Mixed phase chromatographic compositions

Claim 2

A mixed phase composition comprising a porous particle suitable for use in chromatography having a first residue covalently bonded, to less than the maximum number of sterically available support matrix active sites, said first residue being capable of separating multiple-sorbable-sited compounds, said particle also having a second residue covalently bonded to other of the sterically available support matrix active sites, said second residue being inert or substantially inert to said compounds; said first and second residues being directly attached to said active sites.

Claim 3

The mixed phase composition of claim 1 wherein said porous particle is silica.

Claim 4

The mixed phase composition of claim 2 wherein said silica is a high performance liquid chromatography grade silica.

Claim 5

The mixed phase composition of claim 3 wherein said silica has a particle size of about 5 to about 20 microns and a pore size of about 100 to 4000 Angstroms.

Claim 6

The mixed phase composition of claim 1 or 2 wherein said first residue is formed from an organosilane group-containing reagent, said reagent being a weak anion exchange reagent, a strong anion exchange reagent, a weak cation exchange reagent, a strong cation exchange reagent, or a reverse phase reagent.

Claim 7

The mixed phase composition of claim 5 wherein said first residue is formed from a weak anion exchange reagent.

Claim 8

The mixed phase composition of claim 6 wherein said weak anion exchange reagent has the general formula: ##STR6## wherein n is an integer ranging from 2-5; R is methyl or ethyl; and X and Y are methyl or ethyl, with X and Y being the same or different.

Claim 9

The mixed phase composition of claim 7 wherein said weak anion exchange reagent is N, N- diethylaminopropyltrimethoxysilane.

Claim 10

The mixed phase composition of claim 1 wherein said first residue is bonded to less than 25% of said active sites.

Claim 11

The mixed phase composition of claim 1 or 2 wherein said second residue is formed from an organosilane group-containing reagent, said reagent being a diol, a diol precursor or an amide.

Claim 12

The mixed phase composition of claim 10 wherein said second residue is formed from a diol having the general formula: ##STR7## wherein n is an integer ranging from 2-5; and R is methyl or ethyl.

Claim 13

The mixed phase composition of claim 10 wherein said second residue is formed from a diol precursor.

Claim 14

The mixed phase composition of claim 10 wherein said second residue is formed from a diol precursor having the general formula: ##STR8## wherein n is an integer ranging from 2-5; and R is methyl or ethyl.

Claim 15

The mixed phase composition of claim 13 wherein said diol precursor is γ-glycidoxypropyltrimethoxysilane.

Claim 16

The mixed phase composition of claim 10 wherein said second residue is formed from an amide.

Claim 17

The mixed phase composition of claim 15 wherein said amide has the general formula: ##STR9## wherein n is an integer ranging from 2-5; R is methyl or ethyl, and R' is methyl or ethyl.

Claim 18

The mixed phase composition of claim 16 wherein said amide is N-(3-triethoxysilylpropyl)acetamide.

Claim 19

A process for the manufacture of a mixed phase composition comprising a porous particle suitable for use in chromatography having a first residue covalently bonded, to less than the maximum number of sterically available support matrix active sites, said first residue being capable of separating multiple-sorbable-sited compounds, said particle also having a second residue covalently bonded to other of the sterically available support matrix active sites, said second residue being inert or substantially inert to said compounds; said first and second residues being directly attached to said active sites; said process comprising the steps of: (a) degassing said particle, (b) reacting the reagent from which said first residue is formed with an aqueous slurry of said degassed particle at a time and temperature sufficient to covalently bond said first residue to said active sites; said particle being present in a stoichiometric excess, said excess being that of said active sites of said particle to said reagent, whereby less than the maximum number of sterically available porous particle active sites are bonded by said first residue; (c) reacting the product of the previous step with the reagent from which said second residue is formed, in a degassed aqueous slurry at a time and temperature sufficient to covalently bond said second residue directly to other of the sterically available porous particle active sites; and (d) recovering said mixed phase composition.

