Patent US4227090A successfully refreshed from Google Patents.
US4227090A
Expired / Lapsed
US
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Electron beam microfabrication apparatus and method
Assignee: Raytheon Co
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Filing: 1979-02-21
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Granted: 1980-10-07
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Expires: 1999-02-21
Abstract
Abstract Electron beam microfabrication apparatus has spherically concave photocathode pattern 40 which when excited produces patterned electron beam 48 which is accelerated by electrode 44 and magnetically focused by magnet 58 to impinge as a demagnified patterned field 60 on a photoresist carrying semiconductor wafer 36 mounted of wafer holder 34.
Inventors
- 👤 Kurt Amboss
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 21:48
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/317; H01J37/3174; H01J37/3175; B; B82; B82Y; B82Y10/00; B82Y40/00; H01J2237/00; H01J2237/04; H01J2237/047; H01J2237/0473; H01J2237/04735; H01J2237/049; H01J2237/0492; H01J2237/04922; H01J2237/30; H01J2237/317; H01J2237/3175; H01J2237/31777; H01J2237/31779
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
85 words
An electron beam microfabrication apparatus comprising: a substantially spherically curved female surface for receiving thereon a patterned photocathode; a semiconductor wafer holder positioned in front of said surface; and a lens for focusing electrons emitted from said patterned photocathode onto a wafer on said wafer holder on a demagnification scale so that when said photocathode is excited the patterned electron emission therefrom is focussed and demagnified and projected onto a resist on a wafer on said wafer holder for exposure thereon of a demagnified pattern.
Claim 2
Dependent Claim
85 words
An electron beam microfabrication apparatus comprising: a substantially spherically curved female surface for receiving thereon a patterned photocathode; a semiconductor wafer holder positioned in front of said surface; and a lens for focusing electrons emitted from said patterned photocathode onto a wafer on said wafer holder on a demagnification scale so that when said photocathode is excited the patterned electron emission therefrom is focussed and demagnified and projected onto a resist on a wafer on said wafer holder for exposure thereon of a demagnified pattern.
Claim 3
Dependent Claim
40 words
The electron beam microfabrication apparatus of claim 1 wherein said substantially spherically curved surface is on the interior of a dome which is at least partly transparent so that energization of said photocathode is by light projected through said dome.
Claim 4
Dependent Claim
47 words
The electron beam microfabrication apparatus of claim 2 wherein a substantially spherical condenser lens electrode is positioned between said photocathode and wafer holder, said lens electrode being for having a positive potential applied thereto with respect to said photocathode to accelerate and demagnify the patterned electron beam.
Claim 5
Dependent Claim
29 words
The electron beam microfabrication apparatus of claim 2 wherein lens is a said magnetic focussing lens has first and second pole pieces between which said electron beam is projected.
Claim 6
Dependent Claim
51 words
The electron beam microfabrication apparatus of claim 4 wherein a substantially spherical condenser lens electrode is positioned between said photocathode and said first magnetic lens pole piece, said lens electrode being for having a positive potential applied thereto with respect to said photocathode to accelerate and demagnify the patterned electron beam.
Claim 7
Dependent Claim
67 words
The electron beam microfabrication apparatus of claim 5 wherein said photocathode dome forms one end of an enclosure, and there is a central web through said enclosure to separate said enclosure into a front volume and a rear volume, with said photocathode in said front volume and said wafer holder in said rear volume so that said wafer holder can be removed without pressurizing said front volume.
Claim 8
Dependent Claim
67 words
The electron beam microfabrication apparatus of claim 1 wherein said photocathoe dome forms one end of an enclosure, and there is a central web through said enclosure to separate said enclosure into a front volume and a rear volume, with said photocathode in said front volume and said wafer holder in said rear volume so that said wafer holder can be removed without pressurizing said front volume.
Claim 9
Dependent Claim
50 words
The electron beam microfabrication apparatus of claim 7 wherein said web is placed at a focal point of the patterned electron beam and there is a focusing aperture through said web and there is a valve plate positionable across said focusing apertures so that said focusing aperture can be closed.
Claim 10
Dependent Claim
67 words
The electron beam microfabrication apparatus of claim 1 wherein said photocathode has registration marks on the corner thereof and there is a registration mask positionable to cover substantially all of said photocathode from energization, but to permit energization of said alignment marks so that said wafer holder can be moved to place particular locations on said wafer holder under the electron beam projected from said alignment marks.
Claim 11
Independent Claim
67 words
The method of exposing material supported on a wafer holder comprising the steps of: forming a substantially spherically female curved photocathode mask pattern; exciting the photocathode to produced an electron beam patterned in accordance with the photocathode mask pattern; accelerating, focusing, and demagnifying the electron beam with its mask pattern; and positioning material in front of the electron beam to be pattern exposed on a reduced scale.
Claim 12
Independent Claim
67 words
The method of exposing material supported on a wafer holder comprising the steps of: forming a substantially spherically female curved photocathode mask pattern; exciting the photocathode to produced an electron beam patterned in accordance with the photocathode mask pattern; accelerating, focusing, and demagnifying the electron beam with its mask pattern; and positioning material in front of the electron beam to be pattern exposed on a reduced scale.
Claim 13
Dependent Claim
34 words
The method of electron beam microfabrication of claim 10 wherein the accelerating and demagnifying is accomplished by a curved accelerating electrode and the focusing is accomplished by a magnetic focusing and demagnifying magnetic fields.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1983-10-07 | 1984-04-07 | 1984-10-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1987-10-07 | 1988-04-07 | 1988-10-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1991-10-07 | 1992-04-07 | 1992-10-07 | $7700.00 | Window Closed / Lapsed |