1, wherein the solderable layer is applied to a thin layer electrode in an electrooptical display device, particularly in a liquid crystal display with support plates cemented together.

References Cited (Backward Citations)

US3749658A Cited
GB1381429A Cited
US4106860A Cited
US4269919A Cited
US4231808A Cited
US4248687A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1986-05-30 1986-11-29 1987-05-31 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1990-05-30 1990-11-29 1991-05-31 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1994-05-30 1994-11-29 1995-05-31 $7700.00 Window Closed / Lapsed

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