Patent US4317876A successfully refreshed from Google Patents.
US4317876A
Expired / Lapsed
US
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Method for producing high resolution recording medium
Assignee: Dr Johannes Heidenhain GmbH
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Filing: 1980-12-17
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Granted: 1982-03-02
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Expires: 2000-12-17
Abstract
Abstract A method for producing a high resolution, multi-color recording medium comprises the steps of applying a photosensitive masking layer to a substrate, exposing the masking layer, and then developing the masking layer to expose a patterned portion of the underlying substrate. A reflecting layer is then applied over the remaining masking layer and exposed substrate, and then the remaining masking layer is removed, leaving only that portion of the reflecting layer directly over the substrate. A uniformly thick interference layer is then applied over the substrate and the remaining portion of the reflecting layer, and a second reflecting layer is then applied using the same procedures described above in connection with the first reflecting layer.
Inventors
- 👤 Thomas Haering
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 20:59
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/0035; G02; G02B; G02B5/00; G02B5/20; G02B5/28; G02B5/285; G02B5/286; Y; Y10; Y10S; Y10S428/00; Y10S428/913; Y10T; Y10T428/00; Y10T428/24; Y10T428/24802; Y10T428/24893; Y10T428/24909
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
231 words
A process for producing a high resolution recording medium comprising the following steps: (a) providing a substrate; (b) applying a first masking layer to the substrate; (c) exposing a patterned portion of the first masking layer; then (d) developing the first masking layer; (e) applying a first reflecting layer over the remaining portion of the first masking layer; (f) removing the remaining portion of the first masking layer and the portion of the first reflecting layer overlying the remaining portion of the first masking layer; (g) applying a uniformly thick interference layer over the remaining portion of the first reflecting layer, said interference layer substantially absorption free in the visible portion of the spectrum; (h) applying a second masking layer to the interference layer; (i) exposing a patterned portion of the second masking layer; then (j) developing the second masking layer; (k) applying at least a second reflecting layer over the remaining portion of the second masking layer; and then (l) removing the remaining portion of the second masking layer and the portion of the second reflecting layer overlying the remaining portion of the second masking layer; said first and second reflecting layers and said interference layer comprising inorganic materials, the thickness of said interference layer selected such that the combination of the first reflective layer, the interference layer and the second reflective layer cooperate to form a patterned interference filter.
Claim 2
Dependent Claim
231 words
A process for producing a high resolution recording medium comprising the following steps: (a) providing a substrate; (b) applying a first masking layer to the substrate; (c) exposing a patterned portion of the first masking layer; then (d) developing the first masking layer; (e) applying a first reflecting layer over the remaining portion of the first masking layer; (f) removing the remaining portion of the first masking layer and the portion of the first reflecting layer overlying the remaining portion of the first masking layer; (g) applying a uniformly thick interference layer over the remaining portion of the first reflecting layer, said interference layer substantially absorption free in the visible portion of the spectrum; (h) applying a second masking layer to the interference layer; (i) exposing a patterned portion of the second masking layer; then (j) developing the second masking layer; (k) applying at least a second reflecting layer over the remaining portion of the second masking layer; and then (l) removing the remaining portion of the second masking layer and the portion of the second reflecting layer overlying the remaining portion of the second masking layer; said first and second reflecting layers and said interference layer comprising inorganic materials, the thickness of said interference layer selected such that the combination of the first reflective layer, the interference layer and the second reflective layer cooperate to form a patterned interference filter.
Claim 3
Dependent Claim
28 words
The process of claim 1 where at least one of steps (e), (g) and (k) comprises the step of vapor depositing the respective layer in a high vacuum.
Claim 4
Dependent Claim
28 words
The process of claim 1 wherein at least one of steps (e), (g) and (k) comprises the step of using cathode atomization techniques to apply the respective layer.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-03-01 | 1985-08-31 | 1986-03-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-03-01 | 1989-08-31 | 1990-03-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-03-01 | 1993-08-31 | 1994-03-02 | $7700.00 | Window Closed / Lapsed |