Patent US4360585A successfully refreshed from Google Patents.
US4360585A
Expired / Lapsed
US
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Method of etching polymethyl methacrylate
Assignee: General Electric Co
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Filing: 1981-08-21
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Granted: 1982-11-23
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Expires: 2001-08-21
Abstract
Abstract A method is described for forming a desired pattern in a layer of polymethyl methacrylate resist formed on a substrate by irradiating the layer with a pattern of radiation substantially identical to the desired pattern and thereafter immersing the layer of polymethyl methacrylate in a solution of acetone to remove the irradiated portion of the layer of polymethyl methacrylate.
Inventors
- 👤 Paul A. Frank
- 👤 Bruce F. Griffing
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 18:05
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/32; G03F7/325
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
148 words
A method of forming a first pattern in a first layer of polymethyl methacrylate formed on the surface of a substrate comprising: providing said substrate having said surface, forming said first layer of polymethyl methacrylate on said surface, forming a second layer of a resist containing a novalak resin on said first layer of polymethyl methacrylate, forming in said second layer a second pattern which is substantially identical to said first pattern to expose portions of said first layers of polymethyl methacrylate uncovered thereby, irradiating said second layer and said exposed portions of said first layer of polymethyl methacrylate with radiation to which polymethyl methacrylate is sensitive for a time to substantially depolymerize said exposed portions of polymethyl methacrylate, treating said first and second layers in a solution including acetone to remove said exposed portions of said first layer of polymethyl methacrylate and said second layer of resist.
Claim 2
Independent Claim
148 words
A method of forming a first pattern in a first layer of polymethyl methacrylate formed on the surface of a substrate comprising: providing said substrate having said surface, forming said first layer of polymethyl methacrylate on said surface, forming a second layer of a resist containing a novalak resin on said first layer of polymethyl methacrylate, forming in said second layer a second pattern which is substantially identical to said first pattern to expose portions of said first layers of polymethyl methacrylate uncovered thereby, irradiating said second layer and said exposed portions of said first layer of polymethyl methacrylate with radiation to which polymethyl methacrylate is sensitive for a time to substantially depolymerize said exposed portions of polymethyl methacrylate, treating said first and second layers in a solution including acetone to remove said exposed portions of said first layer of polymethyl methacrylate and said second layer of resist.
Claim 3
Dependent Claim
17 words
The method of claim 1 in which said first layer is substantially thicker than said second layer.
Claim 4
Dependent Claim
14 words
The method of claim 1 in which the said solution includes acetone and isopropanol.
Claim 5
Dependent Claim
22 words
The method of claim 3 in which said solution consists of 2 parts of acetone and 1 part of isopropanol by volume.
Claim 6
Dependent Claim
37 words
The method of claim 1 in which said first and second layers are immersed in a solution of acetone to remove said exposed portions of said first layer of polymethyl methacrylate and said second layer of resist.
References Cited (Backward Citations)
US4051271A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-11-22 | 1986-05-24 | 1986-11-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-11-22 | 1990-05-24 | 1990-11-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-11-22 | 1994-05-24 | 1994-11-23 | $7700.00 | Window Closed / Lapsed |