Patent US4258126A successfully refreshed from Google Patents.
US4258126A
Expired / Lapsed
US
⏱️ 0.0 years remaining
High resolution recording medium and method for producing same
Assignee: Dr Johannes Heidenhain GmbH
•
Filing: 1979-01-19
•
Granted: 1981-03-24
•
Expires: 1999-01-19
Abstract
Abstract A high resolution recording medium is provided which employs at least two layers of inorganic material which act as filters for two different colors of visible light. In one embodiment, microphoto lithography techniques are used to create microinterference filters in the desired patterns on a glass substrate. Recording media constructed according to this invention exhibit increased stability with respect to time and improved resistance to light and heat damage as compared with prior art recording media employing organic dyes.
Inventors
- 👤 Leopold Hiesinger
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 09:45
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/88; G03C; G03C7/00; G03F1/54; G03F1/58; Y; Y10; Y10S; Y10S428/00; Y10S428/913; Y10T; Y10T428/00; Y10T428/24; Y10T428/24802
Claims Analysis
Total Claims: 29
Claim 1
Independent Claim
174 words
A method for producing a high resolution recording medium on a substrate, comprising the following steps: (a) applying at least one reflecting layer of an inorganic material to a surface of the substrate; (b) applying a photoresist material to the reflecting layer; (c) exposing a patterned portion of the photoresist material by means of an exposure mask; (d) developing the photoresist material; (e) removing at least a portion of the reflecting layer not covered with photoresist material; (f) removing the remaining photoresist material; (g) applying a substantially uniformly thick interference layer of a translucent inorganic material to the surface of the substrate and the remaining reflecting layer; (h) applying at least one additional reflecting layer of an inorganic material to the interference layer; (i) applying a photoresist material to the additional reflecting layer; (j) exposing a patterned portion of the photoresist material by means of an exposure mask; (k) developing the photoresist material; (l) removing the portion of the additional reflecting layer not covered with photoresist material; and (m) removing the remaining photoresist material.
Claim 2
Independent Claim
174 words
A method for producing a high resolution recording medium on a substrate, comprising the following steps: (a) applying at least one reflecting layer of an inorganic material to a surface of the substrate; (b) applying a photoresist material to the reflecting layer; (c) exposing a patterned portion of the photoresist material by means of an exposure mask; (d) developing the photoresist material; (e) removing at least a portion of the reflecting layer not covered with photoresist material; (f) removing the remaining photoresist material; (g) applying a substantially uniformly thick interference layer of a translucent inorganic material to the surface of the substrate and the remaining reflecting layer; (h) applying at least one additional reflecting layer of an inorganic material to the interference layer; (i) applying a photoresist material to the additional reflecting layer; (j) exposing a patterned portion of the photoresist material by means of an exposure mask; (k) developing the photoresist material; (l) removing the portion of the additional reflecting layer not covered with photoresist material; and (m) removing the remaining photoresist material.
Claim 3
Dependent Claim
17 words
The method of claim 1 wherein the at least one reflecting layer is formed of a metal.
Claim 4
Dependent Claim
16 words
The method of claim 1 wherein the at least one reflecting layer is formed of silver.
Claim 5
Dependent Claim
20 words
The method of claim 1 wherein the at least one reflecting layer is formed of a high refraction translucent material.
Claim 6
Dependent Claim
22 words
The method of claim 4 wherein the at least one reflecting layer is substantially free of absorption throughout the visible wavelength range.
Claim 7
Dependent Claim
42 words
The method of claim 1 further comprising the step of repeating at least steps (g)-(m) on the substrate to form a second patterned interference filter having a color hue different from the color hue of the interference filter formed by steps (a)-(m).
Claim 8
Dependent Claim
202 words
The method of claim 1 wherein the portion of the at least one reflecting layer remaining after step (f) includes a first zone and a second zone; the interference layer applied in step (g) is applied over both the first and second zones; the portion of the at least one additional reflecting layer remaining after step (m) covers only the first zone such that the interference layer, the at least one reflecting layer, and the at least one additional reflecting layer cooperate to form an interference filter in the first zone for a first color hue; and the method further includes the following steps: (n) applying an additional substantially uniformly thick interference layer of a translucent inorganic material to the interference layer and the remaining additional reflecting layer such that the additional interference layer extends over the first and second zones; (o) applying at least one further reflecting layer over the additional interference layer in the region of the second zone only such that the at least one reflecting layer, the interference layer, the additional interference layer, and the at least one further reflecting layer cooperate to form an interference filter for a second color hue, distinct from the first color hue.
