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US4303489A Expired / Lapsed US ⏱️ 0.0 years remaining

Method and apparatus for producing a variable intensity pattern of sputtering material on a substrate

Assignee: Hauzer Industries BV
•
Filing: 1978-08-21
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Granted: 1981-12-01
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Expires: 1998-08-21
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Abstract

Abstract Method and apparatus for producing a variable intensity pattern of sputtering material on a substrate by providing a mask having a patterned opening therein between the cathode of a sputtering device and the substrate to be coated, the mask being so positioned as (a) to not affect the plasma over the cathode surface and (b) to be out of contact with the substrate surface, there being relative movement between at least the cathode and the substrate. The substrate may be either flat, curved or tubular, for example, there also being described apparatus and a method of making a broad band, dipole antenna.

Inventors

  • 👤 Charles F. Morrison, Jr.

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-23 22:18
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/04; C23C14/042; C23C14/044; B; B01; B01J; B01J2219/00; B01J2219/00274; B01J2219/00277; B01J2219/00351; B01J2219/00427; B01J2219/0043; B01J2219/00583; B01J2219/00603; B01J2219/00659; C40; C40B; C40B60/00; C40B60/14

Claims Analysis

Total Claims: 29
Claim 1
Independent Claim 219 words
A method of producing a dipole antenna having two variable electrical conductivity elements, said method comprising the steps of activating a sputtering device having a cathode including electrical conductivity material to be sputtered on at least one substrate, a plasma being established adjacent said cathode whereby said electrical conductivity material is sputtered toward said substrate; providing at least one mask having at least one patterned opening of fixed configuration therein between said cathode and said substrate so that (a) it is out of contact with the substrate and (b) it is no closer than about 3/4 inch from the cathode; providing a further mask in intimate contact with a portion of said substrate, said portion dividing the substrate into first and second areas where the two dipole elements are to be respectively deposited; relatively moving at least said cathode and said substrate with respect to each other so that the electrical conductivity material passing through said patterned opening in the mask deposits on the substrate, the thickness of the deposited material varying across at least one dimension of said first and second areas of the substrate to thereby form said variable electrical conductivity elements of the antenna due to the fixed configuration of the patterned opening; and depositing electrically conductive connector bands at opposite sides of said further mask.
Claim 2
Independent Claim 219 words
A method of producing a dipole antenna having two variable electrical conductivity elements, said method comprising the steps of activating a sputtering device having a cathode including electrical conductivity material to be sputtered on at least one substrate, a plasma being established adjacent said cathode whereby said electrical conductivity material is sputtered toward said substrate; providing at least one mask having at least one patterned opening of fixed configuration therein between said cathode and said substrate so that (a) it is out of contact with the substrate and (b) it is no closer than about 3/4 inch from the cathode; providing a further mask in intimate contact with a portion of said substrate, said portion dividing the substrate into first and second areas where the two dipole elements are to be respectively deposited; relatively moving at least said cathode and said substrate with respect to each other so that the electrical conductivity material passing through said patterned opening in the mask deposits on the substrate, the thickness of the deposited material varying across at least one dimension of said first and second areas of the substrate to thereby form said variable electrical conductivity elements of the antenna due to the fixed configuration of the patterned opening; and depositing electrically conductive connector bands at opposite sides of said further mask.
Claim 3
Dependent Claim 29 words
A method as in claim 1 where said relatively moving step includes fixing said mask and cathode in place and moving said substrate past the fixed mask and cathode.
Claim 4
Dependent Claim 27 words
A method as in claim 1 where said relatively moving step includes fixing said cathode in place and moving said mask and substrate past the fixed cathode.
Claim 5
Dependent Claim 13 words
A method as in claim 3 including moving said mask and substrate together.
Claim 6
Dependent Claim 16 words
A method as in claim 3 including moving said mask and substrate independently of one another.
Claim 7
Dependent Claim 29 words
A method as in claim 1 where said relatively moving step includes fixing said mask and substrate in place and moving said cathode past the fixed mask and substrate.
Claim 8
Dependent Claim 27 words
A method as in claim 1 where said relatively moving step includes fixing said substrate in place and moving said mask and cathode past the fixed substrate.
Claim 9
Dependent Claim 13 words
A method as in claim 7 including moving said mask and cathode together.
Claim 10
Dependent Claim 16 words
A method as in claim 7 including moving said mask and cathode independently of one another.
Claim 11
Dependent Claim 19 words
A method as in claim 1 where said relatively moving step includes independently moving both said cathode and substrate.
Claim 12
Dependent Claim 12 words
A method as in claim 10 including further independently moving said mask.
Claim 13
Dependent Claim 19 words
A method as in claim 1 including moving said cathode and substrate relatively linearly with respect to one another.
Claim 14
Dependent Claim 18 words
A method as in claim 12 including rotating said cathode and substrate relatively with respect to one another.
Claim 15
Dependent Claim 20 words
A method as in claim 1 where said relative moving step effects variable movement with respect to time and/or position.
Claim 16
Dependent Claim 20 words
A method as in claim 1 including establishing a magnetic field adjacent said cathode to magnetically enhance the sputtering thereof.
Claim 17
Dependent Claim 15 words
A method as in claim 15 where said cathode is generally rectangular in planar configuration.
Claim 18
Dependent Claim 22 words
A method as in claim 1 including a plurality of said masks and a plurality of substrates respectively associated with said masks.
Claim 19
Dependent Claim 38 words
A method as in claim 17 where a first half of said plurality of masks are disposed adjacent a first half of said cathode and a second half thereof are disposed adjacent the other half of the cathode.
Claim 20
Dependent Claim 43 words
A method as in claim 17 where said mask and said cathode are fixed with respect to one another and where the patterned openings in said plurality of masks vary in shape in the direction of relative movement of said cathode and substrate.
Claim 21
Independent Claim 13 words
A method as in claims 18 or 19 where said substrates are tubular.
Claim 22
Dependent Claim 13 words
A method as in claim 20 including means for rotating the tubular substrates.
Claim 23
Dependent Claim 30 words
A method as in claim 19 including moving said masks with respect to said cathode including moving said masks and said substrates in synchronism as the substrates pass the cathode.
Claim 24
Dependent Claim 19 words
A method as in claim 1 where said mask is no closer than about 1 inch from the cathode.
Claim 25
Dependent Claim 11 words
A method as in claim 1 where said substrate is flat.
Claim 26
Dependent Claim 11 words
A method as in claim 1 where said substrate is non-planar.
Claim 27
Dependent Claim 11 words
A method as in claim 1 where said substrate is tubular.
Claim 28
Dependent Claim 11 words
A method as in claim 26 including rotating the tubular substrate.
Claim 29
Dependent Claim 43 words
A method as in claim 1 where the configuration of said patterned opening in said mask is such that the variation in thickness of said deposited material is substantially linear across at least a corresponding first dimension of said first and second areas.

References Cited (Backward Citations)

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US3561993A Cited
US3573960A Cited
US3664948A Cited
US3775285A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1984-11-30 1985-06-01 1985-12-01 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1988-11-30 1989-06-01 1989-12-01 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1992-11-30 1993-06-01 1993-12-01 $7700.00 Window Closed / Lapsed

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