Apparatus for continuously depositing a layer of a solid material on the surface of a substrate heated to a high temperature

Claim 1

Apparatus for continuously depositing on the surface of a heated substrate a layer of solid material formed from the reaction of at least two reactants selected from gaseous reactants and reactants diluted in inert carrier gas, which apparatus comprises: a source of a first gaseous reactant or reactant diluted in a carrier gas, a source of a second gaseous reactant or reactant diluted in a carrier gas, a nozzle with three jet ducts each having an exhaust aperture constituted by a rectilinear slot and having lateral walls delimiting the longitudinal edges of each slot which walls converge towards a line common to all said jet ducts, a first of said jet ducts adjoining, with a first longitudinal edge of its exhaust aperture, a longitudinal exhaust aperture edge of a second said jet duct and, with the second longitudinal edge of its said aperture, a longitudinal edge of the exhaust aperture of the third jet duct, first and second deflecting surfaces, respectively extending over a predetermined length to each side of said jet ducts from the said second longitudinal edge of the exhaust aperture of the second and third jet duct respectively, said deflecting surfaces being coplanar with each other and with the said longitudinal edges of the exhaust apertures of the jet ducts of the nozzle and being kinematically integral with this nozzle, a first distributor network connecting the source of the first reactant with the first jet duct of the nozzle, a second distributor network connecting the source of the second reactant with the second and third jet ducts of the nozzle, means for effecting relative movement of the substrate and the nozzle in a direction substantially perpendicular to said imaginary common line, means for maintaining constant in the course of said relative movement the distance separating the plane containing said exhaust apertures and said deflecting surfaces from the said surface of the substrate, and maintaining this distance substantially equal to that between the jet ducts of the nozzle and the said imaginary line, and at least one device for evacuating the reaction gases evolving in the space between the said deflecting surfaces and the surface of the substrate, from the extremities of this space most remote from the said apertures of said nozzle.