US4329410A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Production of X-ray lithograph masks
Assignee: Applied Biosystems Inc
•
Filing: 1979-12-26
•
Granted: 1982-05-11
•
Expires: 1999-12-26
Abstract
Abstract A method of depositing X-ray absorber patterns on a mask membrane to achieve minimum pattern feature dimensions less than 1 μm. The membrane is covered with an ultraviolet (VU) sensitive photoresist which carries a thin metallic film. The metallic film is coated with an electron beam resist. The electron beam resist is exposed to the desired pattern by an electron beam. After development, the metal film is etched through the remaining electron beam resist. This forms a stencil overlying the lower UV photoresist layer which is then exposed by an ultraviolet or soft X-ray source. After development, an X-ray absorber, such as gold, is deposited on the membrane. The final exposure step may be done by means of a point source of radiation. The X-ray absorbers will then have sloping walls to prevent shadowing of the X-ray source.
Inventors
- 👤 W. Derek Buckley
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 17:37
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/22; Y; Y10; Y10S; Y10S430/00; Y10S430/167; Y10S430/168
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
179 words
The method of fabricating a mask for use in X-Ray lithography which comprises: providing a mask membrane of a material substantially transparent to X-radiation; applying a layer of UV photoresist to said membrane; applying a thin film of UV-opaque material to said photoresist; applying a film of electron beam photoresist to said UV-opaque film; exposing said film of electron beam photoresist to an electron beam to form a selected exposure pattern therein; developing said electron beam photoresist to remove said exposure pattern and selectively reveal said UV-opaque film; removing said UV-opaque film where revealed to replicate said exposure pattern therein; exposing said UV photoresist through said replicated pattern from a point source of radiation at a distance from said membrane substantially equal to the desired distance of the completed mask from an X-Ray source; developing said UV photoresist where exposed to selectively reveal said membrane in said exposure pattern wherein the UV photoresist remaining after developing defines sloping sidewalls substantially aligned with said radiation point source; and deposition an X-Radiation absorbing material on the revealed portions of said membrane.
Claim 2
Independent Claim
179 words
The method of fabricating a mask for use in X-Ray lithography which comprises: providing a mask membrane of a material substantially transparent to X-radiation; applying a layer of UV photoresist to said membrane; applying a thin film of UV-opaque material to said photoresist; applying a film of electron beam photoresist to said UV-opaque film; exposing said film of electron beam photoresist to an electron beam to form a selected exposure pattern therein; developing said electron beam photoresist to remove said exposure pattern and selectively reveal said UV-opaque film; removing said UV-opaque film where revealed to replicate said exposure pattern therein; exposing said UV photoresist through said replicated pattern from a point source of radiation at a distance from said membrane substantially equal to the desired distance of the completed mask from an X-Ray source; developing said UV photoresist where exposed to selectively reveal said membrane in said exposure pattern wherein the UV photoresist remaining after developing defines sloping sidewalls substantially aligned with said radiation point source; and deposition an X-Radiation absorbing material on the revealed portions of said membrane.
Claim 3
Dependent Claim
12 words
The method of claim 1 wherein said UV-opaque material is a metal.
Claim 4
Dependent Claim
12 words
The method of claim 2 wherein said metal is removed by etching.
Claim 5
Dependent Claim
10 words
The method of claim 2 wherein said metal is chromium.
Claim 6
Dependent Claim
10 words
The method of claim 2 wherein said metal is aluminum.
Claim 7
Dependent Claim
10 words
The method of claim 2 wherein said metal is silver.
Claim 8
Dependent Claim
13 words
The method of claim 2 wherein said UV-opaque material is AZ 1350 photoresist.
Claim 9
Dependent Claim
20 words
The method of claim 1 wherein said UV photoresist layer has a thickness in the approximate range of 0.5-3 μm.
Claim 10
Dependent Claim
12 words
The method of claim 1 wherein said UV photoresist is polymethyl methacrylate.
Claim 11
Dependent Claim
14 words
The method of claim 1 wherein said electron beam photoresist is poly (butene-1 sulfone).
Claim 12
Dependent Claim
21 words
The method of claim 1 wherein said deposited X-radiation absorbing material defines sidewalls adjacent the sloping sidewalls of said UV photoresist.
References Cited (Backward Citations)
US2702243A
Cited
US3313626A
Cited
US3317320A
Cited
US3423205A
Cited
US3743842A
Cited
US3971860A
Cited
US4035522A
Cited
US4018938A
Cited
US4022927A
Cited
US4123272A
Cited
US4211834A
Cited
US4260670A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-05-10 | 1985-11-09 | 1986-05-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-05-10 | 1989-11-09 | 1990-05-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-05-10 | 1993-11-09 | 1994-05-11 | $7700.00 | Window Closed / Lapsed |