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US4166278A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor injection laser device

Assignee: Mitsubishi Electric Corp
•
Filing: 1978-03-29
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Granted: 1979-08-28
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Expires: 1998-03-29
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Abstract

Abstract N type CaAlAs, GaAs and GaAlAs layers are successively grown on a semi-insulating GaAs substrate doped with Cr to form a semiconductor chip. Predetermined portions of those layers are selectively etched away to a depth reaching the substrate. Then a P type GaAlAs layer is epitaxially grown on the etched portions to restore the original shape of the chip. The chip is heated to form a pn junction in at least the GaAs layer serving as a light emitting region.

Inventors

  • 👤 Wataru Susaki
  • 👤 Hirofumi Namizaki

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-25 20:07
CPC Classifications
H; H01; H01S; H01S5/00; H01S5/20; H01S5/22; H01S5/2203; H10; H10H; H10H20/00; H10H20/80; H10H20/81; H10H20/811; H10H20/822; H10H20/824; Y; Y10; Y10S; Y10S438/00; Y10S438/912

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 162 words
A semiconductor injection laser device comprising an electrically high resistivity semiconductor substrate including a main face, a first, a second and a third semiconductor layer successively formed on a predetermined portion of said main face of said high resistivity substrate, and a fourth semiconductor layer disposed on the remaining portion of said main face of said semiconductor substrate to contact said first, second and third semiconductor layers, said fourth semiconductor layer being substantially flush with said third semiconductor layer and extending into said semiconductor substrate, said fourth semiconductor layer having a first type conductivity, at least the second layer consisting of a pair of semiconductor regions having the first type conductivity and a second type conductivity respectively to form therebetween a pn junction serving as a light emitting region, said semiconductor region of said first type conductivity contacting said fourth semiconductor layer, said second semiconductor layer having a forbidden band-width narrower than forbidden band-widths of said first, third and fourth semiconductor layers.
Claim 2
Dependent Claim 162 words
A semiconductor injection laser device comprising an electrically high resistivity semiconductor substrate including a main face, a first, a second and a third semiconductor layer successively formed on a predetermined portion of said main face of said high resistivity substrate, and a fourth semiconductor layer disposed on the remaining portion of said main face of said semiconductor substrate to contact said first, second and third semiconductor layers, said fourth semiconductor layer being substantially flush with said third semiconductor layer and extending into said semiconductor substrate, said fourth semiconductor layer having a first type conductivity, at least the second layer consisting of a pair of semiconductor regions having the first type conductivity and a second type conductivity respectively to form therebetween a pn junction serving as a light emitting region, said semiconductor region of said first type conductivity contacting said fourth semiconductor layer, said second semiconductor layer having a forbidden band-width narrower than forbidden band-widths of said first, third and fourth semiconductor layers.
Claim 3
Dependent Claim 37 words
A semiconductor injection laser device as claimed in claim 1 wherein, said first, third and foruth semiconductor layers are formed of n type gallium-aluminum arsenide, and said second semiconductor layer is formed of n type gallium arsenide.
Claim 4
Dependent Claim 24 words
A semiconductor injection laser device as claimed in claim 1 wherein said semiconductor substrate is formed of high resistivity gallium arsenide doped with chromium.
Claim 5
Dependent Claim 30 words
A semiconductor injection laser device as claimed in claims 1, 2 or 3 wherein said first, second, third and fourth semiconductor layers are formed according to an epitaxial growth technique.
Claim 6
Dependent Claim 37 words
A semiconductor injection laser device as claimed in claim 2 wherein a pair of first and second electrodes are disposed in ohmic contact with individual gallium arsenide layers formed on said third and fourth semiconductor layers, respectively.

References Cited (Backward Citations)

US3961996A Cited
US3990096A Cited
US4065729A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1982-08-27 1983-02-26 1983-08-28 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1986-08-27 1987-02-26 1987-08-28 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1990-08-27 1991-02-26 1991-08-28 $7700.00 Window Closed / Lapsed

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