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US4178403A Expired / Lapsed US ⏱️ 0.0 years remaining

Mask blank and mask

Assignee: Konica Minolta Inc
•
Filing: 1977-08-04
•
Granted: 1979-12-11
•
Expires: 1997-08-04
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Abstract

Abstract The mask blank is provided with a transparent coating layer interposed between a transparent substrate and a mask metal layer. The transparent coating layer is made of material which is resistant to an etching solution.

Inventors

  • 👤 Kunio Sakurai
  • 👤 Tadashi Kojima
  • 👤 Hiroshi Itoh

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-25 22:08
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/50; G03F1/38; G03F1/48; Y; Y10; Y10T; Y10T428/00; Y10T428/24; Y10T428/24802; Y10T428/24926; Y10T428/26

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 81 words
A mask blank comprising an optically transparent substrate, an electrically conductive and transparent coating layer covering substantially the entire surface of said substrate and being made of material which is resistant to an etchant, said coating layer being formed by vacuum evaporation, a chromium mask layer overlying said coating layer and formed by vacuum evaporation or sputtering, said mask layer being capable of being etched off by the etchant, and an anti-reflection layer made of chromium oxide overlaying said mask layer.
Claim 2
Dependent Claim 81 words
A mask blank comprising an optically transparent substrate, an electrically conductive and transparent coating layer covering substantially the entire surface of said substrate and being made of material which is resistant to an etchant, said coating layer being formed by vacuum evaporation, a chromium mask layer overlying said coating layer and formed by vacuum evaporation or sputtering, said mask layer being capable of being etched off by the etchant, and an anti-reflection layer made of chromium oxide overlaying said mask layer.
Claim 3
Dependent Claim 21 words
The mask prepared by subjecting said mask layer of said mask blank according to claim 1 to a pattern forming process.
Claim 4
Dependent Claim 40 words
The mask blank according to claim 1, wherein said coating layer essentially comprises a material selected from the group consisting of indium oxide, titanium oxide, zirconium oxide, tin oxide and a mixture of at least two of the preceding materials.
Claim 5
Dependent Claim 25 words
A mask blank according to claim 3, wherein said coating layer contains a dopant selected from the group consisting of tungsten oxide and moribudenum oxide.
Claim 6
Dependent Claim 36 words
The mask blank according to claim 1, wherein the thickness ND of said coating layer is given by an equation (0.1+n/2)λ.sub.o <ND<(0.15+n/2)λ.sub.o where n represents an integer λ o represents the wavelength of the incident light.
Claim 7
Dependent Claim 37 words
A mask blank according to claim 1, wherein the thickness ND of said coating layer is given by an equation (n/2-0.15)λ.sub.o <ND<(n/2-0.1)λ.sub.o wherein n represents an integer and λ o represents the wavelength of the incident light.
Claim 8
Dependent Claim 21 words
A mask blank according to claim 1, wherein said coating layer has a conductivity higher than 10 4 Ω□ (square centimeter).
Claim 9
Dependent Claim 77 words
A mask which is produced by the steps of subjecting a mask blank made of chromium having a photosensitive layer thereon to a pattern forming step including etching off a mask layer of the mask, comprising a glass substrate, a conductive and transparent layer substantially entirely overlying said glass substrate, and a patterned layer partially overlaying said overlaying layer, said patterned layer consists of a mask layer of chromium and an anti-reflection layer thereon of chromium oxide.
Claim 10
Dependent Claim 77 words
A mask which is produced by the steps of subjecting a mask blank made of chromium having a photosensitive layer thereon to a pattern forming step including etching off a mask layer of the mask, comprising a glass substrate, a conductive and transparent layer substantially entirely overlying said glass substrate, and a patterned layer partially overlaying said overlaying layer, said patterned layer consists of a mask layer of chromium and an anti-reflection layer thereon of chromium oxide.

References Cited (Backward Citations)

US3758326A Cited
US3916056A Cited
US3922420A Cited
US3949131A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1982-12-10 1983-06-11 1983-12-11 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1986-12-10 1987-06-11 1987-12-11 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1990-12-10 1991-06-11 1991-12-11 $7700.00 Window Closed / Lapsed

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