US4233515A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Instrument for determining the radiation parameters of a focused charged-particle beam and method
Assignee: Balzers und Leybold Deutschland Holding AG
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Filing: 1978-11-24
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Granted: 1980-11-11
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Expires: 1998-11-24
Abstract
Abstract Method and device for determining the radiation parameters of a focused beam of charged particles guided periodically over a target surface, especially in an electron beam melting and vaporizing system wherein the target is the surface of a melt. At least one probe is positioned in front of the target surface in the direction of radiation and within the beam trace, the probe being connected to an electrical display device. The output signal of the probe is displayed via a cathode ray tube and the reversal point of the charged-particle beam is determined on the basis of the time interval between the signal peaks in conjunction with the velocity of the beam movement.
Inventors
- 👤 Walter Dietrich
- 👤 Herbert Stephan
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 22:20
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/305; G; G01; G01T; G01T1/00; G01T1/29; H05; H05B; H05B7/00
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
96 words
Device for determining the beam parameters of a focused beam of charged particles guided periodically over a target surface in electron beam melting wherein the target is the surface of a melt in an evaporation crucible, which comprises at least one probe means positioned in front of the target surface in the direction of the beam within the beam trace and in the marginal area of the crucible, said probe means being connected to an electrical display instrument for displaying the detected parameters relating to the beam with respect to the marginal area of the crucible.
Claim 2
Dependent Claim
96 words
Device for determining the beam parameters of a focused beam of charged particles guided periodically over a target surface in electron beam melting wherein the target is the surface of a melt in an evaporation crucible, which comprises at least one probe means positioned in front of the target surface in the direction of the beam within the beam trace and in the marginal area of the crucible, said probe means being connected to an electrical display instrument for displaying the detected parameters relating to the beam with respect to the marginal area of the crucible.
Claim 3
Dependent Claim
21 words
Device of claim 1 wherein the probe means comprises an electrically conductive wire whose width is smaller than the beam diameter.
Claim 4
Dependent Claim
14 words
Device of claim 2 wherein the wire is disposed transversely to the beam movement.
Claim 5
Dependent Claim
19 words
Device of claim 3 wherein at least two wires are disposed successively in the direction of the beam movement.
Claim 6
Dependent Claim
22 words
Device of claim 1 wherein the probe means comprises a U-shaped wire loop whose crossbar is aligned transverse to the beam movement.
Claim 7
Dependent Claim
22 words
Device of claim 1 wherein the probe means comprises a U-shaped wire loop whose crossbar is aligned parallel to the beam movement.
Claim 8
Dependent Claim
24 words
Device of claim 1 wherein the probe means comprises a U-shaped wire loop, parallel to whose crossbar an additional electrically conductive wire is disposed.
Claim 9
Dependent Claim
18 words
Device of claim 1 wherein the probe means is adapted to be swung out of the beam trace.
Claim 10
Dependent Claim
123 words
Measuring process for determining the beam parameters of a focused beam of charged particles guided periodically over a target surface in electron beam vaporizing wherein the target is the surface of a melt in an evaporation crucible which comprises positioning a probe connected to an electrical display instrument in front of the target surface in the direction of radiation within the beam trace and in the marginal area of the crucible, displaying the output signal of the probe by means of a cathode ray tube, and determining the reversal point of the charged-particle beam with respect to the marginal area of the crucible on the basis of the time interval between the signal peaks in conjunction with the velocity of the beam movement.
Claim 11
Dependent Claim
123 words
Measuring process for determining the beam parameters of a focused beam of charged particles guided periodically over a target surface in electron beam vaporizing wherein the target is the surface of a melt in an evaporation crucible which comprises positioning a probe connected to an electrical display instrument in front of the target surface in the direction of radiation within the beam trace and in the marginal area of the crucible, displaying the output signal of the probe by means of a cathode ray tube, and determining the reversal point of the charged-particle beam with respect to the marginal area of the crucible on the basis of the time interval between the signal peaks in conjunction with the velocity of the beam movement.
Claim 12
Dependent Claim
55 words
Process of claim 9 wherein the output signal of the probe is displayed by means of a cathode ray tube, and the cross section of the charged-particle beam at the point of impingement is determined on the basis of the time interval between the signal flanks in conjunction with the velocity of the beam movement.
Claim 13
Dependent Claim
54 words
Process of claim 9 wherein the output signal of the probe is displayed by means of a cathode ray tube, and the velocity of movement of the charged-particle beam in the area of the probe is determined on the basis of the time interval between the signal flanks in conjunction with the crossbar length.
Claim 14
Dependent Claim
61 words
In an electron beam melting apparatus having an evaporation crucible with a melt therein and a focused beam of charged particles guided periodically over the surface of the melt, the improvement comprising: means for controlling the beam with respect to its evaporation properties and its positioning to protect the marginal area of the crucible to prevent contamination of the vaporized melt.
Claim 15
Dependent Claim
61 words
In an electron beam melting apparatus having an evaporation crucible with a melt therein and a focused beam of charged particles guided periodically over the surface of the melt, the improvement comprising: means for controlling the beam with respect to its evaporation properties and its positioning to protect the marginal area of the crucible to prevent contamination of the vaporized melt.
Claim 16
Dependent Claim
62 words
The apparatus according to claim 12, wherein the beam controlling means comprises at least one probe positioned in front of the melt surface in the direction of the beam within the beam trace and in the marginal area of the crucible and means for displaying the output of the probe corresponding to the parameters relating to the beam at the marginal area.
Claim 17
Dependent Claim
59 words
In an electron beam melting process of the type wherein a focused beam of charged particles is guided periodically over the surface of a melt in an evaporation crucible, the improvement comprising protecting the marginal area of the crucible by controlling the beam with respect to its evaporation properties and its positioning to prevent contamination of the vaporized melt.
Claim 18
Dependent Claim
59 words
In an electron beam melting process of the type wherein a focused beam of charged particles is guided periodically over the surface of a melt in an evaporation crucible, the improvement comprising protecting the marginal area of the crucible by controlling the beam with respect to its evaporation properties and its positioning to prevent contamination of the vaporized melt.
Claim 19
Dependent Claim
59 words
The process according to claim 14, wherein the step of controlling comprises positioning at least one probe in front of the melt surface in the direction of radiation within the beam trace and in the marginal area of the crucible and displaying the output of the probe corresponding to the parameters relating to the beam at the marginal area.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1983-11-11 | 1984-05-12 | 1984-11-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1987-11-11 | 1988-05-12 | 1988-11-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1991-11-11 | 1992-05-12 | 1992-11-11 | $7700.00 | Window Closed / Lapsed |