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US4360414A
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Method of producing structures comprised of layers consisting of silicides or silicide-polysilicon by reactive sputter etching
Assignee: Siemens AG
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Filing: 1981-11-19
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Granted: 1982-11-23
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Expires: 2001-11-19
Abstract
Abstract Circuit structures consisting of layers composed of metal silicides or metal silicide-polysilicon are produced by reactive sputter etching with sulfur hexafluoride (SF 6 ) as the etching gas. In a practice of the invention, the etching process occurs in two steps whereby the first etching step is carried out with a high frequency power of more than 0.3 W/cm 2 and the second etching step is carried out with a high frequency power of less than 0.2 W/cm 2 . This method is strictly anisotropic, even when a photosensitive resist is used as an etching mask, and is useful in the manufacture of fully integrated semiconductor circuits in MOS technology with metal silicide layers for reduction of the ohmic resistance of polysilicon.
Inventors
- 👤 Willy Beinvogl
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 06:44
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/26; H10P50/264; H10P50/266; H10P50/267; H10P50/268
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
110 words
In a method of producing structures comprised of layers consisting of silicides or double layers of silicide-polysilicon on substrates containing integrated semiconductor circuits by reactive sputter etching with sulfur hexafluoride (SF 6 ) as the etching gas with the use of a photosensitive resist mask, the improvement comprising wherein: said etching process is accomplished in two steps, with a first etching step being carried out with a relatively high frequency power of more than about 0.3 W/cm 2 at relatively high etching rates, and a second etching step being carried out with a relatively lower high frequency power of less than about 0.2 W/cm 2 at relatively lower etching rates.
Claim 2
Dependent Claim
110 words
In a method of producing structures comprised of layers consisting of silicides or double layers of silicide-polysilicon on substrates containing integrated semiconductor circuits by reactive sputter etching with sulfur hexafluoride (SF 6 ) as the etching gas with the use of a photosensitive resist mask, the improvement comprising wherein: said etching process is accomplished in two steps, with a first etching step being carried out with a relatively high frequency power of more than about 0.3 W/cm 2 at relatively high etching rates, and a second etching step being carried out with a relatively lower high frequency power of less than about 0.2 W/cm 2 at relatively lower etching rates.
Claim 3
Dependent Claim
30 words
In a method as defined in claim 1 wherein said first etching step occurs at a high frequency power in the range of about 0.3 through 0.5 W/cm 2 .
Claim 4
Dependent Claim
25 words
In a method as defined in claim 1 wherein said second etching step occurs at a high frequency power of about 0.1 W/cm 2 .
Claim 5
Dependent Claim
16 words
In a method as defined in claim 1 wherein said etching gas is diluted with helium.
Claim 6
Dependent Claim
27 words
In a method as defined in claim 4 wherein the etching gas is diluted with helium at the SF 6 :He ratio of 1:5, by parts volume.
Claim 7
Dependent Claim
30 words
In a method as defined in claim 1 wherein said substrate is provided with a metal ring during the sputter etching in order to make the etching reaction more uniform.
Claim 8
Dependent Claim
16 words
In a method as defined in claim 6 wherein said metal ring is composed of aluminum.
Claim 9
Dependent Claim
25 words
In a method as defined in claim 1 wherein said silicides are selected from the group consisting of tungsten silicide, molybdenum silicide and tantalum silicide.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-11-22 | 1986-05-24 | 1986-11-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-11-22 | 1990-05-24 | 1990-11-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-11-22 | 1994-05-24 | 1994-11-23 | $7700.00 | Window Closed / Lapsed |