US4331504A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Etching process with vibrationally excited SF6
Assignee: International Business Machines Corp
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Filing: 1981-06-25
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Granted: 1982-05-25
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Expires: 2001-06-25
Abstract
Abstract A substrate which forms a volatile fluoride is etched and directionality is achieved using vibrationally excited SF 6 which has been exposed to laser irradiation. The substrate is etched through a mask having openings smaller than the diffraction limit of the laser light.
Inventors
- 👤 Tung J. Chuang
- 👤 John W. Coburn
- 👤 Eric Kay
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 20:27
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/26; H10P50/264; H10P50/266; C; C23; C23F; C23F1/00; C23F1/10; C23F1/12; H10P50/24; H10P50/242; H10P50/267; H10P50/268
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
79 words
In a process for etching a substrate which forms a volatile fluoride and achieving directionality by the steps of: (1) selectively covering portions of the substrate with a non-erodible mask containing openings; (2) contacting the uncovered portions of the substrate with SF 6 , and (3) vibrationally exciting the SF 6 by exposing it to irradiation with laser light, the improvement characterized in that the openings in said mask are smaller than the diffraction limit of the laser light.
Claim 2
Dependent Claim
79 words
In a process for etching a substrate which forms a volatile fluoride and achieving directionality by the steps of: (1) selectively covering portions of the substrate with a non-erodible mask containing openings; (2) contacting the uncovered portions of the substrate with SF 6 , and (3) vibrationally exciting the SF 6 by exposing it to irradiation with laser light, the improvement characterized in that the openings in said mask are smaller than the diffraction limit of the laser light.
Claim 3
Dependent Claim
12 words
A process as claimed in claim 1 wherein the substrate is silicon.
Claim 4
Dependent Claim
12 words
A process as claimed in claim 1 wherein the substrate is tantalum.
Claim 5
Dependent Claim
12 words
A process as claimed in claim 1 wherein the substrate is titanium.
Claim 6
Dependent Claim
12 words
A process as claimed in claim 1 where the substrate is tungsten.
Claim 7
Dependent Claim
12 words
A process as claimed in claim 1 wherein the substrate is molybdenum.
Claim 8
Dependent Claim
18 words
A process as claimed in claim 1 wherein the laser light is from a pulsed CO 2 laser.
Claim 9
Dependent Claim
24 words
A process as claimed in claim 1 wherein the openings in said mask are on the order of about 1 μm in minimum linewidth.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-05-24 | 1985-11-23 | 1986-05-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-05-24 | 1989-11-23 | 1990-05-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-05-24 | 1993-11-23 | 1994-05-25 | $7700.00 | Window Closed / Lapsed |