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US4306010A
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Photosensitive o-quinone diazide composition and photosensitive lithographic printing plate
Assignee: Konica Minolta Inc
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Filing: 1980-05-28
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Granted: 1981-12-15
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Expires: 2000-05-28
Abstract
Abstract A photosensitive composition useful for making a photosensitive lithographic printing plate are made from a condensation product of sulfonylchloride of o-benzoquinone diazide or o-naphthoquinone diazide and a polyhydric phenol resin obtained by condensing a polyhydric phenol such as resorcinol with a benzaldehyde, an acetophenone, or a benzophenone.
Inventors
- 👤 Masafumi Uehara
- 👤 Akio Iwaki
- 👤 Yoko Ogawa
- 👤 Fumio Shimada
- 👤 Masatoshi Matsuzaki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 22:46
CPC Classifications
C; C08; C08G; C08G8/00; C08G8/28; G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/023
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
98 words
Photosensitive composition containing a condensation product of sulfonylchloride of o-benzoquinonediazide or o-naphthoquinonediazide and a polyhydric phenol resin shown in the following general formula. ##STR2## wherein R 1 is hydrogen or hydroxyl group; R 2 is a hydrogen or halogen atom or a lower alkyl or alkoxy group each having 1-4 carbon atoms; R 3 is a hydrogen, a lower alkyl group having 1-4 carbon atoms, an aryl group, or a substituted aryl group; and R 4 is a hydrogen or halogen atom or an alkyl, alkoxy or nitro group; and n is an integer of 3 or more.
Claim 2
Dependent Claim
98 words
Photosensitive composition containing a condensation product of sulfonylchloride of o-benzoquinonediazide or o-naphthoquinonediazide and a polyhydric phenol resin shown in the following general formula. ##STR2## wherein R 1 is hydrogen or hydroxyl group; R 2 is a hydrogen or halogen atom or a lower alkyl or alkoxy group each having 1-4 carbon atoms; R 3 is a hydrogen, a lower alkyl group having 1-4 carbon atoms, an aryl group, or a substituted aryl group; and R 4 is a hydrogen or halogen atom or an alkyl, alkoxy or nitro group; and n is an integer of 3 or more.
Claim 3
Dependent Claim
22 words
A photosensitive lithographic printing plate having photosensitive layer coated on a support which layer contains a photosensitive composition according to claim 1.
Claim 4
Dependent Claim
24 words
Photosensitive composition according to claim 1 wherein R 1 represents a hydrogen atom and R 2 represents a hydrogen atom or a methyl group.
Claim 5
Dependent Claim
24 words
Photosensitive composition according to claim 1 wherein R 3 represents a hydrogen atom and R 4 represents a hydrogen atom or a methyl group.
Claim 6
Dependent Claim
17 words
Photosensitive composition according to claim 1 wherein a molecular weight of the polyhydric phenol resin is 800-4000.
Claim 7
Dependent Claim
43 words
Photosensitive composition according to claim 1 wherein a molecular ratio of the sulfonylchloride of o-benzoquinonediazide or o-naphthoquinonediazide to the polyhydric phenol is 1:0.4-1:3 (in case that R 1 is a hydroxy group) or 1:0.4-1:2 (in case that R 1 is a hydrogen atom).
Claim 8
Dependent Claim
104 words
Photosensitive composition containing a condensation product of sulfonylchloride of o-naphthoquinonediazide and a polyhyric phenol resin shown in the following general formula. ##STR3## where R 1 is hydrogen or hydroxyl group; R 2 is a hydrogen or halogen atom or a lower alkyl or alkoxy group each having 1-4 carbon atoms; R 3 is a hydrogen, a lower alkyl group having 1-4 carbon atoms, an aryl group or a substituted aryl group; and R 4 is a hydrogen or halogen atom or an alkyl or alkoxy group, each having 1-4 carbon atoms, or a nitro group; and n is an integer of 3 or more.
Claim 9
Dependent Claim
104 words
Photosensitive composition containing a condensation product of sulfonylchloride of o-naphthoquinonediazide and a polyhyric phenol resin shown in the following general formula. ##STR3## where R 1 is hydrogen or hydroxyl group; R 2 is a hydrogen or halogen atom or a lower alkyl or alkoxy group each having 1-4 carbon atoms; R 3 is a hydrogen, a lower alkyl group having 1-4 carbon atoms, an aryl group or a substituted aryl group; and R 4 is a hydrogen or halogen atom or an alkyl or alkoxy group, each having 1-4 carbon atoms, or a nitro group; and n is an integer of 3 or more.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-12-14 | 1985-06-15 | 1985-12-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-12-14 | 1989-06-15 | 1989-12-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-12-14 | 1993-06-15 | 1993-12-15 | $7700.00 | Window Closed / Lapsed |