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US4290187A
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Method of making charge-coupled arrangement in the two-phase technique
Assignee: Siemens AG
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Filing: 1979-07-25
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Granted: 1981-09-22
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Expires: 1999-07-25
Abstract
Abstract A charge-coupled arrangement in the two-phase technique in accordance with the charge-coupled-device principle in which an electrically insulating layer is applied to a substrate of semi-conductor material, with such electrodes arranged in spaced relation on such layer, a second electrically insulating layer disposed on the electrodes and additional electrodes being disposed on the second insulating layer, in which such additional electrodes extend into spaces separating adjacent electrodes applied to the substrate, with the zone of the substrate beneath such further electrodes being more highly doped than the substrate. The electrodes may comprise aluminum silicon, molybdenum, chromium or tungsten, while the second insulating layer may comprise SiO 2 or Al 2 O 3 .
Inventors
- 👤 Karl-Ulrich Stein
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 12:13
CPC Classifications
H; H10; H10D; H10D62/00; H10D62/10; H10D62/17; H10D62/213; H10D62/335; H10D44/00; H10D44/40; H10D44/45; H10D44/472; H10D44/474
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
189 words
A method of producing a charge-coupled arrangement in two-phase technique, comprising two series of cooperable spaced electrodes with the spaced electrodes of one series overlying spaces between the electrodes of the other series, said method comprising the steps of applying a layer of insulating material to a substrate of semiconductor material, applying to said insulating layer a plurality of electrodes comprising one of said series and disposed in spaced sequential relation on such layer, utilizing said electrodes as masking members and introducing doping atoms by means of ion implantation into said semiconductor material between said electrodes, whereby said semiconductor material is provided with more highly doped zones of a same conductivity type as the substrate spanning the space gaps between such series of electrodes, applying, at least to said electrodes, a second layer of insulating material, and applying to the structure so formed further electrodes, comprising the other of said series, with the latter electrodes extending into said space gaps between the electrodes of said first series, in complete insulated relation with respect thereto, and overlying said more highly doped zones in insulated relation with respect to said zones.
Claim 2
Independent Claim
189 words
A method of producing a charge-coupled arrangement in two-phase technique, comprising two series of cooperable spaced electrodes with the spaced electrodes of one series overlying spaces between the electrodes of the other series, said method comprising the steps of applying a layer of insulating material to a substrate of semiconductor material, applying to said insulating layer a plurality of electrodes comprising one of said series and disposed in spaced sequential relation on such layer, utilizing said electrodes as masking members and introducing doping atoms by means of ion implantation into said semiconductor material between said electrodes, whereby said semiconductor material is provided with more highly doped zones of a same conductivity type as the substrate spanning the space gaps between such series of electrodes, applying, at least to said electrodes, a second layer of insulating material, and applying to the structure so formed further electrodes, comprising the other of said series, with the latter electrodes extending into said space gaps between the electrodes of said first series, in complete insulated relation with respect thereto, and overlying said more highly doped zones in insulated relation with respect to said zones.
References Cited (Backward Citations)
US3852799A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-09-21 | 1985-03-23 | 1985-09-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-09-21 | 1989-03-23 | 1989-09-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-09-21 | 1993-03-23 | 1993-09-22 | $7700.00 | Window Closed / Lapsed |