Substrate holder for liquid phase epitaxial growth

Claim 1

An apparatus for liquid phase epitaxial growth comprising, in combination: a substrate holder having a cylindrical space inside thereof, the inside wall of said cylindrical space having at least one annular groove with a V-shaped cross-section to hold at least one substrate therein for each annular groove, respectively, by uniformly receiving the peripheral edges of both faces of the substrate, the pitches of each said annular groove being larger than thicknesses of each said substrate, said substrate holder including an opening for introducing and withdrawing at least one semiconductor solution into an out of said cylindrical space thereof, said substrate holder comprising a semi-cylindrical main part having said at least two annular grooves therein and a semi-cylindrical lid part also having at least two annular grooves therein cooperating therewith, the annular grooves of said lid part having the same pitch as the annular grooves of said main part, whereby when the main part and the lid are put together the correspondingly matched annular grooves are contiguous, establishing uniform boundary conditions around the entire periphery of each said substrate when contacted with the semiconductor solution, a boat in liquid communication with said substrate holder via said opening and having a semiconductor solution reservoir at the lower portion thereof with the substrate holder at the upper portion thereof, and means to turn said boat upside down thereby contacting said semiconductor solution with each said substrate.

Claim 2

An apparatus for liquid phase epitaxial growth comprising, in combination: a substrate holder having a cylindrical space inside thereof, the inside wall of said cylindrical space having at least one annular groove with a V-shaped cross-section to hold at least one substrate therein for each annular groove, respectively, by uniformly receiving the peripheral edges of both faces of the substrate, the pitches of each said annular groove being larger than thicknesses of each said substrate, said substrate holder including an opening for introducing and withdrawing at least one semiconductor solution into an out of said cylindrical space thereof, said substrate holder comprising a semi-cylindrical main part having said at least two annular grooves therein and a semi-cylindrical lid part also having at least two annular grooves therein cooperating therewith, the annular grooves of said lid part having the same pitch as the annular grooves of said main part, whereby when the main part and the lid are put together the correspondingly matched annular grooves are contiguous, establishing uniform boundary conditions around the entire periphery of each said substrate when contacted with the semiconductor solution, a boat in liquid communication with said substrate holder via said opening and having a semiconductor solution reservoir at the lower portion thereof with the substrate holder at the upper portion thereof, and means to turn said boat upside down thereby contacting said semiconductor solution with each said substrate.

Claim 3

An apparatus for liquid phase epitaxial growth comprising, in combination: a pair of plates disposed back-to-back with respect to each other, each of said pair of plates having a circular space therein formed by a tapered hole, said pair of plates forming a tapered circular peripheral space with a V-shaped annular groove defined by tapered wall faces of said tapered holes, a pair of disc-shaped substrates disposed back-to-back in said tapered circular peripheral space in a manner such that the peripheral edges of both opposite faces of said pair of substrates is engaged in the holder by point contact at the peripheral portions of said tapered wall faces, thereby establishing uniform boundary conditions around the entire periphery of each said substrate when contacted with the semiconductor solution, a semiconductor solution reservoir disposed under said substrate holder, and transport means for bringing said substrate holder down into said semiconductor solution reservoir thereby bringing each substrate into contact with the semiconductor solution.

Claim 4

An apparatus for liquid phase epitaxial growth comprising, in combination: a pair of plates disposed back-to-back with respect to each other, each of said pair of plates having a circular space therein formed by a tapered hole, said pair of plates forming a tapered circular peripheral space with a V-shaped annular groove defined by tapered wall faces of said tapered holes, a pair of disc-shaped substrates disposed back-to-back in said tapered circular peripheral space in a manner such that the peripheral edges of both opposite faces of said pair of substrates is engaged in the holder by point contact at the peripheral portions of said tapered wall faces, thereby establishing uniform boundary conditions around the entire periphery of each said substrate when contacted with the semiconductor solution, a semiconductor solution reservoir disposed under said substrate holder, and transport means for bringing said substrate holder down into said semiconductor solution reservoir thereby bringing each substrate into contact with the semiconductor solution.

Claim 5

An apparatus for liquid phase epitaxial growth comprising, in combination: a container having a cylindrical space inside thereof, the inside wall of said cylindrical space having at least one annular groove with a V-shaped cross section to receive a pair of substrates disposed back-to-back therein for each annular groove, respectively, said pair of substrates being disposed in said annular groove in stationary position such that the peripheral edges of both opposite faces of said pair of substrates engage all peripheral places of said annular groove by means of line contact therewith thereby establishing uniform boundary conditions around the entire periphery of each substrate when contacted with the semiconductor solution, said container also including an opening for introducing and withdrawing at least one semiconductor solution into an out of said cylindrical space part therethrough, and a boat having a semiconductor solution reservoir at the lower part, said substrate holder at the upper part and a turning means which turns said boat upside down thereby bringing the semiconductor solution into contact with each substrate.

