4-Halogeno-5-(halogenomethyl-phenyl)-oxazole derivatives, a process for the preparation thereof, and radiation-sensitive compositions containing these derivatives

Claim 2

4-halogeno-5-(halogenomethyl-phenyl)-oxazole derivatives of the general formula I ##STR58## wherein Hal 1 is a halogen atom, Hal 2 is a chlorine or bromine atom, m is an integer from 1 to 3, n is an integer from 1 to 4, R 1 is a hydrogen atom or a further CH 3-m Hal 2 m group, and R 2 is a n-valent, unsaturated organic radical.

Claim 3

Compounds of the general formula I, as claimed in claim 1, wherein: Hal 1 is a chlorine or bromine atom, Hal 2 is a chlorine atom, m is the number 3, n is the number 1 or 2, R 1 is a hydrogen atom or a further CCl 3 group, and R 2 is a 1-valent or 2-valent, at most tetranuclear aromatic or heteroaromatic radical which may be partially hydrogenated and, at an unsaturated ring carbon atom, is linked, directly or via a chain which contains up to 4 exclusively unsaturated carbon atoms, to the oxazolyl part of the molecule according to the general formula I.

Claim 4

Compounds of the general formula I, as claimed in claim 2, wherein: Hal 1 is a chlorine atom, n is the number 1 R 1 is a hydrogen atom, and R 2 is a substituted or unsubstituted phenyl radical, benzofuranyl radical or naphthyl radical.

Claim 5

A radiation-sensitive composition which, as the radiation-sensitive compound, contains a 4-halogeno-5-(halogenomethylphenyl)-oxazole derivative of the general formula I, as claimed in any of claims 1 or 2 or 3.

Claim 6

A radiation-sensitive composition as claimed in claim 1, which additionally comprises an ethylenically unsaturated compound which is capable of undergoing a polymerization reaction initiated by free radicals.

Claim 7

A radiation-sensitive composition as claimed in claim 4, which additionally comprises a compound, the solubility of which is modified by the action of an acid.

Claim 8

A radiation-sensitive composition as claimed in claim 4, which additionally comprises a compound which is caused by acid catalysts to undergo a cationic polymerization.

Claim 9

A radiation-sensitive composition as claimed in claim 6, which comprises a compound which has at least one C-O-C grouping, which can be split by acid, and the solubility of which is increased by the action of acids.

Claim 10

A radiation-sensitive composition as claimed in claim 4, wherein the radiation-sensitive compound of the formula I is contained in a quantity of between 0.1 and 10 percent by weight

Claim 11

A process for the preparation of the compounds as claimed in any of claims 1 or 2 or 3, which comprises reacting a halogenomethyl-benzoyl cyanide of the general formula II with an aldehyde of the general formula III ##STR59## under the action of HHal 1 and liberating the reaction product by hydrolysis, the symbols Hal 1 , Hal 2 , m, n, R 1 , and R 2 having the meaning indicated in any of claims 1 or 2 or 3.