Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
92 words
In a method of making an electron emissive electrode including a supporting substrate of nickel and a base layer of antimony, comprising the steps of: (a) baking said electrode at a temperature from 260° C. to 285° C. at a pressure of less than 10 -4 torr; then (b) sensitizing said base layer by exposing a surface portion thereof to the vapors of at least one alkali metal at a temperature lower than said bake temperature at a pressure of less than 10 -4 torr; wherein the improvement comprises the step of:
Claim 2
Dependent Claim
92 words
In a method of making an electron emissive electrode including a supporting substrate of nickel and a base layer of antimony, comprising the steps of: (a) baking said electrode at a temperature from 260° C. to 285° C. at a pressure of less than 10 -4 torr; then (b) sensitizing said base layer by exposing a surface portion thereof to the vapors of at least one alkali metal at a temperature lower than said bake temperature at a pressure of less than 10 -4 torr; wherein the improvement comprises the step of:
Claim 3
Dependent Claim
43 words
forming between said nickel substrate and said antimony layer an aluminum oxide film for preventing the alloying of said nickel substrate with said antimony layer during bake and for providing oxygen to oxidize said electrode and increase the red photosensitivity of said electrode.
Claim 4
Dependent Claim
43 words
forming between said nickel substrate and said antimony layer an aluminum oxide film for preventing the alloying of said nickel substrate with said antimony layer during bake and for providing oxygen to oxidize said electrode and increase the red photosensitivity of said electrode.
Claim 5
Dependent Claim
29 words
A method according to claim 1, further comprising the step of superficially oxidizing the sensitized electron emissive surface portion resulting from step (b) until substantially maximum photosensitivity is achieved.
Claim 6
Dependent Claim
24 words
A method according to claim 1, wherein the film of aluminum oxide has a thickness in the range from 400 A to 2500 A.
Claim 7
Dependent Claim
36 words
A method according to claim 1, wherein said film of aluminum oxide is formed by heating said nickel substrate and exposing said heated substrate to aluminum oxide bombarded by an electron beam in an oxygen atmosphere.
Claim 8
Dependent Claim
29 words
A method according to claim 1, wherein said film of aluminum oxide is formed by ion beam sputtering aluminum oxide onto said substrate in an oxygen or argon atmosphere.
Claim 9
Dependent Claim
84 words
An electron emissive electrode comprising: a supporting substrate of nickel; a base layer of antimony on said substrate, said base layer being sensitized with the vapors of at least one alkali metal; and an aluminum oxide film between said nickel substrate and said antimony layer for preventing alloying of said nickel substrate with said antimony layer at processing temperatures in the range from 260° C. to 285° C. and for providing oxygen to oxidize said electrode and increase the red photosensitivity of said electrode.
Claim 10
Dependent Claim
84 words
An electron emissive electrode comprising: a supporting substrate of nickel; a base layer of antimony on said substrate, said base layer being sensitized with the vapors of at least one alkali metal; and an aluminum oxide film between said nickel substrate and said antimony layer for preventing alloying of said nickel substrate with said antimony layer at processing temperatures in the range from 260° C. to 285° C. and for providing oxygen to oxidize said electrode and increase the red photosensitivity of said electrode.
Claim 11
Dependent Claim
24 words
An electrode according to claim 7, wherein said film of aluminum oxide has a thickness in the range from 400 A to 2500 A.