2-(Halogenomethyl-phenyl)-4-halogeno-oxaxole derivatives, a process for the preparation thereof, and radiation-sensitive compositions containing these derivatives

Claim 2

2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivatives of the general formula I ##STR30## wherein Hal 1 is a halogen atom, Hal 2 is a chlorine or bromine atom, m is an integer from 1 to 3, n is an integer from 1 to 4, R 1 is a hydrogen atom or a further CH 3-m Hal 2 m group, and R 2 is an n-valent, unsaturated organic radical.

Claim 3

Compounds of the general formula I, as claimed in claim 1, wherein: Hal 1 is a chlorine or bromine atom, Hal 2 is a chlorine atom, m is the number 3, n is the number 1 or 2, R 1 is a hydrogen atom or a further CCl 3 group, and R 2 is a 1-valent or 2-valent, at most tetranuclear aromatic or heteroaromatic radical which may be partially hydrogenated, and at an unsaturated ring carbon atom, is linked, directly or via a chain which contains up to four exclusively unsaturated carbon atoms, to the oxazolyl part of the molecule according to the general formula I.

Claim 4

Compounds of the general formula I, as claimed in claim 2, wherein: Hal 1 is a chlorine atom n is the number 1, R 1 is a hydrogen atom, and R 2 is a substituted or unsubstituted phenyl or naphthyl radical.

Claim 5

Compounds of the general formula I, as claimed in claim 3, wherein the trichloromethyl group is in the 4-position of the phenyl group and R 2 is one of the group: methoxyphenyl, p-chlorophenyl, 4-biphenylyl, p-benzoxazolyl-phenyl, 4-stilbenyl, 2-benzofuranyl, 2-naphthyl, 6-methoxy-2-naphthyl, and styryl.

Claim 6

A radiation-sensitive composition which, as the radiation-sensitive compound, contains a 2-(halogenomethylphenyl)-4-halogeno-oxazole derivative of the general formula I, as claimed in any of claims 1 or 2 or 3.

Claim 7

A radiation-sensitive composition as claimed in claim 1 which additionally comprises an ethylenically unsaturated compound which is capable of undergoing a polymerization reaction initiated by free radicals.

Claim 8

A radiation-sensitive composition as claimed in claim 4, which additionally comprises a compound, the solubility of which is modified by the action of an acid.

Claim 9

A radiation-sensitive composition as claimed in claim 4, which additionally comprises a compound which is caused by acid catalysts to undergo a cationic polymerization.

Claim 10

A radiation-sensitive composition as claimed in claim 6, which comprises a compound which has at least one C-O-C grouping which can be split by acid, and the solubility of which is increased by the action of acids.

Claim 11

A radiation-sensitive composition as claimed in claim 4, wherein the radiation-sensitive compound of the formula I is contained in a quality of between 0.1 and 10 percent by weight.

Claim 12

A process for the preparation of the compounds as claimed in any of claims 1 or 2 or 3, which comprises reacting a halogenomethyl-benzaldehyde of the general formula II with a carboxylic acid cyanide of the general formula III ##STR31## under the action of HHal 1 and liberating the reaction product by hydrolysis, the symbols Hal 1 , Hal 2 , m, n, R 1 and R 2 having the meaning indicated in any of claims 1 or 2 or 3.