US4379833A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Self-aligned photoresist process
Assignee: International Business Machines Corp
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Filing: 1981-12-31
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Granted: 1983-04-12
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Expires: 2001-12-31
Abstract
Abstract A self-aligned photoresist process for selectively covering a pattern on a substrate with photoresist without using a mask or needing an alignment step. It may be used when the pattern to be covered or not covered has a much different reflectivity than the non-pattern areas. A photoresist layer is deposited over the substrate and exposed to a flood beam. The higher reflectivity regions reflect much more exposing radiation and cause increased exposure in the regions overlying the higher reflectivity pattern. Upon development, the more exposed regions (or in the case of a negative resist, the less exposed regions) preferentially develop away, leaving a resist pattern corresponding with the reflective pattern and aligned therewith. This process can be used, for example, to cover a substrate with resist everywhere except at metallized areas.
Inventors
- 👤 Benjamin J. Canavello
- 👤 Michael Hatzakis
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 02:23
CPC Classifications
H; H10; H10P; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; G; G03; G03F; G03F7/00; G03F7/20; G03F7/2002; H05; H05K; H05K3/00; H05K3/0073; H05K3/0082; H05K2201/00; H05K2201/20; H05K2201/2054; H05K3/02; H05K3/04; H05K3/046; H05K3/048
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
102 words
A self-aligned photoresist process, comprising the steps of: depositing a layer of photoresist over a substrate surface, said surface having a pattern of areas with substantially higher reflectivity than surrounding areas in a wavelength region in which said photoresist is sensitive: flooding the deposited photoresist layer with light in said wavelength region, the greater reflection of light at the pattern areas of higher reflectivity causing greater exposure of the photoresist layer in regions overlying said pattern areas of higher reflectivity; and developing the flooded photoresist layer thereby producing a resist pattern corresponding with the pattern areas of higher reflectivity and aligned therewith.
Claim 2
Dependent Claim
102 words
A self-aligned photoresist process, comprising the steps of: depositing a layer of photoresist over a substrate surface, said surface having a pattern of areas with substantially higher reflectivity than surrounding areas in a wavelength region in which said photoresist is sensitive: flooding the deposited photoresist layer with light in said wavelength region, the greater reflection of light at the pattern areas of higher reflectivity causing greater exposure of the photoresist layer in regions overlying said pattern areas of higher reflectivity; and developing the flooded photoresist layer thereby producing a resist pattern corresponding with the pattern areas of higher reflectivity and aligned therewith.
Claim 3
Dependent Claim
34 words
A photoresist process as defined in claim 1 wherein the photoresist is positive acting and the resist pattern is substantially identical with and overlies the surface areas surrounding the pattern areas of higher reflectivity.
Claim 4
Dependent Claim
32 words
A photoresist process as defined in claim 2 and further comprising the step of depositing a metallic layer through the resist pattern and on top of the pattern areas of higher reflectivity.
Claim 5
Dependent Claim
15 words
A photoresist process as defined in claim 3 wherein said metallic layer is vapor deposited.
Claim 6
Dependent Claim
18 words
A photoresist process as defined in claim 3 and further comprising the step of removing the resist pattern.
Claim 7
Dependent Claim
36 words
A photoresist process as defined in claim 1 and further comprising the step of polishing the pattern of areas of higher reflectivity to improve the reflectivity of said pattern of areas with respect to surrounding areas.
Claim 8
Dependent Claim
17 words
A photoresist process as defined in claim 1 wherein said wavelength region is in the ultraviolet region.
Claim 9
Dependent Claim
30 words
A photoresist process as defined in claim 1 wherein the photoresist is negative acting and the resist pattern is substantially identical with and overlies the pattern areas of higher reflectivity.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1986-04-11 | 1986-10-11 | 1987-04-12 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-04-11 | 1990-10-11 | 1991-04-12 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-04-11 | 1994-10-11 | 1995-04-12 | $7700.00 | Window Closed / Lapsed |