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US4363846A Expired / Lapsed US ⏱️ 0.0 years remaining

Photomask and photomask blank

Assignee: Dai Nippon Printing Co Ltd
•
Filing: 1981-11-02
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Granted: 1982-12-14
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Expires: 2001-11-02
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Abstract

Abstract In a low reflection type photomask (hard mask) having a chromium masking film provided, through or without an intermediary low reflection layer, on a transparent substrate and further having a low reflection layer provided on the chromium layer, use is made of a composite layer containing chromium oxide and chromium nitride as the low reflection layer. The composite layer is substantially equal in etching speed to the chromium film, and the photomask obtained is free from image deterioration caused by protrusions such as visors, burrs, or fractures, as observed in the photomasks of the prior art using chromium oxide films, and also has excellent durability.

Inventors

  • 👤 Satoru Kaneki

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 10:56
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/50; G03F1/38; G03F1/46; Y; Y10; Y10T; Y10T428/00; Y10T428/24; Y10T428/24802; Y10T428/24851; Y10T428/24868; Y10T428/24917; Y10T428/24926; Y10T428/26; Y10T428/261

Claims Analysis

Total Claims: 12
Claim 1
Independent Claim 40 words
A photomask blank comprising a transparent substrate and a multi-layer masking film provided on the substrate, said multi-layer masking film comprising a layer of chromium and a composite layer of chromium oxide and chromium nitride laminated on said chromium layer.
Claim 2
Dependent Claim 40 words
A photomask blank comprising a transparent substrate and a multi-layer masking film provided on the substrate, said multi-layer masking film comprising a layer of chromium and a composite layer of chromium oxide and chromium nitride laminated on said chromium layer.
Claim 3
Dependent Claim 27 words
A photomask blank according to claim 1, wherein another composite layer of chromium oxide and chromium nitride is interposed between the chromium layer and the transparent substrate.
Claim 4
Dependent Claim 23 words
A photomask blank according to claim 1, wherein the atomic ratio of Cr:N:O in the composite layer is in the range of 1:0.1-0.3:0.8-1.4.
Claim 5
Dependent Claim 33 words
A photomask blank according to claim 1, wherein the composite layer is formed by sputtering or vacuum evaporation using as source a sintered product of mixed powders of chromium oxide and chromium nitride.
Claim 6
Dependent Claim 34 words
A photomask blank according to claim 1, wherein the composite layer is formed by reactive vacuum evaporation or reactive sputtering using chromium as source in an atmosphere of mixed N 2 -O 2 gas.
Claim 7
Dependent Claim 23 words
A photomask blank according to claim 1, wherein the composite layer has a thickness in the range of from 200 to 500 A.
Claim 8
Dependent Claim 40 words
A photomask comprising a transparent substrate and a patternized multi-layer masking film provided on the substrate, said multi-layer masking film comprising a layer of chromium and a composite layer of chromium oxide and chromium nitride laminated on said chromium layer.
Claim 9
Dependent Claim 40 words
A photomask comprising a transparent substrate and a patternized multi-layer masking film provided on the substrate, said multi-layer masking film comprising a layer of chromium and a composite layer of chromium oxide and chromium nitride laminated on said chromium layer.
Claim 10
Dependent Claim 26 words
A photomask according to claim 7, wherein another composite layer of chromium oxide and chromium nitride is interposed between the chromium layer and the transparent substrate.
Claim 11
Dependent Claim 22 words
A photomask according to claim 7, wherein the atomic ratio of Cr:N:O in the composite layer is in the range of 1:0.1-0.3:0.8-1.4.
Claim 12
Dependent Claim 16 words
A photomask according to claim 7, wherein the multi-layer masking film has been patternized by etching.

References Cited (Backward Citations)

US4105468A Cited
US4096026A Cited
US4166148A Cited
JPS53114356A Cited
US4178403A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1985-12-13 1986-06-14 1986-12-14 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1989-12-13 1990-06-14 1990-12-14 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1993-12-13 1994-06-14 1994-12-14 $7700.00 Window Closed / Lapsed

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