Patent US5355322A successfully refreshed from Google Patents.
Patent US4292398A successfully refreshed from Google Patents.
US4292398A
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US
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Method for the preparation of relief structures by phototechniques
Assignee: Siemens AG
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Filing: 1980-05-09
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Granted: 1981-09-29
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Expires: 2000-05-09
Abstract
Abstract The invention relates to a method for making more efficient the preparation of relief structures by phototechniques from mixtures containing acrylate- and/or methacrylate-group-containing polymers and photo-initiators. For this purpose, the invention provides the use of aromatic azides free of maleinimide groups as photo-initiators. The method according to the invention is suitable particularly for the structurization by phototechniques of insulating materials as well as of semiconductor and conductor materials.
Inventors
- 👤 Roland Rubner
- 👤 Eberhard Kuhn
- 👤 Hellmut Ahne
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 06:20
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/008; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/114; Y10S430/12
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
90 words
In a method for the preparation of relief structures by phototechniques wherein a mixture of a photo-initiator and an unsaturated photo- or radiation-sensitive polymer containing ethylenically unsaturated acrylate and/or methacrylate groups is applied to a substrate in the form of a layer or foil; the layer or foil is exposed or irradiated through a mask; and the non-exposed or non-irradiated portions of the layer or foil are removed from the substrate to obtain a relief structure, the improvement comprising utilizing as said photo-initiator an aromatic azide free of maleinimide groups.
Claim 2
Dependent Claim
90 words
In a method for the preparation of relief structures by phototechniques wherein a mixture of a photo-initiator and an unsaturated photo- or radiation-sensitive polymer containing ethylenically unsaturated acrylate and/or methacrylate groups is applied to a substrate in the form of a layer or foil; the layer or foil is exposed or irradiated through a mask; and the non-exposed or non-irradiated portions of the layer or foil are removed from the substrate to obtain a relief structure, the improvement comprising utilizing as said photo-initiator an aromatic azide free of maleinimide groups.
Claim 3
Dependent Claim
12 words
The method according to claim 1 wherein said photo-initiator is a sulfonylazide.
Claim 4
Dependent Claim
13 words
The method according to claim 1 wherein said mixture further contains a sensitizer.
Claim 5
Dependent Claim
11 words
The method according to claim 3 wherein said sensitizer is 4,4'-bis(dimethylamino)-benzophenone.
Claim 6
Dependent Claim
13 words
The method according to claim 1 wherein said mixture further contains a maleinimide.
Claim 7
Dependent Claim
11 words
The method according to claim 5 wherein said maleinimide is N-phenylmaleinimide.
Claim 8
Dependent Claim
14 words
The method according to claim 1 wherein said relief structure obtained is subsequently annealed.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-09-28 | 1985-03-30 | 1985-09-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-09-28 | 1989-03-30 | 1989-09-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-09-28 | 1993-03-30 | 1993-09-29 | $7700.00 | Window Closed / Lapsed |