Claim 6

An apparatus for liquid phase epitaxial growth comprising, in combination: a container having a cylindrical space inside thereof, the inside wall of said cylindrical space having at least one annular groove with a V-shaped cross section to receive a pair of substrates disposed back-to-back therein for each annular groove, respectively, said pair of substrates being disposed in said annular groove in stationary position such that the peripheral edges of both opposite faces of said pair of substrates engage all peripheral places of said annular groove by means of line contact therewith thereby establishing uniform boundary conditions around the entire periphery of each substrate when contacted with the semiconductor solution, said container also including an opening for introducing and withdrawing at least one semiconductor solution into an out of said cylindrical space part therethrough, and a boat having a semiconductor solution reservoir at the lower part, said substrate holder at the upper part and a turning means which turns said boat upside down thereby bringing the semiconductor solution into contact with each substrate.

Claim 8

An apparatus for liquid phase epitaxial growth comprising, in combination: a container for holding a plurality of semiconductor discs for epitaxial growth having an internal space for receiving said discs and a plurality of at least substantially annular and adjacent V-shaped grooves extending side by side in an axial direction, each groove being shaped to contact, and thus hold, at least one disc along only an edge of said one disc along substantially all of the groove thereby establishing uniform boundary conditions around the entire periphery of each disc when contacted with a semiconductor solution, and a semiconductor solution reservoir disposed below said container, and means to invert the position of said container and said reservoir and thereby contact each disc in said container with a semiconductor solution.

Claim 9

An apparatus for liquid phase epitaxial growth comprising, in combination: a container for holding a plurality of semiconductor discs for epitaxial growth having an internal space for receiving said discs and a plurality of at least substantially annular and adjacent V-shaped grooves extending side by side in an axial direction, each groove being shaped to contact, and thus hold, at least one disc along only an edge of said one disc along substantially all of the groove thereby establishing uniform boundary conditions around the entire periphery of each disc when contacted with a semiconductor solution, and a semiconductor solution reservoir disposed below said container, and means to invert the position of said container and said reservoir and thereby contact each disc in said container with a semiconductor solution.

Claim 12

An apparatus for liquid phase epitaxial growth comprising, in combination: a container having a cylindrical space inside thereof, the inside wall of said cylindrical space having at least one annular groove with a V-shaped cross-section to hold at least one substrate disc therein for each annular groove, respectively, by uniformly receiving the peripheral edges of both faces of the substrate disc, the pitches of each said annular groove being larger than thicknesses of each said substrate disc, said container including an opening for introducing and withdrawing at least one semiconductor solution into and out of said cylindrical space thereof, said container also including at least one pair of plates disposed back-to-back with respect to each other and having circular space with a tapered periphery therebetween such that said tapered peripheries of circular spaces of said plate cooperatively form a V-shaped groove when said plates are disposed together thereby establishing uniform boundary conditions around the periphery thereof when said substrate is brought into contact with the semiconductor solution, and a semiconductor solution reservoir disposed below said substrate holder and a transporting means to bring said substrate holder down into said semiconductor solution reservoir thereby contacting each said semiconductor disc with the semiconductor solution.

Claim 13

An apparatus for liquid phase epitaxial growth comprising, in combination: a container having a cylindrical space inside thereof, the inside wall of said cylindrical space having at least one annular groove with a V-shaped cross-section to hold at least one substrate disc therein for each annular groove, respectively, by uniformly receiving the peripheral edges of both faces of the substrate disc, the pitches of each said annular groove being larger than thicknesses of each said substrate disc, said container including an opening for introducing and withdrawing at least one semiconductor solution into and out of said cylindrical space thereof, said container also including at least one pair of plates disposed back-to-back with respect to each other and having circular space with a tapered periphery therebetween such that said tapered peripheries of circular spaces of said plate cooperatively form a V-shaped groove when said plates are disposed together thereby establishing uniform boundary conditions around the periphery thereof when said substrate is brought into contact with the semiconductor solution, and a semiconductor solution reservoir disposed below said substrate holder and a transporting means to bring said substrate holder down into said semiconductor solution reservoir thereby contacting each said semiconductor disc with the semiconductor solution.