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US4385307A Expired / Lapsed US ⏱️ 0.0 years remaining

Solid state image sensing device for enhanced charge carrier accumulation

Assignee: Toshiba Corp
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Filing: 1980-10-29
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Granted: 1983-05-24
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Expires: 2000-10-29
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Abstract

Abstract A so-called buried channel type solid state image sensing device is formed with a channel layer of the opposite conductivity type in the surface of a semiconductor substrate. An insulating layer is formed on the surface of the semiconductor substrate and spaced apart photo-electrode and a charge transfer electrode are buried in the insulating film and a shift electrode is buried therebetween. A channel layer is provided beneath the photoelectrode and the charge transfer electrode whereas no channel layer is formed beneath the shift electrode. But instead a portion of the surface of the semiconductor substrate is located beneath the shift electrode. Since no channel layer is provided beneath the shift electrode, a sufficient quantity of charge carriers is accumulated in a potential well formed in the channel layer beneath the photoelectrode.

Inventors

  • 👤 Nobuo Suzuki

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 19:56
CPC Classifications
H; H10; H10F; H10F39/00; H10F39/10; H10F39/12; H10F39/15; H10F39/152

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 427 words
A charge coupled image sensing device comprising: a semiconductor substrate of one conductivity type; an insulating layer formed on a surface of said semiconductor substrate; a photosensitive section including a first portion of said substrate, a plurality of photosensitive channel layers of the opposite conductivity type formed in the first portion adjacent to said surface and mutually isolated and arranged in a row, and a single charge accumulating electrode formed on said insulating layer, overlaid on the row of photosensitive channel layers and maintained at a constant potential, said photosensitive section producing charge carriers and accumulating the charge carriers in photosensitive potential wells formed in the first portion of said substrate; a CCD charge transfer readout section including a second portion of said substrate, a buried channel layer of the opposite conductivity type formed in a second portion of said substrate adjacent to said surface and spaced apart from said row of photosensitive channel layers and a plurality of charge transfer electrodes formed on said insulating layer, overlaid on the buried channel layer and supplied with clock pulses, said CCD charge transfer readout section temporarily accumulating shifted charge carriers in transfer potential wells for subsequent transference which are deeper than the photosensitive potential wells and are formed in the second portion of said substrate; a charge shift section including a third portion of said substrate between the first and second portions and a single charge shift electrode formed on said insulating layer, overlaid on the surface of the third portion of said substrate and overlaying a portion of the adjacent side edges of the charge transfer electrodes and the charge accumulating electrode and supplied with a clock pulse, said charge shift section lacking a channel layer between said photosensitive channel layers and said barrier channel layer of said CCD charge transfer section, in said charge shift section when the charge shift electrode is maintained at a predetermined potential, a barrier being provided in the third portion between the photosensitive potential wells and the transfer potential wells and when the charge shift electrode is maintained at another potential, a shift potential well which is deeper than the photosensitive potential wells and shallower than the transfer potential wells being formed in the third portion so that the produced change carriers are shifted from the photosensitive potential wells to the transfer potential wells through the shift potential wells; and an output section formed in the second portion of said substrate and electrically connected to said CCD charge transfer section to receive the charge carriers from said CCD charge transfer section.
Claim 2
Dependent Claim 427 words
A charge coupled image sensing device comprising: a semiconductor substrate of one conductivity type; an insulating layer formed on a surface of said semiconductor substrate; a photosensitive section including a first portion of said substrate, a plurality of photosensitive channel layers of the opposite conductivity type formed in the first portion adjacent to said surface and mutually isolated and arranged in a row, and a single charge accumulating electrode formed on said insulating layer, overlaid on the row of photosensitive channel layers and maintained at a constant potential, said photosensitive section producing charge carriers and accumulating the charge carriers in photosensitive potential wells formed in the first portion of said substrate; a CCD charge transfer readout section including a second portion of said substrate, a buried channel layer of the opposite conductivity type formed in a second portion of said substrate adjacent to said surface and spaced apart from said row of photosensitive channel layers and a plurality of charge transfer electrodes formed on said insulating layer, overlaid on the buried channel layer and supplied with clock pulses, said CCD charge transfer readout section temporarily accumulating shifted charge carriers in transfer potential wells for subsequent transference which are deeper than the photosensitive potential wells and are formed in the second portion of said substrate; a charge shift section including a third portion of said substrate between the first and second portions and a single charge shift electrode formed on said insulating layer, overlaid on the surface of the third portion of said substrate and overlaying a portion of the adjacent side edges of the charge transfer electrodes and the charge accumulating electrode and supplied with a clock pulse, said charge shift section lacking a channel layer between said photosensitive channel layers and said barrier channel layer of said CCD charge transfer section, in said charge shift section when the charge shift electrode is maintained at a predetermined potential, a barrier being provided in the third portion between the photosensitive potential wells and the transfer potential wells and when the charge shift electrode is maintained at another potential, a shift potential well which is deeper than the photosensitive potential wells and shallower than the transfer potential wells being formed in the third portion so that the produced change carriers are shifted from the photosensitive potential wells to the transfer potential wells through the shift potential wells; and an output section formed in the second portion of said substrate and electrically connected to said CCD charge transfer section to receive the charge carriers from said CCD charge transfer section.
Claim 3
Dependent Claim 28 words
The charge coupled image sensing device according to claim 1 wherein said charge accumulation electrode comprises a transparent photoelectrode that transmits incident light to said photosensitive channel layers.
Claim 4
Dependent Claim 68 words
The coupled image sensing device according to claim 1 wherein said semiconductor substrate in which said photosensitive and buried channel layers are formed is made of a silicon wafer having a resistivity of higher than several ohm-centimeters, said insulating layer is made of silicon oxide, said charge accumulation electrode, said charge transfer electrodes and said charge shift electrode are made of polycrystalline silicon having a high impurity concentration.
Claim 5
Dependent Claim 28 words
The charge coupled image sensing device according to claim 3 wherein said insulating layer comprises a composite construction including a silicon nitride film and a silicon oxide film.
Claim 6
Dependent Claim 52 words
The charge coupled image sensing device according to claim 1 wherein said insulating layer has a thickness of about 0.08 to 0.2 micron, said photosensitive and buried channel layers have an impurity concentration of from about 5×10 15 to 5×10 16 cm -3 and a thickness of about 0.5 to 2 microns.
Claim 7
Dependent Claim 54 words
The charge coupled image sensing device according to claim 1 wherein said photosensitive and buried channel layers and said surface portion of said semiconductor substrate are bounded by channel stops formed in said semiconductor substrate adjacent to the surface and containing a high concentration impurity of the same conductivity type as said semiconductor substrate.
Claim 8
Dependent Claim 26 words
The charge coupled image sensing device according to claim 6 wherein said channel stops have an impurity concentration of higher than 10 16 cm -3 .

References Cited (Backward Citations)

US3856989A Cited
US3995302A Cited
US3866067A Cited
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US3896474A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1986-05-23 1986-11-22 1987-05-24 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1990-05-23 1990-11-22 1991-05-24 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1994-05-23 1994-11-22 1995-05-24 $7700.00 Window Closed / Lapsed

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