US4259369A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Image hardening process
Assignee: International Business Machines Corp
•
Filing: 1979-12-13
•
Granted: 1981-03-31
•
Expires: 1999-12-13
Abstract
Abstract Resist images are hardened so that they are flow resistant at elevated temperatures by coating the image with a layer of a porous metal or metal oxide.
Inventors
- 👤 Benjamin J. Canavello
- 👤 Michael Hatzakis
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 06:35
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/40
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
78 words
A process for forming a flow resistant organic polymer resist mask on a substrate comprising the steps of; evaporating a porous film of material selected from a metal or an insulator selected from the group consisting of Al, Al 2 O 3 , Cr, Ag, Si, SiO and SiO 2 , onto the surface of said resist mask, heating the filmed resist mask to cause the hardening of said resist mask, and then removing the metal or insulator.
Claim 2
Dependent Claim
78 words
A process for forming a flow resistant organic polymer resist mask on a substrate comprising the steps of; evaporating a porous film of material selected from a metal or an insulator selected from the group consisting of Al, Al 2 O 3 , Cr, Ag, Si, SiO and SiO 2 , onto the surface of said resist mask, heating the filmed resist mask to cause the hardening of said resist mask, and then removing the metal or insulator.
Claim 3
Dependent Claim
26 words
A process according to claim 1 wherein said metal or insulator is evaporated at a pressure of from about 10 -2 torr. to about 1 torr.
Claim 4
Dependent Claim
26 words
A process according to claim 1 wherein said metal or insulator is evaporated to a film thickness of from about 200 A to about 1000 A.
Claim 5
Dependent Claim
15 words
The process of claim 1 wherein said evaporated film is Al 2 O 3 .
Claim 6
Dependent Claim
11 words
The process of claim 1 wherein said evaporated film is Cr.
Claim 7
Dependent Claim
11 words
The process of claim 1 wherein said evaporated film is Ag.
Claim 8
Dependent Claim
11 words
The process of claim 1 wherein said evaporated film is Si.
Claim 9
Dependent Claim
11 words
The process of claim 1 wherein said evaporated film is SiO.
Claim 10
Dependent Claim
13 words
The process of claim 1 wherein said evaporated films is SiO 2 .
Claim 11
Dependent Claim
17 words
The process of claim 1 wherein said resist mask is formed from a positive acting resist composition.
Claim 12
Dependent Claim
17 words
The process of claim 1 wherein said resist mask is formed from a negative acting resist composition.
References Cited (Backward Citations)
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Cited
US3402073A
Cited
US3582390A
Cited
US3920483A
Cited
US4022927A
Cited
US4125650A
Cited
US4187331A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-03-30 | 1984-09-29 | 1985-03-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-03-30 | 1988-09-29 | 1989-03-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-03-30 | 1992-09-29 | 1993-03-31 | $7700.00 | Window Closed / Lapsed |