Electron gun for a cathode ray tube

Claim 2

A cathode ray tube system comprising: an electron beam-generating source including a cathode, first grid electrode and second grid electrode; and main lens means for substantially focusing electron beams emitted from said electron-beam generating source including first, second, third and fourth focusing electrodes arranged coaxially and in the order mentioned as counted from the second grid electrode of said electron beam-generating source and for creating an axial potential distribution having a function monotonically decreasing from a relatively intermediate potential level to a relatively low potential level from the first to the second focusing electrodes, and monotonically increasing from the relatively low potential to a relatively high potential level from the second focusing electrode to the fourth focusing electrode through the third electrode, and the second derivative of said function having two positive maximum values proximate the second and third focusing electrodes and three negative maximum values proximate the first, third and fourth focusing electrodes thereby forming a double lens construction.

Claim 3

The cathode ray tube system according to claim 1, or 8 wherein the axial length G 2L of the second focusing electrode has the relationship of G 3L ≧G 1L >G 2L with the axial lengths G 1L , G 3L of the first and third focusing electrodes.

Claim 4

The cathode ray tube system according to claim 2, wherein the axial length G 2L of the second focusing electrode is longer than a distance g 1 between the first and second focusing electrodes and a distance g 2 between the second and third focusing electrodes.

Claim 5

The cathode ray tube system according to claim 3, wherein the axial length G 2L of the second focusing electrode bears the ratio of 0.2 to 0.5 to the diameter of the main lens means.

Claim 6

The cathode ray tube system according to claim 1, wherein the first, second and third focusing electrodes locally constitute a unipotential type focusing lens, and the second focusing electrode is applied with a lower level of voltage than that which is applied to the first focusing electrode.

Claim 7

The cathode ray tube system according to claim 5, wherein the second focusing electrode has the same potential as the second grid electrode of said electron beam-generating source.

Claim 8

The cathode ray tube system according to claim 5, wherein the first and third focusing electrodes have a potential of about 4 to 10 KV, and the fourth focusing electrode has a potential of about 20 to 30 KV.

Claim 9

A cathode ray tube system comprising: an electron beam-generating source including a cathode, first grid electrode and second grid electrode; and a main lens system for substantially focusing electron beams emitted from said electron beam-generating source including first, second, third and fourth focusing electrodes arranged coaxially and in the order mentioned as counted from the second grid electrode of said electron beam-generating source, the axial potential distribution of said main lens system having a function monotonically decreasing from a relatively intermediate potential level to a relatively low potential level from the first to the second focusing electrodes, and monotonically increasing from the relatively low potential to a relatively high potential level from the second focusing electrode to the fourth focusing electrode through the third electrode, and the second derivative of said function having two positive maximum values proximate the second and third focusing electrodes and three negative maximum values proximate the first, third and fourth focusing electrodes thereby forming a double lens construction; and means for applying said potential function.

Claim 10

A cathode ray tube system comprising: an electron beam-generating source including a cathode, first grid electrode and second grid electrode; and a main lens system for substantially focusing electron beams emitted from said electron beam-generating source including first, second, third and fourth focusing electrodes arranged coaxially and in the order mentioned as counted from the second grid electrode of said electron beam-generating source, the axial potential distribution of said main lens system having a function monotonically decreasing from a relatively intermediate potential level to a relatively low potential level from the first to the second focusing electrodes, and monotonically increasing from the relatively low potential to a relatively high potential level from the second focusing electrode to the fourth focusing electrode through the third electrode, and the second derivative of said function having two positive maximum values proximate the second and third focusing electrodes and three negative maximum values proximate the first, third and fourth focusing electrodes thereby forming a double lens construction; and means for applying said potential function.