US4286049A
Expired / Lapsed
US
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Method of forming a negative resist pattern
Assignee: NTT Inc
•
Filing: 1979-07-03
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Granted: 1981-08-25
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Expires: 1999-07-03
Abstract
Abstract A method for forming a negative resist pattern which applies as a high energy beam-sensitive material a polymer consisting of components expressed by the general structural formula: <IMAGE> where: X=halogen or <IMAGE> (R2 is H or CH3) R1=H or CH3 n=1 to 3 m, l=integers having a relationship of 50</=m+l</=50,000.
Inventors
- 👤 Saburo Imamura
- 👤 Shungo Sugawara
- 👤 Hirotsugu Sato
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 20:09
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; G03F7/0388
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
166 words
A methd of forming a negative resist pattern which comprises the steps of: (a) depositing a polymer film sensitive to high energy beams on a substrate; (b) exposing the polymer film to high energy beams applied by deep ultraviolet rays, X-rays, electron beams or gamma rays in a prescribed pattern to crosslink the exposed portions of the film; and (c) removing the portions of the film other than the crosslinked portions with a solvent, wherein the polymer is formed of components expressed by the general structural formula: ##STR20## wherein X is the same or different groups selected from the group consisting of halogens and groups of the formula ##STR21## wherein R 2 is a hydrogen atom or methyl group; R 1 is a hydrogen atom or methyl group; n is an integer of 1, 2 or 3; and l+m are each an integer and the total of all the l and m integers in the polymer are in the range of 50 to 50,000, and m/m+l≧0.2.
Claim 2
Dependent Claim
166 words
A methd of forming a negative resist pattern which comprises the steps of: (a) depositing a polymer film sensitive to high energy beams on a substrate; (b) exposing the polymer film to high energy beams applied by deep ultraviolet rays, X-rays, electron beams or gamma rays in a prescribed pattern to crosslink the exposed portions of the film; and (c) removing the portions of the film other than the crosslinked portions with a solvent, wherein the polymer is formed of components expressed by the general structural formula: ##STR20## wherein X is the same or different groups selected from the group consisting of halogens and groups of the formula ##STR21## wherein R 2 is a hydrogen atom or methyl group; R 1 is a hydrogen atom or methyl group; n is an integer of 1, 2 or 3; and l+m are each an integer and the total of all the l and m integers in the polymer are in the range of 50 to 50,000, and m/m+l≧0.2.
Claim 3
Dependent Claim
23 words
The method according to claim 1, wherein X is at least one element selected from the group consisting of chlorine, iodine and bromine.
Claim 4
Dependent Claim
13 words
The method according to claim 1, wherein R 1 is a hydrogen atom.
Claim 5
Dependent Claim
12 words
The method according to claim 1, wherein R 1 is methyl group.
Claim 6
Dependent Claim
12 words
The method according to claim 1, wherein R 2 is methyl group.
Claim 7
Independent Claim
24 words
The method according to any one of claims 1, 3, 4, and 5, wherein the character X of the general structural formula is chlorine.
Claim 8
Dependent Claim
17 words
The method according to claim 1, wherein the dispersivity range of the polymer is smaller than 1.2.
Claim 9
Dependent Claim
17 words
The method according to claim 6, wherein the dispersivity range of the polymer is smaller than 1.2.
Claim 10
Dependent Claim
12 words
The method according to claim 4, wherein R 2 is methyl group.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-08-24 | 1985-02-23 | 1985-08-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-08-24 | 1989-02-23 | 1989-08-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-08-24 | 1993-02-23 | 1993-08-25 | $7700.00 | Window Closed / Lapsed |