Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
260 words
Method of manufacturing the substrate of an electrochromic display cell comprising the steps of providing a transparent and insulating plate; depositing successively, on the whole surface of the said plate, a layer of a transparent conductive material, a layer of an electrochromic material and a layer of a material which is positively sensitive to a radiation; exposing selectively to the said radiation a portion of the said sensitive layer; selectively eliminating the said exposed portion; etching successively the said electrochromic layer and the said conductive layer at the places exposed by said selective elimination so as to form, with the rest of the said conductive layer, a network of transparent conductive elements constituted by control electrodes situated at the places of the patterns to be displayed, terminal connection contacts of the cell and tracks connecting the said electrodes to the said contacts; exposing the remainder of the said sensitive layer, except at places corresponding to the said patterns to be displayed, and selectively eliminating the exposed portions of the said remainder of the sensitive layer; etching selectively the remainder of the electrochromic layer at the places exposed by this latter selective elimination; depositing a layer of a transparent dielectric material on the whole surface of the said substrate, except in the regions of the said contacts; and eliminating successively the remainder of the said sensitive layer with simultaneous elimination of the dielectric material carried thereby, the substrate being thus covered by a layer comprising zones of dielectric material and zones of electrochromic material, without any free space between these zones.
Claim 2
Dependent Claim
260 words
Method of manufacturing the substrate of an electrochromic display cell comprising the steps of providing a transparent and insulating plate; depositing successively, on the whole surface of the said plate, a layer of a transparent conductive material, a layer of an electrochromic material and a layer of a material which is positively sensitive to a radiation; exposing selectively to the said radiation a portion of the said sensitive layer; selectively eliminating the said exposed portion; etching successively the said electrochromic layer and the said conductive layer at the places exposed by said selective elimination so as to form, with the rest of the said conductive layer, a network of transparent conductive elements constituted by control electrodes situated at the places of the patterns to be displayed, terminal connection contacts of the cell and tracks connecting the said electrodes to the said contacts; exposing the remainder of the said sensitive layer, except at places corresponding to the said patterns to be displayed, and selectively eliminating the exposed portions of the said remainder of the sensitive layer; etching selectively the remainder of the electrochromic layer at the places exposed by this latter selective elimination; depositing a layer of a transparent dielectric material on the whole surface of the said substrate, except in the regions of the said contacts; and eliminating successively the remainder of the said sensitive layer with simultaneous elimination of the dielectric material carried thereby, the substrate being thus covered by a layer comprising zones of dielectric material and zones of electrochromic material, without any free space between these zones.
Claim 3
Dependent Claim
13 words
Method according to claim 1, wherein said conductive layer is deposited by sputtering.
Claim 4
Dependent Claim
13 words
Method according to claim 1, wherein said conductive layer is deposited by pyrolysis.
Claim 5
Dependent Claim
18 words
Method according to claim 1, wherein said conductive layer is deposited by a method of chemical vapour deposition.
Claim 6
Dependent Claim
14 words
Method according to claim 1, wherein said electrochromic layer is deposited by vacuum evaporation.
Claim 7
Dependent Claim
13 words
Method according to claim 1, wherein said electrochromic layer is deposited by sputtering.
Claim 8
Dependent Claim
14 words
Method according to claim 1, wherein said sensitive material is a positively photosensitive material.
Claim 9
Dependent Claim
14 words
Method according to claim 1, wherein said sensitive material is a positively electronsensitive material.
Claim 10
Dependent Claim
15 words
Method according to claim 1, wherein said electrochromic layer is etched by an alkaline solution.
Claim 11
Dependent Claim
22 words
Method according to claim 9, wherein said alkaline solution is constituted by the developer used for development of said exposed sensitive material.
Claim 12
Dependent Claim
17 words
Method according to claim 1, wherein said electrochromic layer is etched by using an ionic etching technique.
Claim 13
Dependent Claim
19 words
Method according to claim 1, wherein said conductive layer is etched by using a chemical method in liquid phase.
Claim 14
Dependent Claim
14 words
Method according to claim 1, wherein said conductive layer is etched by a plasma.
Claim 15
Dependent Claim
17 words
Method according to claim 1, wherein said conductive layer is etched by using an ionic etching technique.
Claim 16
Dependent Claim
14 words
Method according to claim 1, wherein said dielectric layer is deposited by vacuum evaporation.
Claim 17
Dependent Claim
13 words
Method according to claim 1, wherein said dielectric layer is deposited by sputtering.
Claim 18
Dependent Claim
50 words
Method according to claim 1, wherein said remainder of the sensitive material is eliminated by dissolution thereof in a solvent which is inactive with respect to the other constituents of the substrate, the said solvent being agitated for breaking up and removing the dielectric material carried by said sensitive material.