US4200463A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Semiconductor device manufacture using photoresist protective coating
Assignee: Motorola Solutions Inc
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Filing: 1975-12-19
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Granted: 1980-04-29
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Expires: 1995-12-19
Abstract
Abstract A protective coating composition for photoresist layers comprising an aqueous solution of a vinyl alcohol polymer, at least one surfactant having wetting properties and at least one surfactant having lubricant properties is disclosed. An improved process for forming a photoresist pattern employing this protective coating composition is also disclosed. The composition and process are particularly useful in the fabrication of semiconductor devices.
Inventors
- 👤 Dervin L. Flowers
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 03:06
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/092
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
97 words
In the method for forming a photoresist pattern on a semiconductor substrate by coating the substrate with a layer of photoresist, exposing the layer to a light pattern and developing the exposed layer by treating it with a solvent, the improvement which comprises: coating the photoresist layer prior to exposure with a protective coating composition comprising a water-soluble, film-forming polyvinyl alcohol, a surfactant having wetting properties in an amount sufficient to reduce the surface tension of the composition and a surfactant having lubricant properties in an amount sufficient to reduce wear on materials in contact there with.
Claim 2
Dependent Claim
97 words
In the method for forming a photoresist pattern on a semiconductor substrate by coating the substrate with a layer of photoresist, exposing the layer to a light pattern and developing the exposed layer by treating it with a solvent, the improvement which comprises: coating the photoresist layer prior to exposure with a protective coating composition comprising a water-soluble, film-forming polyvinyl alcohol, a surfactant having wetting properties in an amount sufficient to reduce the surface tension of the composition and a surfactant having lubricant properties in an amount sufficient to reduce wear on materials in contact there with.
Claim 3
Dependent Claim
46 words
The method of claim 1 wherein said coating composition comprises an aqueous solution containing: 0.3 to 3.0% by weight of said polyvinyl alcohol; 0.005 to 0.3% by weight of said surfactant having wetting properties; and 0.005 to 0.1% by weight of said surfactant having lubricant properties.
Claim 4
Dependent Claim
65 words
The method of claim 2 wherein said coating composition comprises: 0.5 to 1.5% by weight of said vinyl alcohol; 0.05 to 0.15% by weight of said surfactant having wetting properties; and 0.005 to 0.02% by weight of said surfactant having lubricant properties where said lubricant surfactant is non-metallic or 0.02 to 0.1% by weight of said surfactant having lubricant properties where said surfactant is metallic.
Claim 5
Dependent Claim
21 words
The method of claim 1 further including the step of removing said protective coating composition prior to developing the exposed layer.
Claim 6
Dependent Claim
10 words
The method of claim 4 wherein said substrate is silicon.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1983-04-29 | 1983-10-29 | 1984-04-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1987-04-29 | 1987-10-29 | 1988-04-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1991-04-29 | 1991-10-29 | 1992-04-29 | $7700.00 | Window Closed / Lapsed |