US4172758A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Magnetic bubble domain device fabrication technique
Assignee: Boeing North American Inc
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Filing: 1975-11-07
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Granted: 1979-10-30
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Expires: 1995-11-07
Abstract
Abstract A process for fabricating magnetic bubble domain devices having multiple layers. The process is a single high resolution mask process. A magnetizable layer, a conductive layer and at least one dielectric spacer layer are provided on a suitable magnetic bubble domain material and etched in a suitable manner such as by ion milling. The material layers may be applied such that the conductive layer is applied first and the magnetizable layer applied thereafter or vice versa.
Inventors
- 👤 Robert F. Bailey
- 👤 A. Brooke Jones
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 11:15
CPC Classifications
G; G11; G11C; G11C19/00; G11C19/02; G11C19/08; H; H01; H01F; H01F10/00; H01F10/06; H01F41/00; H01F41/32; H01F41/34
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
140 words
A one-level, multilayer process for fabricating planar magnetic bubble domain devices comprising the steps of: providing a layer of material which supports magnetic bubble domains therein; producing a dielectric layer on a surface of said layer of material to form a composite; forming a layer of electrically conductive material on said composite; forming a layer of magnetizable material on said composite; masking portions of the composite including said layers of conductive material and magnetizable material to define a pattern thereon; and etching through the unmasked portions of both said layer of conductive material and said layer of magnetizable material using a single dry etching process in order to produce with high resolution the pattern defined by said mask thereby to form a patterned arrangement of said layer of magnetizable material and said layer of electrically conductive material on said composite.
Claim 2
Dependent Claim
140 words
A one-level, multilayer process for fabricating planar magnetic bubble domain devices comprising the steps of: providing a layer of material which supports magnetic bubble domains therein; producing a dielectric layer on a surface of said layer of material to form a composite; forming a layer of electrically conductive material on said composite; forming a layer of magnetizable material on said composite; masking portions of the composite including said layers of conductive material and magnetizable material to define a pattern thereon; and etching through the unmasked portions of both said layer of conductive material and said layer of magnetizable material using a single dry etching process in order to produce with high resolution the pattern defined by said mask thereby to form a patterned arrangement of said layer of magnetizable material and said layer of electrically conductive material on said composite.
Claim 3
Dependent Claim
35 words
The process recited in claim 1 wherein said layer of magnetizable material is formed on said dielectric layer of said arrangement; and said layer of conductive material is formed on said layer of magnetizable material.
Claim 4
Dependent Claim
27 words
The process recited in claim 1 including the step of producing a further dielectric layer between said layer of conductive material and said layer of magnetizable material.
Claim 5
Dependent Claim
34 words
The process recited in claim 3 wherein said layer of conductive material is formed on said dielectric layer of said composite, and said layer of magnetizable material is formed on said further dielectric layer.
Claim 6
Dependent Claim
35 words
The process recited in claim 1 including the steps of masking said patterned arrangement to define a pattern thereon; and etching portions of at least one of said layers of conductive material and magnetizable material.
Claim 7
Dependent Claim
14 words
The process recited in claim 1 including the step of passivating said patterned arrangement.
Claim 8
Dependent Claim
45 words
The process recited in claim 1 wherein said layer of conductive material is formed to about 2000 A-5000 A thickness; said layer of magnetizable material is formed to about 1000 A-3000 A thickness; and said dielectric layer is formed to about 500 A-6000 A thickness.
Claim 9
Dependent Claim
27 words
The process recited in claim 7 wherein said dielectric layer comprises at least two separate dielectric layers each of which is formed to about 1000 A thickness.
Claim 10
Dependent Claim
30 words
The process recited in claim 5 wherein the first mentioned etching is performed with an ion milling procedure, and the second mentioned etching is performed with a chemical etching process.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1982-10-29 | 1983-04-30 | 1983-10-30 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1986-10-29 | 1987-04-30 | 1987-10-30 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1990-10-29 | 1991-04-30 | 1991-10-30 | $7700.00 | Window Closed / Lapsed |