Abstract An apparatus and system for measuring the linewidths on masks and wafers utilizing a photodevice having a slit of predetermined dimension by moving the photodevice along the circumference of a circle whose center is coincident with the exit pupil of a microscope eyepiece. The photodevice and slit are moved through a predetermined radius (whose center coincides with the exit pupil) by means of a lead screw under the actuation of a reversible drive motor by way of a potentiometer interposed between the lead screw and the motor. The electrical resistance of the potentiometer, at any point thereof, is directly proportional to the linear position of the slit with respect to the projected image. The electrical resistance of the potentiometer is converted to a voltage value and is displayed, in arbitrary units, on a digital voltmeter. A trigger circuit controls the circuit display from the potentiometer so that the dimension from the leading edge to the trailing edge of a linewidth is displayed without any human judgment. Thus, by monitoring and controlling the digital display from the potentiometer in response to the output of the photodevice, the voltage read-out is proportional to the actual width of the line on the mask or wafer.
An apparatus for measuring the linewidths of a microelement, comprising: means for holding said microelement in a selected fixed position, means for projecting a fixed magnified real image of at least one line of such microelement, such image lying along a circular path the center of which is coincident with the exit pupil of said projecting means and having dark and light portions corresponding to respective portions of said microelement of different relative opacity, means mounted for pivotal movement about and continuously optically aligned with such exit pupil for optically scanning across such fixed image along such circular path and for producing an electrical output the amplitude of which corresponds to the relative brightness of respective adjacent portions of such image, said electrical output varying between two limit amplitudes corresponding, respectively, to the darkest and the brightest scanned portions of said magnified image, and means for determining the distance traversed by said optical scanning means between adjacent image portions of substantially identical selectable brightness, whereby the width, whether large or small, of such one line of such microelement, being directly proportional to such traversed distance, is directly and automatically determined by such apparatus with greatly enhanced precision and without reliance upon operator judgment.
Claim 2
Independent Claim
203 words
An apparatus for measuring the linewidths of a microelement, comprising: means for holding said microelement in a selected fixed position, means for projecting a fixed magnified real image of at least one line of such microelement, such image lying along a circular path the center of which is coincident with the exit pupil of said projecting means and having dark and light portions corresponding to respective portions of said microelement of different relative opacity, means mounted for pivotal movement about and continuously optically aligned with such exit pupil for optically scanning across such fixed image along such circular path and for producing an electrical output the amplitude of which corresponds to the relative brightness of respective adjacent portions of such image, said electrical output varying between two limit amplitudes corresponding, respectively, to the darkest and the brightest scanned portions of said magnified image, and means for determining the distance traversed by said optical scanning means between adjacent image portions of substantially identical selectable brightness, whereby the width, whether large or small, of such one line of such microelement, being directly proportional to such traversed distance, is directly and automatically determined by such apparatus with greatly enhanced precision and without reliance upon operator judgment.