US4335506A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of forming aluminum/copper alloy conductors
Assignee: International Business Machines Corp
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Filing: 1980-08-04
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Granted: 1982-06-22
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Expires: 2000-08-04
Abstract
Abstract Aluminum/copper alloy conductors are made by forming a patterned layer of copper on a layer of aluminum. The portion of the aluminum layer which is not protected by the copper layer is removed by reactive ion etching and the resulting structure is then heated to cause the copper to diffuse into, and alloy with the aluminum layer.
Inventors
- 👤 George T. Chiu
- 👤 Robert R. Joseph
- 👤 Gunars M. Ozols
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 14:33
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/064; H10P; H10P14/00; H10P14/40; H10P14/412; H10P50/00; H10P50/20; H10P50/26; H10P50/262; H10P50/264; H10P50/266; H10P50/267; Y; Y10; Y10S; Y10S438/00; Y10S438/927
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
75 words
A process for forming an aluminum/copper alloy, electromigration resistant electrical conductor comprising forming a patterned layer of copper on a layer of aluminum on a substrate, removing the auminum which is not masked by the patterned copper layer by reactive ion etching in a chlorine-containing atmosphere without supplementary heating of said substrate, and then heating to cause the copper to diffuse into and throughout said aluminum layer, and to alloy with the said aluminum layer.
Claim 2
Dependent Claim
75 words
A process for forming an aluminum/copper alloy, electromigration resistant electrical conductor comprising forming a patterned layer of copper on a layer of aluminum on a substrate, removing the auminum which is not masked by the patterned copper layer by reactive ion etching in a chlorine-containing atmosphere without supplementary heating of said substrate, and then heating to cause the copper to diffuse into and throughout said aluminum layer, and to alloy with the said aluminum layer.
Claim 3
Dependent Claim
21 words
The process of claim 1 wherein the layer of aluminum is formed by evaporation on a semiconductor substrate containing semiconductor devices.
Claim 4
Dependent Claim
21 words
The process of claim 1 wherein the patterned layer of copper is formed on the aluminum layer by a lift-off process.
Claim 5
Dependent Claim
32 words
The process of claim 1 wherein the copper layer is of a thickness to provide an aluminum/copper alloy containing 1-8 percent by weight copper when it is diffused into the aluminum layer.
Claim 6
Dependent Claim
24 words
The process of claim 1 wherein the aluminum is reactive in etched by placing the substrate on a cathode which is at ambient temperature.
Claim 7
Dependent Claim
21 words
The process of claim 5 wherein the aluminum is post reactive ion etch cleaned in a glow discharge of inert gas.
Claim 8
Dependent Claim
18 words
The process of claim 1 wherein the patterned layer of copper is formed by a substractive etch process.
Claim 9
Dependent Claim
22 words
The process of claim 5 wherein the patterned copper layer is used as an etch mask for reactive ion etching the aluminum.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-06-21 | 1985-12-21 | 1986-06-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-06-21 | 1989-12-21 | 1990-06-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-06-21 | 1993-12-21 | 1994-06-22 | $7700.00 | Window Closed / Lapsed |