Patent US4318796A successfully refreshed from Google Patents.
US4318796A
Expired / Lapsed
US
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Sputtering apparatus
Assignee: Murata Manufacturing Co Ltd
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Filing: 1980-07-15
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Granted: 1982-03-09
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Expires: 2000-07-15
Abstract
Abstract There is disclosed a sputtering apparatus for the deposition of thin films of a material other than metals on substrates, comprising a pair of opposed electrodes one of which is adapted to mount a substrate, wherein a target of a material other than metals, from which thin-film-forming atoms are ejected by ion-bombardment during sputtering, is mounted on the other electrode, said target comprising at least two target members stacked on one another. This target installation prevents thin films of a material other than metals from contamination resulting from breakage of the target which in turn results from an increase of the film-forming rate or physical properties of the target material.
Inventors
- 👤 Hiroshi Nishiyama
- 👤 Suehiro Kato
- 👤 Takeshi Nakamura
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 11:16
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3407
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
99 words
A sputtering apparatus for the deposition of thin films of a material other than metals on substrates, comprising a pair of opposed electrodes, one of which is adapted to mount a substrate thereon, wherein a target of a material other than metals, from which thin-film-forming atoms are ejected by ion-bombardment during sputtering, is mounted on the other electrode, said target comprising at least two target members made of substantially the same material and stacked on one another, said stacked target members being thermally insulated by a non-heat conducting layer placed between the lowermost target member and the other electrode.
Claim 2
Dependent Claim
99 words
A sputtering apparatus for the deposition of thin films of a material other than metals on substrates, comprising a pair of opposed electrodes, one of which is adapted to mount a substrate thereon, wherein a target of a material other than metals, from which thin-film-forming atoms are ejected by ion-bombardment during sputtering, is mounted on the other electrode, said target comprising at least two target members made of substantially the same material and stacked on one another, said stacked target members being thermally insulated by a non-heat conducting layer placed between the lowermost target member and the other electrode.
Claim 3
Dependent Claim
30 words
The sputtering apparatus according to claim 1 wherein said non-heat conducting layer is an empty space formed by a spacer placed between the lowermost target member and the other electrode.
Claim 4
Dependent Claim
13 words
The sputtering apparatus according to claim 2, wherein said spacer is an O-ring.
Claim 5
Dependent Claim
18 words
The sputtering apparatus according to claim 1 wherein said non-heat conducting layer is made of a heat-insulating material.
Claim 6
Dependent Claim
15 words
The sputtering apparatus according to claim 4, wherein said heat-insulating material is asbestos or quartz.
References Cited (Backward Citations)
JPS4735665U
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-03-08 | 1985-09-07 | 1986-03-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-03-08 | 1989-09-07 | 1990-03-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-03-08 | 1993-09-07 | 1994-03-09 | $7700.00 | Window Closed / Lapsed |