Patent US4174159A successfully refreshed from Google Patents.
US4174159A
Expired / Lapsed
US
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Exposure meter for photomicrography
Assignee: Ernst Leitz Wetzlar GmbH
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Filing: 1978-04-11
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Granted: 1979-11-13
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Expires: 1998-04-11
Abstract
Abstract Photomicrographic exposure meter for cameras attached to microscopes in which part of the picture-taking beam is reflected by means of a beam-splitter and where the reflected beam part projects an image of the object onto an image plane, measuring field stop is located in the image plane with an aperture for detail or spot measurements and an insertable photo-electric detector cooperates therewith downstream of the stop in the direction of light. The beam part is reflected by at least one specular means (12,61) to the measuring field stop (13). The stop is gimbal-suspended and means are provided both for displacing the gimbal-suspended specular means (12,61) and for viewing the object detail appearing in the stop aperture.
Inventors
- 👤 Winfried Kraft
- 👤 Gunter Reinheimer
- 👤 Herbert Leiter
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 09:55
CPC Classifications
G; G02; G02B; G02B21/00; G02B21/36; G02B21/361; G02B21/0096
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
146 words
Photomicrographic exposure meter for a camera attached to a microscope comprising optical means defining a picture-taking beam for microscopic examination of an object positioned on a stage, a beam-splitter located along said picture taking beam and reflecting a part of the picture-taking beam, said part of the picture taking beam projecting an image of said object onto an image plane, a measuring field stop with an aperture for detail or spot measurements located in said image plane, an insertable photo-electric detector positioned downstream of said stop in the direction of and along said part of the picture taking beam, at least one specular means (12,61) reflecting said part of the picture taking beam to said measuring field stop (13), a gimbal suspension for said specular means, means for displacing said gimbal-suspended specular means (12,61) and means for viewing said object detail appearing in said stop aperture.
Claim 2
Dependent Claim
146 words
Photomicrographic exposure meter for a camera attached to a microscope comprising optical means defining a picture-taking beam for microscopic examination of an object positioned on a stage, a beam-splitter located along said picture taking beam and reflecting a part of the picture-taking beam, said part of the picture taking beam projecting an image of said object onto an image plane, a measuring field stop with an aperture for detail or spot measurements located in said image plane, an insertable photo-electric detector positioned downstream of said stop in the direction of and along said part of the picture taking beam, at least one specular means (12,61) reflecting said part of the picture taking beam to said measuring field stop (13), a gimbal suspension for said specular means, means for displacing said gimbal-suspended specular means (12,61) and means for viewing said object detail appearing in said stop aperture.
Claim 3
Dependent Claim
22 words
The photomicrographic exposure meter of claim 1, wherein said specular means is a beam-splitter (61) in the path of said picture-taking beam.
Claim 4
Dependent Claim
37 words
The photomicrographic exposure meter of claim 1, wherein said specular means is a deflecting mirror (12) in the path of a measuring beam positioned between said beam-splitter (11) which is fixed and said measuring field stop (13).
Claim 5
Dependent Claim
23 words
The photomicrographic exposure meter of claim 1, wherein a manually actuated drive or gearing (12a) is provided to adjust said specular means (12,61).
Claim 6
Dependent Claim
21 words
The photomicrographic exposure meter of claim 1, wherein an electrically operating displacement means is used to adjust said specular means (12,61).
Claim 7
Dependent Claim
17 words
The photomicrographic exposure meter of claim 5, wherein said electrical displacing means are controlled by a microprocessor.
Claim 8
Dependent Claim
38 words
The photomicrographic exposure meter of claim 6, wherein a luminous display is used for viewing, which marks a point in the visually observed object image (5a) that is proportionately controlled by said microprocessor through said deflection mirror (12).
Claim 9
Dependent Claim
52 words
The photomicrographic exposure meter of claim 1, wherein a reflex mirror (15) is mounted behind said measuring field stop for viewing the object detail appearing in the stop aperture and for allowing a view of said stop (13a) when said photoelectric detector (14) is withdrawn from the path of said beam part.
Claim 10
Dependent Claim
24 words
The photomicrographic exposure meter of claim 8, wherein said reflex mirror (15) and said photoelectric detector (14) are mounted on a common slider (18).
Claim 11
Dependent Claim
66 words
The photomicrographic exposure meter of claim 1 wherein a displacement unit (13) of said measuring field stop in addition to said stop (13a) for the detail or spot measurement is provided with a second larger stop (13b) for integrated measurement and which is displaceable between two positions in which either said stop (13a) or said second stop (13b) is in the path of said beam part.
Claim 12
Dependent Claim
39 words
The photomicrographic exposure meter of claim 10, wherein said stop for detail or spot measurements (13a) varies in shape and size and in that means for keeping constant the effect of the stop magnitude on exposure measurement are provided.
Claim 13
Dependent Claim
50 words
The photomicrographic exposure meter of claim 10 wherein said measuring field stop (43) is rigidly connected with a transparent support plate (43d) provided with markings (43a, 43b) the size of said stop and said second stop and which can be placed into the path of the measuring beam during viewing.
Claim 14
Dependent Claim
29 words
The photomicrographic exposure meter of claim 1, wherein a zoom lens (36) is mounted in the path of said beam part in front of said measuring field stop (33).
Claim 15
Dependent Claim
52 words
The photomicrographic exposure meter of claim 1, wherein a light source (51) is provided which illuminates from the rear said measuring field stop (53) during viewing, and in that additional reflecting means (56) are provided which project an image of said stop into the field of view (5a) of an ocular (5).
Claim 16
Dependent Claim
40 words
The photomicrographic exposure meter of claim 14, wherein said additional reflecting means is a triple mirror (56) which reflects the beam leaving sideways the prism of the binocular tube back into same and into the ocular field of view (5a).
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1982-11-12 | 1983-05-14 | 1983-11-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1986-11-12 | 1987-05-14 | 1987-11-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1990-11-12 | 1991-05-14 | 1991-11-13 | $7700.00 | Window Closed / Lapsed |