US4219731A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for detecting object picture by electron beam
Assignee: Hitachi Ltd
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Filing: 1978-11-21
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Granted: 1980-08-26
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Expires: 1998-11-21
Abstract
Abstract A method is disclosed in which an object picture such as an integrated circuit pattern is precisely and exactly detected at high speed by the use of an electron beam. At least two kinds of signals obtained by irradiating an object with an electron beam are detected and subjected to an adding/subtracting operation and a resulting signal is used to detect the object picture. Thus, a satisfactory S/N ratio can be obtained. The method is applicable to the inspection of a mask used for integrated circuits.
Inventors
- 👤 Masatoshi Migitaka
- 👤 Koichiro Mizukami
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 12:35
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/26; H01J37/28
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
101 words
A method for detecting a mask pattern by an electron beam, comprising: a first step of irradiating with an electron beam a mask having a pattern formed on a surface thereof; a second step of separately detecting a signal relating to reflected electrons from said mask and a signal relating to secondary electrons from said mask; a third step of adding the reflected-electron signal and the secondary-electron signal; and a fourth step of binary-coding and sampling a signal resulting from said third step into digitalized information and subjecting said digitalized information to picture processing to detect the pattern of said mask.
Claim 2
Independent Claim
101 words
A method for detecting a mask pattern by an electron beam, comprising: a first step of irradiating with an electron beam a mask having a pattern formed on a surface thereof; a second step of separately detecting a signal relating to reflected electrons from said mask and a signal relating to secondary electrons from said mask; a third step of adding the reflected-electron signal and the secondary-electron signal; and a fourth step of binary-coding and sampling a signal resulting from said third step into digitalized information and subjecting said digitalized information to picture processing to detect the pattern of said mask.
Claim 3
Independent Claim
117 words
A method for detecting a mask pattern by an electron beam, comprising: a first step of irradiating with an electron beam a mask having a pattern formed on a surface thereof; a second step of separately detecting a signal relating to reflected electrons from said mask, a signal relating to secondary electrons from said mask and a signal relating to absorption current through said mask; a third step of adding the reflected-electron signal, the secondary-electron signal and a phase-inverted version of the absorption current signal; a fourth step of binary-coding and sampling a signal resulting from said third step into digital information and subjecting said digital information to picture processing to detect the pattern of said mask.
Claim 4
Independent Claim
117 words
A method for detecting a mask pattern by an electron beam, comprising: a first step of irradiating with an electron beam a mask having a pattern formed on a surface thereof; a second step of separately detecting a signal relating to reflected electrons from said mask, a signal relating to secondary electrons from said mask and a signal relating to absorption current through said mask; a third step of adding the reflected-electron signal, the secondary-electron signal and a phase-inverted version of the absorption current signal; a fourth step of binary-coding and sampling a signal resulting from said third step into digital information and subjecting said digital information to picture processing to detect the pattern of said mask.
Claim 5
Independent Claim
99 words
A method for detecting an object picture by an electron beam, comprising: a first step or irradiating an object with an electron beam; a second step of separately detecting a signal relating to reflected electrons from said object, a signal relating to secondary electrons from said object and a signal relating to absorption current through said object; a third step of adding said reflected-electron signal, said secondary-electron signal and a phase inverted version of said absorption current signal; and a fourth step of converting a signal resulting from said third step into digital information to detect an object picture.
Claim 6
Independent Claim
99 words
A method for detecting an object picture by an electron beam, comprising: a first step or irradiating an object with an electron beam; a second step of separately detecting a signal relating to reflected electrons from said object, a signal relating to secondary electrons from said object and a signal relating to absorption current through said object; a third step of adding said reflected-electron signal, said secondary-electron signal and a phase inverted version of said absorption current signal; and a fourth step of converting a signal resulting from said third step into digital information to detect an object picture.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1983-08-26 | 1984-02-25 | 1984-08-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1987-08-26 | 1988-02-25 | 1988-08-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1991-08-26 | 1992-02-25 | 1992-08-26 | $7700.00 | Window Closed / Lapsed |