US4186684A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for vapor deposition of materials
Assignee: Individual
•
Filing: 1977-06-01
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Granted: 1980-02-05
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Expires: 1997-06-01
Abstract
Abstract An apparatus for performing vapor deposition processes on a substrate includes essential housing having a centrally located reaction chamber, with the housing having a pair of opposed openings in opposed sides thereof. Cover means are removably secured to the housing for closing the opening and they define coolant chambers therein. Reaction gases are supplied and exhausted from the reaction chamber through a ducting system, and the housing includes at least one additional coolant chamber therein about periphery of the reaction chamber between the cover plates. Coolant is supplied to and exhausted from the coolant chambers in order to cool the reaction chamber, and support means are provided in the reaction chamber supporting a substrate thereon upon which vapor deposition is to occur. Heat is supplied in the reaction chamber on the side of the support means opposite the substrate to heat the substrate.
Inventors
- 👤 Joseph Intrater
- 👤 Ralph Gorman
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 00:39
CPC Classifications
C; C30; C30B; C30B25/00; C30B25/02; C30B25/10; C23; C23C; C23C16/00; C23C16/44; C23C16/458; C23C16/4582; C23C16/4587
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
145 words
Apparatus for performing vapor deposition processes on a substrate, comprising a central housing having a centrally located reaction chamber formed therein, said housing having a pair of opposed openings in opposed sides thereof, cover plate means removably secured to said housing for closing said opening, said cover plate means defining coolant chambers therein; means for supplying and exhausting reaction gases from the reaction chamber; said housing including means for defining at least one additional coolant chamber therein about a portion of the periphery of the reaction chamber between said cover plate means; means for supplying and exhausting coolant to and from said coolant chambers; support means in said reaction chamber for supporting a substrate thereon upon which vapor deposition is to occur; and means for supplying heat in said reaction chamber on the side of said support means opposite said substrate to heat the substrate.
Claim 2
Dependent Claim
145 words
Apparatus for performing vapor deposition processes on a substrate, comprising a central housing having a centrally located reaction chamber formed therein, said housing having a pair of opposed openings in opposed sides thereof, cover plate means removably secured to said housing for closing said opening, said cover plate means defining coolant chambers therein; means for supplying and exhausting reaction gases from the reaction chamber; said housing including means for defining at least one additional coolant chamber therein about a portion of the periphery of the reaction chamber between said cover plate means; means for supplying and exhausting coolant to and from said coolant chambers; support means in said reaction chamber for supporting a substrate thereon upon which vapor deposition is to occur; and means for supplying heat in said reaction chamber on the side of said support means opposite said substrate to heat the substrate.
Claim 3
Dependent Claim
116 words
Apparatus for use in performing vapor deposition processes on a substrate, comprising a hollow chimney having a centrally located reaction chamber formed therein, said chimney having a pair of opposed openings formed in the sides thereof at said reaction chamber; a pair of hollow cover plates removably secured to said chimney for closing said openings, said cover plates having cooling chambers formed therein; first conduit means operatively connected to said cooling chambers for supplying and exhausting cooling fluid to and from said cooling chambers; support means in said reactor chamber for supporting a substrate thereon upon which said vapor deposition is to occur, and means for supplying and exhausting reaction gases to and from said chimney.
Claim 4
Dependent Claim
116 words
Apparatus for use in performing vapor deposition processes on a substrate, comprising a hollow chimney having a centrally located reaction chamber formed therein, said chimney having a pair of opposed openings formed in the sides thereof at said reaction chamber; a pair of hollow cover plates removably secured to said chimney for closing said openings, said cover plates having cooling chambers formed therein; first conduit means operatively connected to said cooling chambers for supplying and exhausting cooling fluid to and from said cooling chambers; support means in said reactor chamber for supporting a substrate thereon upon which said vapor deposition is to occur, and means for supplying and exhausting reaction gases to and from said chimney.
Claim 5
Dependent Claim
48 words
Apparatus as defined in claim 2 wherein said chimney has a pair of generally annular cooling chambers formed therein respectively surrounding said chimney openings, and second conduit means operatively connected to said chimney cooling chambers for supplying and exhausting cooling fluid to and from said chimney cooling chambers.
Claim 6
Dependent Claim
26 words
Apparatus as defined in claim 3 including means for slideably mounting said cover plates on said chimney for movement towards and away from said chimney openings.
Claim 7
Dependent Claim
30 words
Apparatus as defined in claim 3 wherein said substrate support means is mounted on at least one of said cover plates on the side thereof facing its associated chimney opening.
Claim 8
Dependent Claim
38 words
Apparatus as defined in claim 5 including separate oppositely facing walls in said chimney inclined downwardly and towards each other within said chimney for defining a confined flow path for reaction gases through the chimney and reaction chamber.
References Cited (Backward Citations)
US3460510A
Cited
US3645230A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1983-02-04 | 1983-08-06 | 1984-02-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1987-02-04 | 1987-08-06 | 1988-02-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1991-02-04 | 1991-08-06 | 1992-02-05 | $7700.00 | Window Closed / Lapsed |