Claim 20

A process for the manufacture of a mixed phase composition comprising a porous particle suitable for use in chromatography having a first residue covalently bonded, to less than the maximum number of sterically available support matrix active sites, said first residue being capable of separating multiple-sorbable-sited compounds, said particle also having a second residue covalently bonded to other of the sterically available support matrix active sites, said second residue being inert or substantially inert to said compounds; said first and second residues being directly attached to said active sites; said process comprising the steps of: (a) degassing said particle, (b) reacting the reagent from which said first residue is formed with an aqueous slurry of said degassed particle at a time and temperature sufficient to covalently bond said first residue to said active sites; said particle being present in a stoichiometric excess, said excess being that of said active sites of said particle to said reagent, whereby less than the maximum number of sterically available porous particle active sites are bonded by said first residue; (c) reacting the product of the previous step with the reagent from which said second residue is formed, in a degassed aqueous slurry at a time and temperature sufficient to covalently bond said second residue directly to other of the sterically available porous particle active sites; and (d) recovering said mixed phase composition.

Claim 21

The process according to claim 18 wherein said particle is a high performance liquid chromatography grade silica.

Claim 22

The process according to claim 18 wherein the reaction of step (b) is carried out at about 20° C. to 50° C. for a period of from about 15 minutes to about 24 hours.

Claim 23

The process according to claim 18 wherein the reaction of step (c) is carried out at reflux temperature for a period of from about 1 hour to about 4 hours.

Claim 24

The process according to claim 19 wherein said silica has a particle size of from about 5 to about 20 microns and a pore size of about 100 to 4000 Angstroms.

Claim 25

The process according to claim 18 or 19 wherein said first residue is formed from an organosilane group-containing reagent, said reagent being a weak anion exchange reagent, a strong anion exchange reagent, a weak cation exchange reagent, a strong cation exchange reagent, or a reverse phase reagent.

Claim 26

The process according to claim 23 wherein said first residue is formed from a weak anion exchange reagent.

Claim 27

The process according to claim 24 wherein said weak anion exchange reagent has the general formula: ##STR10## wherein n is an integer ranging from 2-5; R is methyl or ethyl; and X and Y are methyl or ethyl, with X and Y being the same or different.

Claim 28

The process according to claim 25 wherein said weak anion exchange reagent is N,N-diethylaminopropyltrimethoxysilane.

Claim 29

The process according to claim 18 or 19 wherein said second residue is formed from an organosilane group-containing reagent, said reagent being a diol, a diol precursor, or an amide; provided that if the residue is formed from the diol precursor, the process further comprises hyrolyzing the product of step (c) to form a diol.

Claim 30

The process according to claim 27 wherein said second residue is formed from a diol having the general formula: ##STR11## wherein n is an integer ranging from 2-5; and R is methyl or ethyl.

Claim 31

The process according to claim 27 wherein said second residue is formed from a diol precursor.

Claim 32

The process according to claim 29 wherein said second residue is formed from a diol precursor having the general formula: ##STR12## wherein n is an integer ranging from 2-5; and R is methyl or ethyl.

Claim 33

The process according to claim 30 wherein said diol precursor is γ-glycidoxypropyltrimethoxysilane.

Claim 34

The process according to claim 27 wherein said second residue is formed from an amide.

Claim 35

The process according to claim 32 wherein said amide has the general formula: ##STR13## wherein n is an integer ranging from 2-5; R is methyl or ethyl, and R' is methyl or ethyl.

Claim 36

The process according to claim 33 wherein said amide is N-(3-triethoxysilylpropyl) acetamide.

Claim 37

The process according to claim 18 wherein the sterically available active sites of the particle range from about 10-50:1, on a molar basis, relative to the reagent from which the first residue is formed.

Claim 38

The process according to claim 18 wherein said multiple-sorbable-sited compound is a biopolymer.

Claim 39

The process according to claim 36 wherein said biopolymer is a nucleic acid.

Claim 40

The process according to claim 37 wherein said nucleic acid is transfer-RNA.