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US4260425A Expired / Lapsed US ⏱️ 0.0 years remaining

Phosphorus removal from surface regions of phosphosilicate glass microcircuit layers

Assignee: Maxim Integrated Products Inc
•
Filing: 1979-04-04
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Granted: 1981-04-07
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Expires: 1999-04-04
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Abstract

Abstract A method for reducing the phosphorus concentration in exposed surface areas of a phosphosilicate glass microcircuit layer to reduce the corrosivity of the layer. The method comprises a two step treatment of the layer surface: first, exposing the surface to water vapor at an elevated temperature for a time sufficient to hydrate available phosphorus in a region adjoining the surface, and second, removing the resultant acidic hydration products by rinsing the surface with water.

Inventors

  • 👤 Ralph P. Ulrich
  • 👤 Deborah W. Hewitt

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 08:43
CPC Classifications
H; H10; H10P; H10P95/00; C; C03; C03C; C03C23/00

Claims Analysis

Total Claims: 17
Claim 1
Independent Claim 64 words
A method for treating a phosphorus-containing silicon oxide glass layer to render uncovered surface regions thereof substantially noncorrosive to metal, comprising the steps of: exposing said uncovered regions of the glass layer to a humid atmosphere for a time sufficient to hydrate substantially all of the available phosphorus within said regions, and removing resultant acidic hydration products by rinsing said surface regions with water.
Claim 2
Independent Claim 64 words
A method for treating a phosphorus-containing silicon oxide glass layer to render uncovered surface regions thereof substantially noncorrosive to metal, comprising the steps of: exposing said uncovered regions of the glass layer to a humid atmosphere for a time sufficient to hydrate substantially all of the available phosphorus within said regions, and removing resultant acidic hydration products by rinsing said surface regions with water.
Claim 3
Dependent Claim 15 words
The method of claim 1, wherein said humid atmosphere is in the form of steam.
Claim 4
Dependent Claim 16 words
The method of claim 2, wherein said regions are exposed to steam at substantially atmospheric pressure.
Claim 5
Independent Claim 74 words
A method for treating a phosphorus-containing silicon oxide glass layer to reduce the phosphorus concentration in selected surface regions of said layer, comprising the steps of: exposing the selected regions to a humid atmosphere for a time and at a temperature sufficient to hydrate at least a portion of available phosphorus within said regions and form aqueous reaction products on the layer's surface, and removing the reaction products by rinsing the surface with water.
Claim 6
Independent Claim 74 words
A method for treating a phosphorus-containing silicon oxide glass layer to reduce the phosphorus concentration in selected surface regions of said layer, comprising the steps of: exposing the selected regions to a humid atmosphere for a time and at a temperature sufficient to hydrate at least a portion of available phosphorus within said regions and form aqueous reaction products on the layer's surface, and removing the reaction products by rinsing the surface with water.
Claim 7
Dependent Claim 13 words
The method of claim 4, wherein said humid atmosphere consists essentially of steam.
Claim 8
Dependent Claim 30 words
The method of claim 4, wherein said exposing step is performed at a temperature and for a time sufficient to substantially deplete the layer of available phosphorus in said regions.
Claim 9
Dependent Claim 92 words
In the manufacture of an electrical microcircuit structure that includes a phosphosilicate glass layer, the improvement wherein the phosphorus concentration in uncovered surface regions of the layer is reduced to render said regions less corrosive to metal, said reduction being achieved by a method comprising the steps of: exposing said regions to water vapor for a time sufficient to hydrate a portion of the available phosphorus within said regions and form aqueous acidic reaction products on the surface thereof, and removing said reaction products by subjecting said regions to a water rinse.
Claim 10
Dependent Claim 92 words
In the manufacture of an electrical microcircuit structure that includes a phosphosilicate glass layer, the improvement wherein the phosphorus concentration in uncovered surface regions of the layer is reduced to render said regions less corrosive to metal, said reduction being achieved by a method comprising the steps of: exposing said regions to water vapor for a time sufficient to hydrate a portion of the available phosphorus within said regions and form aqueous acidic reaction products on the surface thereof, and removing said reaction products by subjecting said regions to a water rinse.
Claim 11
Dependent Claim 28 words
The method of claim 7, wherein said regions are exposed to water vapor for a time sufficient to substantially deplete the layer of available phosphorus within said regions.
Claim 12
Dependent Claim 15 words
The method of claim 7, wherein said water vapor is in the form of steam.
Claim 13
Dependent Claim 16 words
The method of claim 9, wherein said regions are exposed to steam at substantially atmospheric pressure.
Claim 14
Dependent Claim 21 words
The method of claim 10, wherein said regions are exposed to said steam atmosphere for a period of about 30 minutes.
Claim 15
Dependent Claim 69 words
In the manufacture of an electrical microcircuit structure that includes a phosphosilicate glass layer, the improvement wherein uncovered surface regions of said layer are exposed to steam for a time sufficient to hydrate a substantial portion of the available phosphorus in said regions and form aqueous acidic reaction products at the surface thereof, and wherein said reaction products are subsequently removed by subjecting said regions to a water rinse.
Claim 16
Dependent Claim 69 words
In the manufacture of an electrical microcircuit structure that includes a phosphosilicate glass layer, the improvement wherein uncovered surface regions of said layer are exposed to steam for a time sufficient to hydrate a substantial portion of the available phosphorus in said regions and form aqueous acidic reaction products at the surface thereof, and wherein said reaction products are subsequently removed by subjecting said regions to a water rinse.
Claim 17
Dependent Claim 14 words
The improvement of claim 12, wherein said steam exposure is at substantially atmospheric pressure.

References Cited (Backward Citations)

US4139660A Cited
US3709749A Cited
US3940511A Cited
US4023951A Cited
US4010042A Cited
US4079522A Cited
US4105427A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1984-04-06 1984-10-06 1985-04-07 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1988-04-06 1988-10-06 1989-04-07 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1992-04-06 1992-10-06 1993-04-07 $7700.00 Window Closed / Lapsed

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