US4304681A
Expired / Lapsed
US
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Novel stripping composition for positive photoresists and method of using same
Assignee: Shipley Co Inc
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Filing: 1980-09-15
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Granted: 1981-12-08
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Expires: 2000-09-15
Abstract
Abstract A novel stripping composition and method of using same is disclosed, which stripping composition comprises: (a) a solvent comprising one or more compounds of formula (I) <IMAGE> (I) wherein R and R' are each selected independently from straight and branched alkyl having 1 to 3 carbon atoms, and phenyl, each of which phenyl is optionally substituted with one or more hydroxyl, or R and R' together are alkylene of 3 to 6 carbon atoms; and (b) a suitable organosulfonic acid. The stripping composition is especially useful for stripping positive photoresists faster and at lower temperatures than known strippers. A preferred composition comprises 10% by weight para-toluenesulfonic acid in dimethyl sulfoxide.
Inventors
- 👤 Robert L. Martin
- 👤 George A. Gibson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 05:10
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/426; C; C09; C09D; C09D9/00; C09D9/005; C09D9/04
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
77 words
A novel stripping composition for stripping positive working photoresist from a substrate, comprising: (a) a solvent comprising one or more compounds of formula (I) ##STR5## wherein R and R' are each selected independently from straight and branched alkyl having 1 to 3 carbon atoms, and phenyl, each of which phenyl is optionally substituted with one or more hydroxyl, or R and R' together are alkylene of 3 to 6 carbon atoms; and (b) a suitable organosulfonic acid.
Claim 2
Dependent Claim
77 words
A novel stripping composition for stripping positive working photoresist from a substrate, comprising: (a) a solvent comprising one or more compounds of formula (I) ##STR5## wherein R and R' are each selected independently from straight and branched alkyl having 1 to 3 carbon atoms, and phenyl, each of which phenyl is optionally substituted with one or more hydroxyl, or R and R' together are alkylene of 3 to 6 carbon atoms; and (b) a suitable organosulfonic acid.
Claim 3
Dependent Claim
26 words
The stripping composition of claim 1, wherein said organosulfonic acid is present in an amount of about from 5 to 40% by volume of said solvent.
Claim 4
Dependent Claim
23 words
The stripping composition of claim 1 wherein said organosulfonic acid is present in an amount of about 10% by volume of said solvent.
Claim 5
Dependent Claim
46 words
The stripping composition of claim 1 wherein said organosulfonic acid is selected from among those of formula (II) ##STR6## wherein Q is alkyl, aryl, arylalkyl, monoalkylaryl, or dialkylaryl, any said alkyl and aryl moiety being optionally substituted with one or more halogen, hydroxy, methoxy, and nitro.
Claim 6
Dependent Claim
14 words
The stripping composition of claim 1, wherein said organosulfonic acid is para-toluene sulfonic acid.
Claim 7
Dependent Claim
20 words
The stripping composition of claim 1, wherein said solvent is selected from the group comprising dimethyl sulfoxide and diethyl sulfoxide.
Claim 8
Dependent Claim
12 words
The stripping composition of claim 1, wherein said solvent comprises dimethyl sulfoxide.
Claim 9
Dependent Claim
32 words
The stripping composition of claim 1, wherein said solvent comprises dimethyl sulfoxide, and said organosulfonic acid comprises para-toluene sulfonic acid present in an amount of about 10% by weight of said solvent.
Claim 10
Independent Claim
84 words
A method of stripping a positive working photoresist from a substrate comprising contacting said resist with a stripping composition comprising: (a) a solvent comprising one or more compounds of formula (I) ##STR7## wherein R and R" are each selected independently from straight and branched alkyl having 1 to 3 carbon atoms, and phenyl, each of which phenyl is optionally substituted with one or more hydroxyl, or R and R' together are alkylene of 3 to 6 carbon atoms; and (b) a suitable organosulfonic acid.
Claim 11
Independent Claim
84 words
A method of stripping a positive working photoresist from a substrate comprising contacting said resist with a stripping composition comprising: (a) a solvent comprising one or more compounds of formula (I) ##STR7## wherein R and R" are each selected independently from straight and branched alkyl having 1 to 3 carbon atoms, and phenyl, each of which phenyl is optionally substituted with one or more hydroxyl, or R and R' together are alkylene of 3 to 6 carbon atoms; and (b) a suitable organosulfonic acid.
Claim 12
Dependent Claim
16 words
The method of claim 9 wherein said stripping composition is at about 20° to 150° C.
Claim 13
Dependent Claim
14 words
The method of claim 9 wherein said stripping composition is at about 80°-90° C.
Claim 14
Dependent Claim
38 words
The method of claim 9, 10 or 11, wherein said solvent is dimethyl sulfoxide and said organosulfonic acid is para-toluene sulfonic acid and is present in an amount of about 5 to 40% by weight of said solvent.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-12-07 | 1985-06-08 | 1985-12-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-12-07 | 1989-06-08 | 1989-12-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-12-07 | 1993-06-08 | 1993-12-08 | $7700.00 | Window Closed / Lapsed |