Patent US4200463A successfully refreshed from Google Patents.
US4200463A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Semiconductor device manufacture using photoresist protective coating
Assignee: Motorola Solutions Inc
•
Filing: 1975-12-19
•
Granted: 1980-04-29
•
Expires: 1995-12-19
Abstract
Abstract A protective coating composition for photoresist layers comprising an aqueous solution of a vinyl alcohol polymer, at least one surfactant having wetting properties and at least one surfactant having lubricant properties is disclosed. An improved process for forming a photoresist pattern employing this protective coating composition is also disclosed. The composition and process are particularly useful in the fabrication of semiconductor devices.
Inventors
- 👤 Dervin L. Flowers
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 04:02
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/092
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
97 words
In the method for forming a photoresist pattern on a semiconductor substrate by coating the substrate with a layer of photoresist, exposing the layer to a light pattern and developing the exposed layer by treating it with a solvent, the improvement which comprises: coating the photoresist layer prior to exposure with a protective coating composition comprising a water-soluble, film-forming polyvinyl alcohol, a surfactant having wetting properties in an amount sufficient to reduce the surface tension of the composition and a surfactant having lubricant properties in an amount sufficient to reduce wear on materials in contact there with.
Claim 2
Dependent Claim
97 words
In the method for forming a photoresist pattern on a semiconductor substrate by coating the substrate with a layer of photoresist, exposing the layer to a light pattern and developing the exposed layer by treating it with a solvent, the improvement which comprises: coating the photoresist layer prior to exposure with a protective coating composition comprising a water-soluble, film-forming polyvinyl alcohol, a surfactant having wetting properties in an amount sufficient to reduce the surface tension of the composition and a surfactant having lubricant properties in an amount sufficient to reduce wear on materials in contact there with.
Claim 3
Dependent Claim
46 words
The method of claim 1 wherein said coating composition comprises an aqueous solution containing: 0.3 to 3.0% by weight of said polyvinyl alcohol; 0.005 to 0.3% by weight of said surfactant having wetting properties; and 0.005 to 0.1% by weight of said surfactant having lubricant properties.
Claim 4
Dependent Claim
65 words
The method of claim 2 wherein said coating composition comprises: 0.5 to 1.5% by weight of said vinyl alcohol; 0.05 to 0.15% by weight of said surfactant having wetting properties; and 0.005 to 0.02% by weight of said surfactant having lubricant properties where said lubricant surfactant is non-metallic or 0.02 to 0.1% by weight of said surfactant having lubricant properties where said surfactant is metallic.
Claim 5
Dependent Claim
21 words
The method of claim 1 further including the step of removing said protective coating composition prior to developing the exposed layer.
Claim 6
Dependent Claim
10 words
The method of claim 4 wherein said substrate is silicon.
References Cited (Backward Citations)
US2430585A
Cited
US2588765A
Cited
US3046131A
Cited
US2798004A
Cited
US3317320A
Cited
US3404004A
Cited
US3458311A
Cited
US3652273A
Cited
US3762928A
Cited
US3843368A
Cited
US3906133A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1983-04-29 | 1983-10-29 | 1984-04-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1987-04-29 | 1987-10-29 | 1988-04-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1991-04-29 | 1991-10-29 | 1992-04-29 | $7700.00 | Window Closed / Lapsed |