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US4351696A Expired / Lapsed US ⏱️ 0.0 years remaining

Corrosion inhibition of aluminum or aluminum alloy film utilizing bromine-containing plasma

Assignee: National Semiconductor Corp
•
Filing: 1981-10-28
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Granted: 1982-09-28
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Expires: 2001-10-28
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Abstract

Abstract Bromine-containing plasma is utilized to inhibit corrosion of aluminum or aluminum alloy films which have been etched utilizing a chlorinated plasma.

Inventors

  • 👤 Kenneth J. Radigan

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 16:29
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/20; H10P70/27; H10P70/273; C; C23; C23C; C23C8/00; C23C8/02; C23C8/06; C23C8/36; Y; Y10; Y10S; Y10S438/00; Y10S438/958

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 26 words
A method for inhibiting corrosion of aluminum or aluminum alloy films which have been etched utilizing chlorinated plasma comprising exposing the etched film to bromine-containing plasma.
Claim 2
Independent Claim 26 words
A method for inhibiting corrosion of aluminum or aluminum alloy films which have been etched utilizing chlorinated plasma comprising exposing the etched film to bromine-containing plasma.
Claim 3
Dependent Claim 19 words
The method as in claim 1 wherein the source gas utilized for generating the bromine-containing plasma includes methyl bromide.
Claim 4
Dependent Claim 19 words
The method as in claim 1 wherein the source gas utilized for generating the bromine-containing plasma includes ethyl bromide.
Claim 5
Independent Claim 55 words
A method for inhibiting corrosion of an aluminum or aluminum alloy film which has been etched in a reactor utilizing chlorinated plasma, comprising the sequential steps of: (a) purging the reactor utilizing a combination of oxygen and nitrogen; (b) introducting a bromine-containing gas into the reactor; and (c) generating a bromine-containing plasma within the reactor.
Claim 6
Independent Claim 55 words
A method for inhibiting corrosion of an aluminum or aluminum alloy film which has been etched in a reactor utilizing chlorinated plasma, comprising the sequential steps of: (a) purging the reactor utilizing a combination of oxygen and nitrogen; (b) introducting a bromine-containing gas into the reactor; and (c) generating a bromine-containing plasma within the reactor.
Claim 7
Dependent Claim 13 words
A method as in claim 4 wherein the bromine-containing gas includes methyl bromode.
Claim 8
Dependent Claim 22 words
A method as in claim 5 wherein the bromine-containing plasma is generated by applying power of about 3.0 amps to the reactor.
Claim 9
Dependent Claim 18 words
A method as in claim 6 wherein the power is applied to the reactor for about 15 minutes.
Claim 10
Independent Claim 119 words
A method for inhibiting corrosion of an aluminum or aluminum alloy film which has been etched in a reactor utilizing chlorinated plasma, comprising the sequential steps of: (a) introducing a combination of oxygen and nitrogen to the reactor for about 5 minutes while maintaining the reactor power at about 3.0 amps and the reactor pressure at about 400 millimicrons; (b) turning off the reactor power and introducing methyl bromide to the reactor for about 2 minutes while maintaining the reactor pressure at about 300 millimicrons; and (c) generating a methyl bromide plasma in the reactor by applying a power of about 3.0 amps to the reactor for about 15 minutes while maintaining the reactor pressure at about 300 millimicrons.
Claim 11
Independent Claim 119 words
A method for inhibiting corrosion of an aluminum or aluminum alloy film which has been etched in a reactor utilizing chlorinated plasma, comprising the sequential steps of: (a) introducing a combination of oxygen and nitrogen to the reactor for about 5 minutes while maintaining the reactor power at about 3.0 amps and the reactor pressure at about 400 millimicrons; (b) turning off the reactor power and introducing methyl bromide to the reactor for about 2 minutes while maintaining the reactor pressure at about 300 millimicrons; and (c) generating a methyl bromide plasma in the reactor by applying a power of about 3.0 amps to the reactor for about 15 minutes while maintaining the reactor pressure at about 300 millimicrons.

References Cited (Backward Citations)

US4073669A Cited
JPS549387A Cited
US4267013A Cited
US4256534A Cited
JPS5569268A Cited
US4308089A Cited
US4325984A Cited
US4325984B1 Cited
US4325984B2 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1985-09-27 1986-03-29 1986-09-28 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1989-09-27 1990-03-29 1990-09-28 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1993-09-27 1994-03-29 1994-09-28 $7700.00 Window Closed / Lapsed

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