US4279984A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Positive resist for high energy radiation
Assignee: Fuji Chemical Industrial Co Ltd
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Filing: 1978-12-28
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Granted: 1981-07-21
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Expires: 1998-12-28
Abstract
Abstract A resist material used for forming a positive image by application of radiation, said material comprising as principal constituent poly(ethyl α-cyanoacrylate), poly(ethyl α-amidoacrylate) or a binary copolymer thereof or a ternary copolymer of poly(ethyl α-cyanoacrylate), poly(ethyl α-amidoacrylate) and polymethacrylonitrile. The minimum incident charge of radiation required for forming a desired resist pattern by use of this resist material is as low as 10 -7 coulomb/cm 2 , or far lower than the level required in use of other known resist materials, and a positive resist image which can well stand the chromium etching solutions is obtained by short-time irradiation.
Inventors
- 👤 Shunsuke Matsuda
- 👤 Soji Tsuchiya
- 👤 Masami Honma
- 👤 Gentaro Nagamatsu
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 05:53
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
100 words
A positively imaged resist film, said film consisting essentially of a polymer selected from the group consisting of (A) a homopolymer consisting of structural units of the formula ##STR3## (B) a homopolymer consisting of structural units of the formula ##STR4## (C) a copolymer of (I) and (II) and (D) a terpolymer consisting of units (I) and (II) and ##STR5## (where R represents an alkyl group with 1 to 4 carbon atoms), wherein the molar ratio of (I):(II):(III) in said copolymer or terpolymer is 1.0 to 0.5:0 to 0.2:0 to 0.5 and wherein the average molecular weight is 50,000 to 1,000,000.
Claim 2
Dependent Claim
100 words
A positively imaged resist film, said film consisting essentially of a polymer selected from the group consisting of (A) a homopolymer consisting of structural units of the formula ##STR3## (B) a homopolymer consisting of structural units of the formula ##STR4## (C) a copolymer of (I) and (II) and (D) a terpolymer consisting of units (I) and (II) and ##STR5## (where R represents an alkyl group with 1 to 4 carbon atoms), wherein the molar ratio of (I):(II):(III) in said copolymer or terpolymer is 1.0 to 0.5:0 to 0.2:0 to 0.5 and wherein the average molecular weight is 50,000 to 1,000,000.
Claim 3
Dependent Claim
12 words
A resist film according to claim 1 consisting essentially of poly(ethyl α-cyanoacrylate).
Claim 4
Dependent Claim
12 words
A resist film according to claim 1 consisting essentially of poly(ethyl α-amidoacrylate).
Claim 5
Dependent Claim
16 words
A resist film according to claim 1 consisting essentially of a copolymer of α-cyanoethylacrylate and α-amidoethylacrylate.
Claim 6
Dependent Claim
17 words
A resist film according to claim 1 consisting essentially of a terpolymer of α-cyanoethylacrylate, α-amidoacrylate and methacrylonitrile.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-07-20 | 1985-01-19 | 1985-07-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-07-20 | 1989-01-19 | 1989-07-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-07-20 | 1993-01-19 | 1993-07-21 | $7700.00 | Window Closed / Lapsed |