Patent US4351714A successfully refreshed from Google Patents.
US4351714A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Sputter-etching device
Assignee: Shibaura Mechatronics Corp
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Filing: 1981-04-21
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Granted: 1982-09-28
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Expires: 2001-04-21
Abstract
Abstract A sputter-etching device has a hollow electrode with an internal space in which gas plasma is formed and an opening which is confronted with the inner wall of a vacuum chamber to provide an electric discharge gap therebetween. An object to be processed is placed on the side of the vacuum chamber instead of the side of the electrode. The sputter-etching device is combined with a sputtering device so that immediately after being cleaned by sputter-etching, the object is subjected to sputtering.
Inventors
- 👤 Noboru Kuriyama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 03:34
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; H01J37/32174; H01J37/32357; H01J37/32431; H01J37/32532; H01J37/32596; H01J37/32917; H01J37/32935; H01J2237/00; H01J2237/32; H01J2237/33; H01J2237/334
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
107 words
A sputter-etching device which comprises: a vacuum chamber filled with a predetermined gas under a pressure substantially equal to a vacuum pressure; a hollow electrode having an internal space and an opening, said electrode being mounted on a wall of said vacuum chamber in such a manner that an electric discharge gap is formed between said opening and an inner wall of said vacuum chamber; a radio-frequency electric source for applying a radio-frequency voltage between said electrode and said vacuum chamber; and discharge starting means for starting an electric discharge between said electrode and said vacuum chamber, thereby to subject an object to be processed to sputter-etching.
Claim 2
Dependent Claim
107 words
A sputter-etching device which comprises: a vacuum chamber filled with a predetermined gas under a pressure substantially equal to a vacuum pressure; a hollow electrode having an internal space and an opening, said electrode being mounted on a wall of said vacuum chamber in such a manner that an electric discharge gap is formed between said opening and an inner wall of said vacuum chamber; a radio-frequency electric source for applying a radio-frequency voltage between said electrode and said vacuum chamber; and discharge starting means for starting an electric discharge between said electrode and said vacuum chamber, thereby to subject an object to be processed to sputter-etching.
Claim 3
Dependent Claim
20 words
A device as claimed in claim 1, in which said object is placed on the side of said vacuum chamber.
Claim 4
Dependent Claim
44 words
A device as claimed in claim 1, in which said electrode is made up of a cylindrical member and a drum-shaped member which are combined together, so that the space volume of said electrode is large when compared with the height of said electrode.
Claim 5
Dependent Claim
22 words
A device as claimed in claim 1, in which said discharge starting means is a thermion filament provided in said vacuum chamber.
Claim 6
Dependent Claim
60 words
A device as claimed in claim 1, which further comprises: a control circuit for controlling said radio-frequency electric source in such a manner that said control circuit detects a d.c. voltage developed in said electrode when abnormal electric discharge occurs in said vacuum chamber, to eliminate an output of said radio-frequency electric source thereby to stop the abnormal electric discharge.
Claim 7
Dependent Claim
28 words
A device as claimed in claim 1, which further comprises: conveying means for moving an object to be processed, said conveying means being provided in said vacuum chamber.
Claim 8
Dependent Claim
22 words
A device as claimed in claim 6, in which said conveying means is a turn table on which said object is placed.
Claim 9
Dependent Claim
49 words
A device as claimed in claim 7, which is combined with a sputtering source in such a manner that said sputter-etching device and said sputtering source are arranged along the path of movement of said object, whereby immediately after being cleaned by sputter-etching, said object is subjected to sputtering.
Claim 10
Dependent Claim
22 words
A device as claimed in claim 6, in which said conveying means is a belt conveyer on which said object is placed.
Claim 11
Dependent Claim
45 words
A device as claimed in claim 9, which is combined with a sputtering source in such a manner that said sputter-etching device and said sputtering source are arranged along said belt conveyor, whereby immediately after being cleaned by sputter-etching, said object is subjected to sputtering.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-09-27 | 1986-03-29 | 1986-09-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-09-27 | 1990-03-29 | 1990-09-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-09-27 | 1994-03-29 | 1994-09-28 | $7700.00 | Window Closed / Lapsed |