Claim 9
Independent Claim
471 words
A method for producing a high resolution recording medium on a substrate, said method comprising the following steps: (a)applying at least one first reflecting layer of a high refraction, translucent, inorganic material to a surface of the substrate; (b) removing a patterned portion of the reflecting layer applied in the preceding step by first applying a photoresist material to the layer applied in the preceding step, then exposing a patterned portion of the photoresist material by means of an exposure mask, then developing the photoresist material, then removing at least a portion of the layer applied in the preceding step not covered with photoresist material, and then removing the remaining photoresist material; (c) applying at least one second reflecting layer of a low refraction, translucent, inorganic material to the surface of the substrate and the remaining first reflecting layer, and then repeating step (b) above to remove a patterned portion of the second reflecting layer; (d) applying at least one third reflecting layer of a high refraction, translucent, inorganic material to the surface of the substrate and the remaining second reflecting layer, and then repeating step (b) above to remove a patterned portion of the third reflecting layer such that at least a portion of the low refraction second reflecting layer is interposed between the high refraction first reflecting layer and the high refraction third reflecting layer; (e) applying a substantially uniformly thick interference layer of a translucent inorganic material to the surface of the substrate and the remaining reflecting layer; (f) applying at least one fourth reflecting layer of a high refraction, translucent, inorganic material to at least a portion of the interference layer; (g) removing a patterned portion of the reflecting layer applied in the preceding step by first applying a photoresist material to the layer applied in the preceding step, then exposing a patterned portion of the photoresist material by means of an exposure mask, then developing the photoresist material, then removing at least a portion of the layer applied in the preceding step not covered with photoresist material, and then removing the remaining photoresist material; (h) applying at least one fifth reflecting layer of a low refraction, translucent, inorganic material to at least a portion of the interference layer and the remaining fourth reflecting layer, and then repeating step (g) above to remove a patterned portion of the fifth reflecting layer; and (i) applying at least one sixth reflecting layer of a high refraction, translucent, inorganic material to at least a portion of the interference layer and the remaining fifth reflecting layer, and then repeating step (g) above to remove a patterned portion of the sixth reflecting layer such that at least a portion of the low refraction fifth reflecting layer is interposed between the high refraction fourth reflecting layer and the high refraction sixth reflecting layer.
Claim 10
Independent Claim
471 words
A method for producing a high resolution recording medium on a substrate, said method comprising the following steps: (a)applying at least one first reflecting layer of a high refraction, translucent, inorganic material to a surface of the substrate; (b) removing a patterned portion of the reflecting layer applied in the preceding step by first applying a photoresist material to the layer applied in the preceding step, then exposing a patterned portion of the photoresist material by means of an exposure mask, then developing the photoresist material, then removing at least a portion of the layer applied in the preceding step not covered with photoresist material, and then removing the remaining photoresist material; (c) applying at least one second reflecting layer of a low refraction, translucent, inorganic material to the surface of the substrate and the remaining first reflecting layer, and then repeating step (b) above to remove a patterned portion of the second reflecting layer; (d) applying at least one third reflecting layer of a high refraction, translucent, inorganic material to the surface of the substrate and the remaining second reflecting layer, and then repeating step (b) above to remove a patterned portion of the third reflecting layer such that at least a portion of the low refraction second reflecting layer is interposed between the high refraction first reflecting layer and the high refraction third reflecting layer; (e) applying a substantially uniformly thick interference layer of a translucent inorganic material to the surface of the substrate and the remaining reflecting layer; (f) applying at least one fourth reflecting layer of a high refraction, translucent, inorganic material to at least a portion of the interference layer; (g) removing a patterned portion of the reflecting layer applied in the preceding step by first applying a photoresist material to the layer applied in the preceding step, then exposing a patterned portion of the photoresist material by means of an exposure mask, then developing the photoresist material, then removing at least a portion of the layer applied in the preceding step not covered with photoresist material, and then removing the remaining photoresist material; (h) applying at least one fifth reflecting layer of a low refraction, translucent, inorganic material to at least a portion of the interference layer and the remaining fourth reflecting layer, and then repeating step (g) above to remove a patterned portion of the fifth reflecting layer; and (i) applying at least one sixth reflecting layer of a high refraction, translucent, inorganic material to at least a portion of the interference layer and the remaining fifth reflecting layer, and then repeating step (g) above to remove a patterned portion of the sixth reflecting layer such that at least a portion of the low refraction fifth reflecting layer is interposed between the high refraction fourth reflecting layer and the high refraction sixth reflecting layer.
Claim 11
Dependent Claim
27 words
The method of claim 8 wherein the first, second, third, fourth, fifth, and sixth reflecting layers are each substantially free of absorption throughout the visible wavelength range.
