Patent US4225908A successfully refreshed from Google Patents.
US4225908A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Lighting fixture and glass enclosure having high angle anti-reflection film
Assignee: Optical Coating Laboratory Inc
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Filing: 1978-07-20
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Granted: 1980-09-30
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Expires: 1998-07-20
Abstract
Abstract Lighting fixture having housing with an open side. A lamp is mounted in the housing and is capable of producing light rays which pass through the open side of the housing. A glass protective covering is carried by the housing and encloses the open side. At least one surface of the glass is provided with anti-reflection film formed by a chemical etch/leach process on the one surface. The anti-reflection film increases the transmission of the high angle light rays from the lamp.
Inventors
- 👤 Edward A. Small, Jr.
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 10:33
CPC Classifications
F; F21; F21V; F21V3/00; F21V3/04
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
102 words
In a lighting fixture, a housing having an open side, a lamp mounted in said housing and producing light rays passing through the open side, a glass enclosure carried by said housing and enclosing the open side and having first and second surfaces, at least one of said surfaces being formed of an anti-reflection film produced by a chemical etch/leach process which is porous and skeletonized and has a high silica content said film having a tansmittance of better than approximately 98% for light incident and at an angle of approximately 60°; for the wave band of approximately 400 to 700 nanometers.
Claim 2
Dependent Claim
102 words
In a lighting fixture, a housing having an open side, a lamp mounted in said housing and producing light rays passing through the open side, a glass enclosure carried by said housing and enclosing the open side and having first and second surfaces, at least one of said surfaces being formed of an anti-reflection film produced by a chemical etch/leach process which is porous and skeletonized and has a high silica content said film having a tansmittance of better than approximately 98% for light incident and at an angle of approximately 60°; for the wave band of approximately 400 to 700 nanometers.
References Cited (Backward Citations)
US3322946A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1983-09-30 | 1984-03-31 | 1984-09-30 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1987-09-30 | 1988-03-31 | 1988-09-30 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1991-09-30 | 1992-03-31 | 1992-09-30 | $7700.00 | Window Closed / Lapsed |