US4159917A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for use in the manufacture of semiconductor devices
Assignee: Eastman Kodak Co
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Filing: 1977-05-27
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Granted: 1979-07-03
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Expires: 1997-05-27
Abstract
Abstract A procedure for cleaning a semiconductor material of impurities which reside on the surface of the material is disclosed. The procedure is indicated for use prior to one or more thermal processing steps for the material, and involves the exposure of the material to a cleaning gas comprised of nitric oxide and, in a presently preferred form, of anhydrous hydrochloric acid as well.
Inventors
- 👤 Ronald M. Gluck
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 19:08
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/10; H10P70/12; Y; Y10; Y10S; Y10S438/00; Y10S438/906
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
129 words
In a method for the manufacture of a silicon semiconductor device, said method comprising at least one step in which such device is exposed to a high-temperature gaseous environment, the improvement of gettering metallic gold and other impurities from the silicon of said device comprising the step of exposing said device for a period of less than ten minutes, prior to said exposure to said gaseous environment, to an anhydrous cleaning gas mixture containing nitric oxide and hydrogen chloride together with a carrier gas of molecular nitrogen, said cleaning gas mixture being in the temperature range of 850° C. to 1100° C., and being comprised of a gas mixture of at least four parts of molecular nitrogen to one part of the combination of nitric oxide and hydrogen chloride.
Claim 2
Dependent Claim
129 words
In a method for the manufacture of a silicon semiconductor device, said method comprising at least one step in which such device is exposed to a high-temperature gaseous environment, the improvement of gettering metallic gold and other impurities from the silicon of said device comprising the step of exposing said device for a period of less than ten minutes, prior to said exposure to said gaseous environment, to an anhydrous cleaning gas mixture containing nitric oxide and hydrogen chloride together with a carrier gas of molecular nitrogen, said cleaning gas mixture being in the temperature range of 850° C. to 1100° C., and being comprised of a gas mixture of at least four parts of molecular nitrogen to one part of the combination of nitric oxide and hydrogen chloride.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1982-07-02 | 1983-01-01 | 1983-07-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1986-07-02 | 1987-01-01 | 1987-07-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1990-07-02 | 1991-01-01 | 1991-07-03 | $7700.00 | Window Closed / Lapsed |