Method for modifying the surface properties of polymer substrates

Claim 3

A method for modigying the surface properties of polymer substrates as claimed in claim 1, wherein said polymer substrates to be treated are polybutadiene; polyisoprene; polypentadiene; copolymers which are produced from two or more of the monomers for producing the above polymers; two component or multi-component copolymers which are produced by using one or more of said monomers and a comonomer or comonomers of ethylene, propylene, isobutylene, vinyl chloride, vinyl acetate, styrene, acrylic ester, methacrylic ester, acrylonitrile and methacrylonitrile; unsaturated polyesters; unsaturated polyepoxides; unsaturated polyamides; unsaturated polyacryls; internally cross-linked products of these polymers; polystyrene; polypropylene; polyvinyl chloride; polyvinyl carbazole; polyacrylonitrile; polyacrylic ester; polyvinyl acetate; copolymers which are made from two or more kinds of the monomers for producing these polymers; two component or multi-component copolymers which are made from one or more of the latter monomers and a comonomer or comonomers of methacrylic ester, methacrylonitrile, butadiene and isoprene; copolymer of vinyl acetate and ethylene; polyester; polyamide; polyurethane; polycarbonate; polyepoxide; polyethylene and internally cross-linked products of these polymers.

Claim 4

A method for modifying the surface properties of polymer substrates as claimed in claim 1, wherein said photopolymerizable composition contains one member or more of radically polymerizable compounds selected from the group consisting of maleic anhydride, acrylic amide, methacrylic amide, N-methyl acrylic amide, N-methyl methacrylic amide, N-ethyl acrylic amide, N-ethyl methacrylic amide, N-propyl acrylic amide, N-propyl methacrylic amide, N-butyl acrylic amide, N-butyl methacrylic amide, N-2-hydroxyethyl acrylic amide, N-2-hydroxyethyl methacrylic amide, N,N-methylene bisacrylic amide, N,N-methylene bismethacrylic amide, N-methylol acrylic amide, acrylic morpholine, methacrylic morpholine, N-propyl hydroxyacrylic amide, N,N-dimethyl acrylic amide, N,N-dimethyl methacrylic amide, N,N-diethyl acrylic amide, N,N-diethyl methacrylic amide, diacetone acrylic amide, acrylic acid, methacrylic acid, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, diethylene glycol monoacrylate, diethylene glycol monomethacrylate, triethylene glycol monoacrylate, triethylene glycol monomethacrylate, polyethylene glycol monoacrylate, polyethylene glycol monomethacrylate (the molecular weight of polyethylene glycol is not less than 170), 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 8-hydroxypropyl acrylate, 8-hydroxypropyl methacrylate, glycerol monoacrylate, glycerol monomethacrylate, polyethylene glycol diacrylate, polyethylene glycol dimethacrylate (the molecular weight of polyethylene glycol is not less than 170), N-vinyl imidazole, vinylpyridine, N-vinyl piperidone, N-vinyl caprolactam, N-vinyl pyrrolidone, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl acrylate, 2-diethylaminoethyl methacrylate, 2-sulfoethyl acrylate, 2-sulfoethyl methacrylate, 8-sulfopropyl acrylate, 8-sulfopropyl methacrylate, p-styrene sulfonic acid, 2-phosphoric ethylene acrylate, 2-phosphoric ethylene methacrylate, 2-phosphoric-1-chloromethylethylene acrylate, and 2-phosphoric-1-chloromethylethylene methacrylate, styrene, acrylic esters, methacrylic esters and vinyl esters.

Claim 5

A method for modifying the surface properties of polymer substrates as claimed in claim 1, wherein said photopolymerizable composition further contains at least one member of photosensitizers, thickening agents, surface active agents and solvents.

Claim 6

A method for modifying the surface properties of polymer substrates as claimed in claim 1, wherein said polymer substrate is polyethylene and said photopolymerizable composition comprises acrylic amide and benzophenone.

Claim 7

A method for modifying the surface properties of polymer substrates as claimed in claim 1, wherein said polymer substrate is polypropylene and said photopolymerizable composition comprises acrylic acid and benzophenone.

Claim 8

A method for modifying the surface properties of polymer substrates as claimed in claim 1, wherein said polymer substrate is polybutadiene and said photopolymerizable composition comprises acrylic amide and benzophenone.

Claim 9

A method for modifying the surface properties of polymer substrates as claimed in claim 1, wherein said polymer substrate is polyvinylchloride and said photopolymerizable compsition comprises 2-hydroxyethylacrylate and benzophenone.