Palladium electroplating bath and process

Claim 2

An aqueous alkaline bath for the electrodeposition of palladium, comprising: (a) about 0.035 to 0.4 gram mole per liter of palladium ion; (b) at least about 1.5 gram moles per liter of ammonium radical; (c) about 1.25×10 -5 to 125×10 -5 gram mole per liter of 3-butyne-2-ol as a brightener; and (d) at least 0.1 gram mole of electrolyte per liter; said bath having a pH of about 9 to 11.5, and being free of cyanide radical.

Claim 3

The bath of claim 1 wherein the amount of palladium ion is about 0.11 to 0.23 gram mole per liter, the amount of said brightener is about 12.5×10 -5 to 25×10 -5 gram mole per liter, said pH is about 9.2 to 10.0, and wherein about 1.5 to 5.0 gram moles per liter of ammonium hydroxide is included.

Claim 4

The bath of claim 2 wherein said palladium ion is provided in said bath as compound selected from the group consisting of palladous nitrate, palladous chloride, and mixtures thereof.

Claim 5

The bath of claim 3 wherein sid palladium ion is provided as said mixture, the amount of palladous nitrate being about 0.09 to 0.19 gram mole per liter and the amount of palladous chloride being about 0.02 to 0.04 gram mole per liter.

Claim 6

The bath of claim 1 wherein said electrolyte includes a compound selected from the group consisting of amino acids, sulfamic acid, ammonium sulfite, sodium sulfite and potassium sulfite.

Claim 7

The bath of claim 5 wherein the compound of said group is glycine, and is present in said bath in a concentration of about 0.5 to 2.5 gram moles per liter.

Claim 8

The bath of claim 1 additionally including about 2.5×10 -5 to 60×10 -5 gram mole per liter of cetyltrimethylammonium bromide.

Claim 9

In a method of electroplating palladium deposits upon a workpiece, the steps comprising: a. immersing a workpiece having an electrically conductive surface in the aqueous alkaline bath of claim 1; b. maintaining the temperature of said bath at about 25° to 60° C.; c. applying an electrical potential across said workpiece and an anode to provide a current density of about 0.05 to 2.0 amperes per square decimeter at said workpiece, to effect plating of the desired thickness for the electrodeposit; and d. removing the electroplated workpiece from said bath.

Claim 10

The method of claim 8 wherein the ratio of the surface areas of the anode to said workpiece is about 2 to 5:1, and wherein said bath is agitated during electrodeposition.

Claim 11

The method of claim 9 wherein said current density at said workpiece is about 0.2 to 2.0 amperes per square decimeter, and wherein said method utilizes a rack plating technique.

Claim 12

The method of claim 9 wherein said current density is about 0.5 to 0.5 ampere per square decimeter, and wherein said method utilizes a barrel plating technique.