Method of depositing a silicon oxide dielectric layer

Claim 1

In a method for preparing a video disc comprising a substrate containing video information in the form of a surface relief pattern having a conductive layer thereon and dielectric layer thereover wherein the said dielectric layer is deposited by the steps comprising introducing the substrate into an evacuated chamber, introducing oxygen and a dielectric precursor into the chamber and activating the pecursor around the substrate by means of a glow discharge whereby a dielectric coating is deposited on the disc, wherein the improvement comprises preparing a silicon oxide dielectric layer wherein the dielectric precursor has the formula ##STR5## wherein R 1 is selected from the group consisting of H and --CH 3 , R 2 and R 3 are independently selected from the group consisting of H, --CH 3 , --OCH 3 and --OC 2 H 5 and R 4 is selected from the group consisting of --OCH 3 and --OC 2 H 5 whereby a silicon oxide dielectric layer is deposited.