Patent US4309259A successfully refreshed from Google Patents.
US4309259A
Expired / Lapsed
US
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High pressure plasma hydrogenation of silicon tetrachloride
Assignee: Motorola Solutions Inc
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Filing: 1980-05-09
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Granted: 1982-01-05
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Expires: 2000-05-09
Abstract
Abstract A method is disclosed for the plasma hydrogenation of silicon tetrachloride. A high pressure plasma is utilized to effect a reaction of hydrogen and silicon tetrachloride to form trichlorosilane and other hydrogenated silicon chlorides.
Inventors
- 👤 Kalluri R. Sarma
- 👤 M. John Rice, Jr.
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:48
CPC Classifications
C; C01; C01B; C01B33/00; C01B33/08; C01B33/107; C01B33/1071; B; B01; B01J; B01J12/00; B01J12/002; B01J2219/00; B01J2219/08; B01J2219/0894; Y; Y10; Y10S; Y10S423/00; Y10S423/09; Y10S423/10
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
55 words
A method for producing SiHCl 3 and SiH 2 Cl 2 which comprises: creating a high pressure radio frequency hydrogen plasma at a pressure of about one atmosphere (about 101 KPa); and reacting H 2 and SiCl 4 in said high pressure radio frequency plasma to form SiHCl 3 and SiH 2 Cl 2 .
Claim 2
Independent Claim
55 words
A method for producing SiHCl 3 and SiH 2 Cl 2 which comprises: creating a high pressure radio frequency hydrogen plasma at a pressure of about one atmosphere (about 101 KPa); and reacting H 2 and SiCl 4 in said high pressure radio frequency plasma to form SiHCl 3 and SiH 2 Cl 2 .
Claim 3
Dependent Claim
24 words
The method of claim 1 wherein the mole ratio of H 2 to SiCl 4 is in the range of 4 to 5 inclusive.
Claim 4
Dependent Claim
97 words
A process for the hydrogenation of silicon tetrachloride to form SiHCl 3 and SiH 2 Cl 2 in an apparatus capable of producing a high pressure radio frequency plasma which comprises the steps of: initiating a high pressure radio frequency hydrogen plasma in the apparatus at a pressure of about one atmosphere (about 101 KPa); introducing hydrogen to the plasma through a first means; introducing silicon tetrachloride to the plasma through a second means; and combining the hydrogen and silicon tetrachloride in the presence of said plasma to form SiHCl 3 and SiH 2 Cl 2 .
Claim 5
Dependent Claim
97 words
A process for the hydrogenation of silicon tetrachloride to form SiHCl 3 and SiH 2 Cl 2 in an apparatus capable of producing a high pressure radio frequency plasma which comprises the steps of: initiating a high pressure radio frequency hydrogen plasma in the apparatus at a pressure of about one atmosphere (about 101 KPa); introducing hydrogen to the plasma through a first means; introducing silicon tetrachloride to the plasma through a second means; and combining the hydrogen and silicon tetrachloride in the presence of said plasma to form SiHCl 3 and SiH 2 Cl 2 .
Claim 6
Independent Claim
79 words
A method for producing SiHCl 3 and SiH 2 Cl 2 which comprises: creating in a volume a high pressure radio frequency hydrogen plasma at a pressure of about one atmosphere (about 101 KPa); introducing reactants comprising hydrogen and silicon tetrachloride to said volume; and creating with said reactants a high pressure radio frequency plasma, said reactants combining in said plasma to form SiHCl 3 and SiH 2 Cl 2 without the production of substantial amounts of chlorosilane polymers.
Claim 7
Independent Claim
79 words
A method for producing SiHCl 3 and SiH 2 Cl 2 which comprises: creating in a volume a high pressure radio frequency hydrogen plasma at a pressure of about one atmosphere (about 101 KPa); introducing reactants comprising hydrogen and silicon tetrachloride to said volume; and creating with said reactants a high pressure radio frequency plasma, said reactants combining in said plasma to form SiHCl 3 and SiH 2 Cl 2 without the production of substantial amounts of chlorosilane polymers.
Claim 8
Dependent Claim
14 words
The method of claim 4 wherein said reactants are introduced separately to said volume.
Claim 9
Dependent Claim
34 words
The method of claim 4 wherein the output of said step of creating with said reactants a high pressure plasma comprises unreacted hydrogen and silicon tetrachloride and reaction products trichlorosilane, dichlorosilane and hydrogen chloride.
Claim 10
Dependent Claim
12 words
The method of claim 6 wherein said output is separated by condensation.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-01-04 | 1985-07-06 | 1986-01-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-01-04 | 1989-07-06 | 1990-01-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-01-04 | 1993-07-06 | 1994-01-05 | $7700.00 | Window Closed / Lapsed |