Claim 12
Dependent Claim
21 words
The method of claim 1 or 8 wherein the interference layer is substantially free of absorption throughout the visible wavelength range.
Claim 13
Dependent Claim
19 words
The method of claim 1 or 8 wherein the reflecting layers are applied by means of a sputter process.
Claim 14
Dependent Claim
62 words
The method of claim 1 or 8 wherein only a part of at least one of the plurality of reflecting layers not covered with photoresist material is removed such that, after removal of said part, said at least one reflecting layer has a first thickness in a first region and a second thickness, different from the first thickness, in a second region.
Claim 15
Dependent Claim
26 words
The method of claim 1 or 8 wherein the entire portion of one of the plurality of reflecting layers not covered with photoresist material is removed.
Claim 16
Dependent Claim
26 words
The method of claim 1 or 8 wherein at least one of the reflecting layers is removed at a rate of about 10 nanometers per minute.
Claim 17
Dependent Claim
26 words
The method of claim 1 or 8 wherein the photoresist is soluble in an organic solvent and remains soluble after removal of the respective reflecting layer.
Claim 18
Dependent Claim
60 words
The method of claim 1 or 8 wherein the interference layer is vaporized over the entire surface of the substrate and the reflecting and interference layers form a patterned interference filter in which the thickness of the interference layer determines the color hue of the filter and the reflectivity of the reflecting layers determines the color saturation of the filter.
Claim 19
Dependent Claim
24 words
The method of claim 16 wherein the interference layer comprises a material selected from the group consisting of translucent inorganic oxides, fluorides and sulfides.
Claim 20
Dependent Claim
39 words
The method of claim 16 wherein the interference layer consists essentially of a material selected from the group consisting of MgF 2 , SiO 2 , ThF, SIO, Ta 2 O 5 , and Fe 2 O 3 .
Claim 21
Dependent Claim
42 words
The method of claim 8 further comprising the step of repeating at least steps (e)-(i) on the substrate to form a second patterned interference filter having a color hue different from the color hue of the interference filter formed by steps (a)-(i).
Claim 22
Dependent Claim
211 words
The method of claim 8 wherein the portion of the first, second, and third reflecting layers remaining after step (d) includes a first zone and a second zone;the interference layer applied in step (e) is applied over both the first and second zones; the portion of the fourth, fifth, and sixth reflecting layers remaining after step (i) covers only the first zone such that the first, second, and third reflecting layers, the interference layer and the fourth, fifth, and sixth reflecting layers cooperate to form an interference filter in the first zone for a first color hue; and the method further includes the following steps: (j) applying an additional substantially uniformly thick interference layer of a translucent inorganic material to the interference layer and the remaining portions of the sixth reflecting layer such that the additional interference layer extends over the first and second zones; (k) applying at least one further reflecting layer over the additional interference layer in the region of the second zone only such that the first, second, and third reflecting layers, the interference layer, the additional interference layer, and the at least one further reflecting layer cooperate to form an interference filter in the second zone for a second color hue, distinct from the first color hue.
Claim 23
Dependent Claim
45 words
The method of claim 1 or 8 further including the following additional step: forming at least one patterned interference filter over the interference filter formed by the preceding steps such that a combined color hue is generated by the two interference filters by multiplicative mixing.
Claim 24
Dependent Claim
12 words
The method of claim 1 or 8 wherein the substrate is transparent.
Claim 25
Dependent Claim
12 words
The method of claim 1 or 8 wherein the substrate is glass.
Claim 26
Dependent Claim
12 words
The method of claim 1 or 8 wherein the substrate is quartz.
Claim 27
Dependent Claim
18 words
The method of claim 1 or 8 wherein the substrate is opaque and the substrate surface is reflecting.
Claim 28
Dependent Claim
17 words
The method of claim 1 or 8 wherein the interference layer is formed of a fluorescent material.
Claim 29
Dependent Claim
27 words
The method of claim 1 or 8 wherein the interference layer is formed of a fluorescent material chosen from the group consisting of MgF 2 and ZnS.
References Cited (Backward Citations)
DE902713C
Cited
GB697036A
Cited
US3521961A
Cited
US3824100A
Cited
US3971874A
Cited
US3891440A
Cited
US4019905A
Cited
US4026743A
Cited
US4151321A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-03-23 | 1984-09-22 | 1985-03-24 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-03-23 | 1988-09-22 | 1989-03-24 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-03-23 | 1992-09-22 | 1993-03-24 | $7700.00 | Window Closed / Lapsed |