Recording blank and method for fabricating therefrom diffractive subtractive filter metal embossing master

Claim 1

A recording blank for use in recording a metal master of a given surface relief diffractive structure spatially modulated by screened spatial information; said blank comprising: a substrate having a given surface composed of a first given metal that is substantially inert to a given etchant, said surface of said substrate incorporating said given surface relief pattern diffractive structure unmodulated by said screened spatial information; said given surface of said substrate being covered by a layer of a second given metal which is etchable by said given etchant, said layer of said second given metal having one of two opposite surfaces in intimate contact with said given surface relief pattern, the other of said two opposite surfaces being smooth and level, and said other surface of said layer of said second given metal being covered by a layer of photoresist.

Claim 6

A method employing a given recording blank for fabricating a metal master to be used in embossing a diffractive subtractive filter, representing certain picture-information defined by a spatial arrangement of contiguous white-manifesting regions and non-white manfesting regions, into a thermoplastic film, said given recording blank comprising a substrate having a given surface thereof composed of a first given metal that is substantially inert to a given etchant, said given surface being formed of at least one set of spaced line ridges defining a diffraction grating of a given profile and depth, said given surface being covered by a layer of a second given metal which when exposed to said given etchant is etchable by said given etchant, said second given metal layer filling the spaces between adjacent line ridges and providing a smooth and level exterior surface, said exterior surface of said second given metal layer being covered by a layer of photoresist; said method comprising the steps of: (a) exposing said photoresist to light manifesting said certain picture-image information; (b) removing all of said photoresist from solely said non-white manifesting regions thereby to reveal only those portions of said exterior surface of said second given metal layer underlying said non-white manifesting regions of said exposed photoresist; (c) etching the revealed portions of said second given metal layer with said given etchant to now reveal entirely the spaced line ridges of only those portions of said given surface of said substrate underlying said non-white manifesting regions, and (d) then removing all the remaining photoresist to now reveal those portions of said exterior surface of said second given metal layer underlying said white-manifesting regions of said exposed photoresist.

Claim 7

A method employing a given recording blank for fabricating a metal master to be used in embossing a diffractive subtractive filter, representing certain picture-information defined by a spatial arrangement of contiguous white-manifesting regions and non-white manfesting regions, into a thermoplastic film, said given recording blank comprising a substrate having a given surface thereof composed of a first given metal that is substantially inert to a given etchant, said given surface being formed of at least one set of spaced line ridges defining a diffraction grating of a given profile and depth, said given surface being covered by a layer of a second given metal which when exposed to said given etchant is etchable by said given etchant, said second given metal layer filling the spaces between adjacent line ridges and providing a smooth and level exterior surface, said exterior surface of said second given metal layer being covered by a layer of photoresist; said method comprising the steps of: (a) exposing said photoresist to light manifesting said certain picture-image information; (b) removing all of said photoresist from solely said non-white manifesting regions thereby to reveal only those portions of said exterior surface of said second given metal layer underlying said non-white manifesting regions of said exposed photoresist; (c) etching the revealed portions of said second given metal layer with said given etchant to now reveal entirely the spaced line ridges of only those portions of said given surface of said substrate underlying said non-white manifesting regions, and (d) then removing all the remaining photoresist to now reveal those portions of said exterior surface of said second given metal layer underlying said white-manifesting regions of said exposed photoresist.