Patent US4332838A successfully refreshed from Google Patents.
← Back to Patent Explorer
US4332838A Expired / Lapsed US ⏱️ 0.0 years remaining

Particulate thin film fabrication process

Assignee: Individual
•
Filing: 1980-09-24
•
Granted: 1982-06-01
•
Expires: 2000-09-24
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A method for the fabrication of large surface area thin films of vaporizable solids upon substrate materials is provided. The method is particularly applicable to the fabrication of thin films having semiconducting properties useful as solar cells, in the production of microelectronic devices, and other similar purposes. A solid material is vaporized in a temperature-zoned furnace in association with a flowing carrier gas. The vaporized solid is allowed to condense to form an aerosol of disperse sized particles; the smaller of these particles are again vaporized leaving a lesser number of seed aerosol nuclei which are then grown to a larger size and diverted through an orifice to impact upon a substrate moving beneath the orifice thereby forming a particulate film on the substrate.

Inventors

  • 👤 James E. Wegrzyn

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 21:04
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/228; C23C14/24; C30; C30B; C30B23/00; C30B23/02; C30B29/00; C30B29/02; C30B29/06; C30B29/60; C30B29/605; H; H10; H10F; H10F71/00; H10F71/10; H10F71/103; H10F71/121; H10F71/1221; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y02E10/546; Y02P; Y02P70/00; Y02P70/50; Y10; Y10S; Y10S438/00; Y10S438/935

Claims Analysis

Total Claims: 18
Claim 1
Independent Claim 168 words
A process for depositing a particulate thin film of a vaporizable solid upon a substrate comprising: vaporizing said solid in a first heating zone; continuously conveying vapor from said first heating zone in a flowing carrier gas stream to a first condensation zone maintained at a temperature below that of said first heating zone to form an aerosol of disperse size particles; passing said aerosol and said carrier gas through a second heating zone maintained at a temperature above said first condensation zone to vaporize a substantial portion, but not all, of said aerosol particles; passing said carrier gas, now containing a depleted number of aerosol particles and vapor of said solid, from the second heating zone to a second condensation zone; maintaining the temperature of said second condensation zone at a temperature below that of said second heating zone, said second condensation zone temperature being selected to cause growth of said aerosol particles by condensation of vapor thereon; and impacting said grown aerosol particles upon a substrate.
Claim 2
Dependent Claim 168 words
A process for depositing a particulate thin film of a vaporizable solid upon a substrate comprising: vaporizing said solid in a first heating zone; continuously conveying vapor from said first heating zone in a flowing carrier gas stream to a first condensation zone maintained at a temperature below that of said first heating zone to form an aerosol of disperse size particles; passing said aerosol and said carrier gas through a second heating zone maintained at a temperature above said first condensation zone to vaporize a substantial portion, but not all, of said aerosol particles; passing said carrier gas, now containing a depleted number of aerosol particles and vapor of said solid, from the second heating zone to a second condensation zone; maintaining the temperature of said second condensation zone at a temperature below that of said second heating zone, said second condensation zone temperature being selected to cause growth of said aerosol particles by condensation of vapor thereon; and impacting said grown aerosol particles upon a substrate.
Claim 3
Dependent Claim 15 words
The process of claim 1 wherein said carrier gas is nonreactive toward said vaporizable solid.
Claim 4
Dependent Claim 28 words
The process of claim 1 wherein said grown aerosol particles in said carrier gas are passed through an orifice to impact perpendicularly upon the surface of said substrate.
Claim 5
Dependent Claim 24 words
The process of claim 3 wherein said orifice comprises a generally rectangular slit and wherein said substrate is translated across said slit during deposition.
Claim 6
Dependent Claim 38 words
The process of claim 4 wherein the orifice width and the velocity of carrier gas through said orifice are selected so as to preclude impaction upon the substrate of particles having a diameter less than about 1 micron.
Claim 7
Dependent Claim 15 words
The process of claim 5 wherein said vaporizable material displays semiconducting properties in film form.
Claim 8
Dependent Claim 11 words
The process of claim 6 wherein said vaporizable material is silicon.
Claim 9
Dependent Claim 12 words
The process of claim 5 wherein said vaporizable material is a metal.
Claim 10
Dependent Claim 12 words
The process of claim 5 wherein said vaporizable material is a compound.
Claim 11
Dependent Claim 15 words
The process of claim 5 wherein said film is subjected to a further treatment step.
Claim 12
Dependent Claim 11 words
The process of claim 10 wherein said treatment step comprises annealing.
Claim 13
Dependent Claim 11 words
The process of claim 10 wherein said treatment step comprises passivation.
Claim 14
Dependent Claim 11 words
The process of claim 10 wherein said treatment step comprises doping.
Claim 15
Dependent Claim 11 words
The process of claim 10 wherein said treatment step comprises recrystallization.
Claim 16
Dependent Claim 11 words
The process of claim 14 wherein said recrystallization comprises zone redefining.
Claim 17
Dependent Claim 11 words
The process of claim 5 wherein said deposited particles are amorphous.
Claim 18
Dependent Claim 11 words
The process of claim 5 wherein said deposited particles are crystalline.

References Cited (Backward Citations)

US3441000A Cited
US3930067A Cited
US3926715A Cited
US3969163A Cited
US3993533A Cited
US3961997A Cited
US4171996A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1985-05-31 1985-11-30 1986-06-01 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1989-05-31 1989-11-30 1990-06-01 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1993-05-31 1993-11-30 1994-06-01 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag